These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

122 related articles for article (PubMed ID: 18356983)

  • 1. Multilayer-coating-induced aberrations in extreme-ultraviolet lithography optics.
    Liang C; Descour MR; Sasian JM; Lerner SA
    Appl Opt; 2001 Jan; 40(1):129-35. PubMed ID: 18356983
    [TBL] [Abstract][Full Text] [Related]  

  • 2. Coating-induced wave-front aberrations: on-axis astigmatism and chromatic aberration in all-reflecting systems.
    Reiley DJ; Chipman RA
    Appl Opt; 1994 Apr; 33(10):2002-12. PubMed ID: 20885536
    [TBL] [Abstract][Full Text] [Related]  

  • 3. Phase effects owing to multilayer coatings in a two-mirror extreme-ultraviolet schwarzschild objective.
    Tejnil E; Goldberg KA; Bokor J
    Appl Opt; 1998 Dec; 37(34):8021-9. PubMed ID: 18301694
    [TBL] [Abstract][Full Text] [Related]  

  • 4. Balanced diffraction aberrations, independent of the observation point: application to a tilted dielectric plate.
    Sheppard CJ
    J Opt Soc Am A Opt Image Sci Vis; 2013 Oct; 30(10):2150-61. PubMed ID: 24322870
    [TBL] [Abstract][Full Text] [Related]  

  • 5. High-performance Mo-Si multilayer coatings for extreme-ultraviolet lithography by ion-beam deposition.
    Spiller E; Baker SL; Mirkarimi PB; Sperry V; Gullikson EM; Stearns DG
    Appl Opt; 2003 Jul; 42(19):4049-58. PubMed ID: 12868847
    [TBL] [Abstract][Full Text] [Related]  

  • 6. Repairing amplitude defects in multilayer-coated extreme-ultraviolet lithography reticles by use of a focused ion beam.
    Barty A; Hau-Riege S; Stearns D; Clift M; Mirkarimi P; Gullikson E; Chapman H; Sweeney D
    Appl Opt; 2004 Dec; 43(36):6545-56. PubMed ID: 15646775
    [TBL] [Abstract][Full Text] [Related]  

  • 7. Extreme ultraviolet mask roughness effects in high numerical aperture lithography.
    Naulleau P; Wang YG; Pistor T
    Appl Opt; 2018 Mar; 57(7):1724-1730. PubMed ID: 29522026
    [TBL] [Abstract][Full Text] [Related]  

  • 8. Wolter type I x-ray focusing mirror using multilayer coatings.
    Chon KS; Namba Y; Yoon KH
    Appl Opt; 2006 Jul; 45(19):4609-16. PubMed ID: 16799673
    [TBL] [Abstract][Full Text] [Related]  

  • 9. Sub-diffraction-limited multilayer coatings for the 0.3 numerical aperture micro-exposure tool for extreme ultraviolet lithography.
    Soufli R; Hudyma RM; Spiller E; Gullikson EM; Schmidt MA; Robinson JC; Baker SL; Walton CC; Taylor JS
    Appl Opt; 2007 Jun; 46(18):3736-46. PubMed ID: 17538670
    [TBL] [Abstract][Full Text] [Related]  

  • 10. Thermal stress prediction in mirror and multilayer coatings.
    Cheng X; Zhang L; Morawe C; Sanchez Del Rio M
    J Synchrotron Radiat; 2015 Mar; 22(2):317-27. PubMed ID: 25723932
    [TBL] [Abstract][Full Text] [Related]  

  • 11. Co-optimization method to reduce the pattern distortion caused by polarization aberration in anamorphic EUV lithography.
    Sheng N; Sun Y; Li E; Li T; Li Y; Wei P; Liu L
    Appl Opt; 2019 May; 58(14):3718-3728. PubMed ID: 31158182
    [TBL] [Abstract][Full Text] [Related]  

  • 12. Optical analysis of an ultra-high resolution two-mirror soft x-ray microscope.
    Shealy DL; Wang C; Hoover RB
    J Xray Sci Technol; 1995 Jan; 5(1):1-19. PubMed ID: 21307473
    [TBL] [Abstract][Full Text] [Related]  

  • 13. Effects of mo/si multilayer coatings on the imaging characteristics of an extreme-ultraviolet lithography system.
    Duddles NJ
    Appl Opt; 1998 Jun; 37(16):3533-8. PubMed ID: 18273320
    [TBL] [Abstract][Full Text] [Related]  

  • 14. Atomic-precision multilayer coating of the first set of optics for an extreme-ultraviolet lithography prototype system.
    Montcalm C; Grabner RF; Hudyma RM; Schmidt MA; Spiller E; Walton CC; Wedowski M; Folta JA
    Appl Opt; 2002 Jun; 41(16):3262-9. PubMed ID: 12064411
    [TBL] [Abstract][Full Text] [Related]  

  • 15. Design of anamorphic magnification high-numerical aperture objective for extreme ultraviolet lithography by curvatures combination method.
    Liu Y; Li Y; Cao Z
    Appl Opt; 2016 Jun; 55(18):4917-23. PubMed ID: 27409118
    [TBL] [Abstract][Full Text] [Related]  

  • 16. Extreme ultraviolet multilayer mirror with near-zero IR reflectance.
    Soer WA; Gawlitza P; van Herpen MM; Jak MJ; Braun S; Muys P; Banine VY
    Opt Lett; 2009 Dec; 34(23):3680-2. PubMed ID: 19953160
    [TBL] [Abstract][Full Text] [Related]  

  • 17. Wavefront aberrations of x-ray dynamical diffraction beams.
    Liao K; Hong Y; Sheng W
    Appl Opt; 2014 Oct; 53(28):6362-70. PubMed ID: 25322219
    [TBL] [Abstract][Full Text] [Related]  

  • 18. Non-contact XUV metrology of Ru/B
    Ruiz-Lopez M; Dacasa H; Mahieu B; Lozano M; Li L; Zeitoun P; Bleiner D
    Appl Opt; 2018 Feb; 57(6):1315-1320. PubMed ID: 29469828
    [TBL] [Abstract][Full Text] [Related]  

  • 19. Recovery of Multilayer-Coated Zerodur and ULE Optics for Extreme-Ultraviolet Lithography by Recoating, Reactive-Ion Etching, and Wet-Chemical Processes.
    Mirkarimi PB; Baker SL; Montcalm C; Folta JA
    Appl Opt; 2001 Jan; 40(1):62-70. PubMed ID: 18356974
    [TBL] [Abstract][Full Text] [Related]  

  • 20. Single spherical mirror optic for extreme ultraviolet lithography enabled by inverse lithography technology.
    Scranton G; Bhargava S; Ganapati V; Yablonovitch E
    Opt Express; 2014 Oct; 22(21):25027-42. PubMed ID: 25401536
    [TBL] [Abstract][Full Text] [Related]  

    [Next]    [New Search]
    of 7.