173 related articles for article (PubMed ID: 12868847)
21. Design of multilayer extreme-ultraviolet mirrors for enhanced reflectivity.
Singh M; Braat JJ
Appl Opt; 2000 May; 39(13):2189-97. PubMed ID: 18345125
[TBL] [Abstract][Full Text] [Related]
22. Influence of the substrate finish and thin film roughness on the optical performance of Mo/Si multilayers.
Trost M; Schröder S; Feigl T; Duparré A; Tünnermann A
Appl Opt; 2011 Mar; 50(9):C148-53. PubMed ID: 21460930
[TBL] [Abstract][Full Text] [Related]
23. Influence of barrier interlayers on the performance of Mo/Be multilayer mirrors for next-generation EUV lithography.
Svechnikov MV; Chkhalo NI; Gusev SA; Nechay AN; Pariev DE; Pestov AE; Polkovnikov VN; Tatarskiy DA; Salashchenko NN; Schäfers F; Sertsu MG; Sokolov A; Vainer YA; Zorina MV
Opt Express; 2018 Dec; 26(26):33718-33731. PubMed ID: 30650805
[TBL] [Abstract][Full Text] [Related]
24. Thermal probe maskless lithography for 27.5 nm half-pitch Si technology.
Cheong LL; Paul P; Holzner F; Despont M; Coady DJ; Hedrick JL; Allen R; Knoll AW; Duerig U
Nano Lett; 2013 Sep; 13(9):4485-91. PubMed ID: 23965001
[TBL] [Abstract][Full Text] [Related]
25. Profile etching for prefiguring X-ray mirrors.
Liu C; Qian J; Assoufid L
J Synchrotron Radiat; 2015 Mar; 22(2):458-60. PubMed ID: 25723948
[TBL] [Abstract][Full Text] [Related]
26. Multilayer-coating-induced aberrations in extreme-ultraviolet lithography optics.
Liang C; Descour MR; Sasian JM; Lerner SA
Appl Opt; 2001 Jan; 40(1):129-35. PubMed ID: 18356983
[TBL] [Abstract][Full Text] [Related]
27. Multilayer Reflective Coatings for BEUV Lithography: A Review.
Uzoma PC; Shabbir S; Hu H; Okonkwo PC; Penkov OV
Nanomaterials (Basel); 2021 Oct; 11(11):. PubMed ID: 34835544
[TBL] [Abstract][Full Text] [Related]
28. Multilayer coatings for narrow-band imaging in the extreme ultraviolet.
Larruquert JI; Keski-Kuha RA
Appl Opt; 2001 Mar; 40(7):1126-31. PubMed ID: 18357097
[TBL] [Abstract][Full Text] [Related]
29. Mo/Si multilayers sputtered onto inclined substrates: experiments and simulations.
Sun S; Yu B; Guo T; Yao S; Liu Y; Deng W; Li C; Jin C
Opt Express; 2020 Apr; 28(9):13516-13531. PubMed ID: 32403824
[TBL] [Abstract][Full Text] [Related]
30. Phase effects owing to multilayer coatings in a two-mirror extreme-ultraviolet schwarzschild objective.
Tejnil E; Goldberg KA; Bokor J
Appl Opt; 1998 Dec; 37(34):8021-9. PubMed ID: 18301694
[TBL] [Abstract][Full Text] [Related]
31. Reflectance measurements and optical constants in the extreme ultraviolet for thin films of ion-beam-deposited SiC, Mo, Mg2Si, and InSb and of evaporated Cr.
Larruquert JI; Keski-Kuha RA
Appl Opt; 2000 Jun; 39(16):2772-81. PubMed ID: 18345201
[TBL] [Abstract][Full Text] [Related]
32. Spin-on-glass coatings for the generation of superpolished substrates for use in the extreme-ultraviolet region.
Salmassi F; Naulleau PP; Gullikson EM
Appl Opt; 2006 Apr; 45(11):2404-8. PubMed ID: 16623236
[TBL] [Abstract][Full Text] [Related]
33. Large area smoothing of surfaces by ion bombardment: fundamentals and applications.
Frost F; Fechner R; Ziberi B; Völlner J; Flamm D; Schindler A
J Phys Condens Matter; 2009 Jun; 21(22):224026. PubMed ID: 21715764
[TBL] [Abstract][Full Text] [Related]
34. Wave-front correction methods for extreme-ultraviolet multilayer reflectors.
Singh M; Bal MF; Braat JJ; Joyeux D; Dinger U
Appl Opt; 2003 Apr; 42(10):1847-51. PubMed ID: 12683765
[TBL] [Abstract][Full Text] [Related]
35. High-wavelength-resolution extreme-ultraviolet multilayer mirror.
Nagata S; Tsuneta S; Sakao T; Yoshida T; Hara H; Kano R; Ishiyama W; Murakami K; Ohtan M
Appl Opt; 1997 May; 36(13):2830-8. PubMed ID: 18253280
[TBL] [Abstract][Full Text] [Related]
36. Extreme ultraviolet multilayer mirror with near-zero IR reflectance.
Soer WA; Gawlitza P; van Herpen MM; Jak MJ; Braun S; Muys P; Banine VY
Opt Lett; 2009 Dec; 34(23):3680-2. PubMed ID: 19953160
[TBL] [Abstract][Full Text] [Related]
37. High-Performance Mo/Si and W/B4C Multilayer Mirrors for Soft X-Ray Imaging Optics.
Gutman G
J Xray Sci Technol; 1994 Jan; 4(2):142-50. PubMed ID: 21307461
[TBL] [Abstract][Full Text] [Related]
38. Control of lateral thickness gradients of Mo-Si multilayer on curved substrates using genetic algorithm.
Yu B; Jin C; Yao S; Li C; Wang H; Zhou F; Guo B; Xie Y; Liu Y; Wang L
Opt Lett; 2015 Sep; 40(17):3958-61. PubMed ID: 26368686
[TBL] [Abstract][Full Text] [Related]
39. Fluoride antireflection coatings for deep ultraviolet optics deposited by ion-beam sputtering.
Yoshida T; Nishimoto K; Sekine K; Etoh K
Appl Opt; 2006 Mar; 45(7):1375-9. PubMed ID: 16539238
[TBL] [Abstract][Full Text] [Related]
40. Effects of substrate and deposition method onto the mirror scattering.
Cho HJ; Shin MJ; Lee JC
Appl Opt; 2006 Mar; 45(7):1440-6. PubMed ID: 16539247
[TBL] [Abstract][Full Text] [Related]
[Previous] [Next] [New Search]