These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

185 related articles for article (PubMed ID: 16623518)

  • 21. Internal structure of nanoporous TiO2/polyion thin films prepared by layer-by-layer deposition.
    Kniprath R; Duhm S; Glowatzki H; Koch N; Rogaschewski S; Rabe JP; Kirstein S
    Langmuir; 2007 Sep; 23(19):9860-5. PubMed ID: 17696454
    [TBL] [Abstract][Full Text] [Related]  

  • 22. A new patterning method using photocatalytic lithography and selective atomic layer deposition.
    Lee JP; Sung MM
    J Am Chem Soc; 2004 Jan; 126(1):28-9. PubMed ID: 14709043
    [TBL] [Abstract][Full Text] [Related]  

  • 23. Atomic layer deposition of hafnium oxide from hafnium chloride and water.
    Mukhopadhyay AB; Musgrave CB; Fdez Sanz J
    J Am Chem Soc; 2008 Sep; 130(36):11996-2006. PubMed ID: 18698777
    [TBL] [Abstract][Full Text] [Related]  

  • 24. Selective Growth of Interface Layers from Reactions of Sc(MeCp)
    Rahman R; Klesko JP; Dangerfield A; Mattson EC; Chabal YJ
    ACS Appl Mater Interfaces; 2018 Sep; 10(38):32818-32827. PubMed ID: 30211529
    [TBL] [Abstract][Full Text] [Related]  

  • 25. Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2.
    Fang GY; Xu LN; Cao YQ; Wang LG; Wu D; Li AD
    Chem Commun (Camb); 2015 Jan; 51(7):1341-4. PubMed ID: 25485760
    [TBL] [Abstract][Full Text] [Related]  

  • 26. Blocking the lateral film growth at the nanoscale in area-selective atomic layer deposition.
    Ras RH; Sahramo E; Malm J; Raula J; Karppinen M
    J Am Chem Soc; 2008 Aug; 130(34):11252-3. PubMed ID: 18671346
    [TBL] [Abstract][Full Text] [Related]  

  • 27. Area-selective atomic layer deposition of lead sulfide: nanoscale patterning and DFT simulations.
    Lee W; Dasgupta NP; Trejo O; Lee JR; Hwang J; Usui T; Prinz FB
    Langmuir; 2010 May; 26(9):6845-52. PubMed ID: 20099790
    [TBL] [Abstract][Full Text] [Related]  

  • 28. Area-Selective Atomic Layer Deposition of SiO
    Mameli A; Merkx MJM; Karasulu B; Roozeboom F; Kessels WEMM; Mackus AJM
    ACS Nano; 2017 Sep; 11(9):9303-9311. PubMed ID: 28850774
    [TBL] [Abstract][Full Text] [Related]  

  • 29. Effect of atomic layer deposition coatings on the surface structure of anodic aluminum oxide membranes.
    Xiong G; Elam JW; Feng H; Han CY; Wang HH; Iton LE; Curtiss LA; Pellin MJ; Kung M; Kung H; Stair PC
    J Phys Chem B; 2005 Jul; 109(29):14059-63. PubMed ID: 16852765
    [TBL] [Abstract][Full Text] [Related]  

  • 30. Preliminary studies in the electrodeposition of PbSe/PbTe superlattice thin films via electrochemical atomic layer deposition (ALD).
    Vaidyanathan R; Cox SM; Happek U; Banga D; Mathe MK; Stickney JL
    Langmuir; 2006 Dec; 22(25):10590-5. PubMed ID: 17129034
    [TBL] [Abstract][Full Text] [Related]  

  • 31. Growth of crystalline Gd2O3 thin films with a high-quality interface on Si(100) by low-temperature H2O-assisted atomic layer deposition.
    Milanov AP; Xu K; Laha A; Bugiel E; Ranjith R; Schwendt D; Osten HJ; Parala H; Fischer RA; Devi A
    J Am Chem Soc; 2010 Jan; 132(1):36-7. PubMed ID: 20000721
    [TBL] [Abstract][Full Text] [Related]  

  • 32. Reactivity of the 4d transition metals toward N hydrogenation and NH dissociation: a DFT-based HSAB analysis.
    Crawford P; Hu P
    J Phys Chem B; 2006 Mar; 110(9):4157-61. PubMed ID: 16509709
    [TBL] [Abstract][Full Text] [Related]  

  • 33. The Effect of Surface Terminations on the Initial Stages of TiO
    Parke T; Silva-Quinones D; Wang GT; Teplyakov AV
    Chemphyschem; 2023 Apr; 24(7):e202200724. PubMed ID: 36516050
    [TBL] [Abstract][Full Text] [Related]  

  • 34. Reactions of hydrazoic acid and trimethylindium on TiO2 rutile (110) surface: a computational study on the formation of the first monolayer InN.
    Wang JH; Lin MC
    J Phys Chem B; 2006 Feb; 110(5):2263-70. PubMed ID: 16471813
    [TBL] [Abstract][Full Text] [Related]  

  • 35. Molecular layer deposition of poly(p-phenylene terephthalamide) films using terephthaloyl chloride and p-phenylenediamine.
    Adamczyk NM; Dameron AA; George SM
    Langmuir; 2008 Mar; 24(5):2081-9. PubMed ID: 18215079
    [TBL] [Abstract][Full Text] [Related]  

  • 36. Controlling the crystallinity and roughness of atomic layer deposited titanium dioxide films.
    Puurunen RL; Sajavaara T; Santala E; Miikkulainen V; Saukkonen T; Laitinen M; Leskelä M
    J Nanosci Nanotechnol; 2011 Sep; 11(9):8101-7. PubMed ID: 22097537
    [TBL] [Abstract][Full Text] [Related]  

  • 37. Atomic layer deposition of photocatalytic TiO2 thin films from TiF4 and H2O.
    Pore V; Kivelä T; Ritala M; Leskelä M
    Dalton Trans; 2008 Dec; (45):6467-74. PubMed ID: 19002335
    [TBL] [Abstract][Full Text] [Related]  

  • 38. Initial stage of atomic layer deposition of 2D-MoS
    Shirazi M; Kessels WMM; Bol AA
    Phys Chem Chem Phys; 2018 Jun; 20(24):16861-16875. PubMed ID: 29893398
    [TBL] [Abstract][Full Text] [Related]  

  • 39. Correlating electronic properties of bimetallic surfaces with reaction pathways of C2 hydrocarbons.
    Goda AM; Barteau MA; Chen JG
    J Phys Chem B; 2006 Jun; 110(24):11823-31. PubMed ID: 16800484
    [TBL] [Abstract][Full Text] [Related]  

  • 40. First principles study of the atomic layer deposition of alumina by TMA-H2O-process.
    Weckman T; Laasonen K
    Phys Chem Chem Phys; 2015 Jul; 17(26):17322-34. PubMed ID: 26074271
    [TBL] [Abstract][Full Text] [Related]  

    [Previous]   [Next]    [New Search]
    of 10.