These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.
133 related articles for article (PubMed ID: 16983421)
1. Microstructure of magnesium fluoride films deposited by boat evaporation at 193 nm. Liu MC; Lee CC; Kaneko M; Nakahira K; Takano Y Appl Opt; 2006 Oct; 45(28):7319-24. PubMed ID: 16983421 [TBL] [Abstract][Full Text] [Related]
2. Characterization of AlF3 thin films at 193 nm by thermal evaporation. Lee CC; Liu MC; Kaneko M; Nakahira K; Takano Y Appl Opt; 2005 Dec; 44(34):7333-8. PubMed ID: 16353803 [TBL] [Abstract][Full Text] [Related]
3. Microstructure-related properties at 193 nm of MgF2 and GdF3 films deposited by a resistive-heating boat. Liu MC; Lee CC; Kaneko M; Nakahira K; Takano Y Appl Opt; 2006 Mar; 45(7):1368-74. PubMed ID: 16539237 [TBL] [Abstract][Full Text] [Related]
4. Influence of ion assistance on LaF3 films deposited by molybdenum boat evaporation. Liu MC; Lee CC; Kaneko M; Nakahira K; Takano Y Appl Opt; 2012 May; 51(15):2865-9. PubMed ID: 22614587 [TBL] [Abstract][Full Text] [Related]
5. Microstructure-related properties of magnesium fluoride films at 193nm by oblique-angle deposition. Guo C; Kong M; Lin D; Liu C; Li B Opt Express; 2013 Jan; 21(1):960-7. PubMed ID: 23388989 [TBL] [Abstract][Full Text] [Related]
6. Laser damage properties of TiO2/Al2O3 thin films grown by atomic layer deposition. Wei Y; Liu H; Sheng O; Liu Z; Chen S; Yang L Appl Opt; 2011 Aug; 50(24):4720-7. PubMed ID: 21857693 [TBL] [Abstract][Full Text] [Related]
7. Fluoride antireflection coatings deposited at 193 nm. Liu MC; Lee CC; Liao BH; Kaneko M; Nakahira K; Takano Y Appl Opt; 2008 May; 47(13):C214-8. PubMed ID: 18449249 [TBL] [Abstract][Full Text] [Related]
8. Effects of substrate temperatures and deposition rates on properties of aluminum fluoride thin films in deep-ultraviolet region. Sun J; Li X; Zhang W; Yi K; Shao J Appl Opt; 2012 Dec; 51(35):8481-9. PubMed ID: 23262545 [TBL] [Abstract][Full Text] [Related]
9. Influence of thermal annealing and ultraviolet light irradiation on LaF3 thin films at 193 nm. Lee CC; Liu MC; Kaneko M; Nakahira K; Takano Y Appl Opt; 2005 Nov; 44(32):6921-6. PubMed ID: 16294967 [TBL] [Abstract][Full Text] [Related]
10. Effects of substrate temperatures on the characterization of magnesium fluoride thin films in deep-ultraviolet region. Sun J; Shao J; Yi K; Zhang W Appl Opt; 2014 Mar; 53(7):1298-305. PubMed ID: 24663357 [TBL] [Abstract][Full Text] [Related]
11. Optical properties and residual stress of YbF3 thin films deposited at different temperatures. Wang Y; Zhang YG; Chen WL; Shen WD; Liu X; Gu PF Appl Opt; 2008 May; 47(13):C319-23. PubMed ID: 18449267 [TBL] [Abstract][Full Text] [Related]
12. Ultraviolet optical and microstructural properties of MgF2 and LaF3 coatings deposited by ion-beam sputtering and boat and electron-beam evaporation. Ristau D; Günster S; Bosch S; Duparré A; Masetti E; Ferré-Borrull J; Kiriakidis G; Peiró F; Quesnel E; Tikhonravov A Appl Opt; 2002 Jun; 41(16):3196-204. PubMed ID: 12064402 [TBL] [Abstract][Full Text] [Related]
13. Effects of annealing on the optical, structural, and chemical properties of TiO2 and MgF2 thin films prepared by plasma ion-assisted deposition. Woo SH; Hwangbo CK Appl Opt; 2006 Mar; 45(7):1447-55. PubMed ID: 16539248 [TBL] [Abstract][Full Text] [Related]
14. Deposition of optical thin films by pulsed laser assisted evaporation. Sankur HO; Gunning W Appl Opt; 1989 Jul; 28(14):2806-8. PubMed ID: 20555603 [TBL] [Abstract][Full Text] [Related]
15. Optical and structural properties of LaF3 thin films. Bischoff M; Gäbler D; Kaiser N; Chuvilin A; Kaiser U; Tünnermann A Appl Opt; 2008 May; 47(13):C157-61. PubMed ID: 18449239 [TBL] [Abstract][Full Text] [Related]
16. Atomic layer deposition for fabrication of HfO2/Al2O3 thin films with high laser-induced damage thresholds. Wei Y; Pan F; Zhang Q; Ma P Nanoscale Res Lett; 2015; 10():44. PubMed ID: 25852341 [TBL] [Abstract][Full Text] [Related]
17. Anisotropic laser-induced damage threshold and residual stress of TiO2 sculptured thin films. Xiao X; Miao L; Zhang M; Xu G; Shao J; Fan Z J Nanosci Nanotechnol; 2013 Feb; 13(2):824-8. PubMed ID: 23646523 [TBL] [Abstract][Full Text] [Related]
18. Microstructure-Induced Anisotropic Optical Properties of YF Shan Y; Liu P; Chen Y; Zhang H; Tu H; Zheng Y; Zhang R; Wang S; Li J; Chen L Nanomaterials (Basel); 2020 Dec; 10(12):. PubMed ID: 33287123 [TBL] [Abstract][Full Text] [Related]