108 related articles for article (PubMed ID: 18449311)
1. Time exposure performance of Mo-Au Gibbsian segregating alloys for extreme ultraviolet collector optics.
Qiu H; Srivastava SN; Thompson KC; Neumann MJ; Ruzic DN
Appl Opt; 2008 May; 47(13):2443-51. PubMed ID: 18449311
[TBL] [Abstract][Full Text] [Related]
2. Atomic-precision multilayer coating of the first set of optics for an extreme-ultraviolet lithography prototype system.
Montcalm C; Grabner RF; Hudyma RM; Schmidt MA; Spiller E; Walton CC; Wedowski M; Folta JA
Appl Opt; 2002 Jun; 41(16):3262-9. PubMed ID: 12064411
[TBL] [Abstract][Full Text] [Related]
3. Low-stress and high-reflectance Mo/Si multilayers for extreme ultraviolet lithography by magnetron sputtering deposition with bias assistance.
Yu B; Jin C; Yao S; Li C; Liu Y; Zhou F; Guo B; Wang H; Xie Y; Wang L
Appl Opt; 2017 Sep; 56(26):7462-7468. PubMed ID: 29048070
[TBL] [Abstract][Full Text] [Related]
4. Mo/Si and Mo/Be multilayer thin films on Zerodur substrates for extreme-ultraviolet lithography.
Mirkarimi PB; Bajt S; Wall MA
Appl Opt; 2000 Apr; 39(10):1617-25. PubMed ID: 18345060
[TBL] [Abstract][Full Text] [Related]
5. Sub-diffraction-limited multilayer coatings for the 0.3 numerical aperture micro-exposure tool for extreme ultraviolet lithography.
Soufli R; Hudyma RM; Spiller E; Gullikson EM; Schmidt MA; Robinson JC; Baker SL; Walton CC; Taylor JS
Appl Opt; 2007 Jun; 46(18):3736-46. PubMed ID: 17538670
[TBL] [Abstract][Full Text] [Related]
6. Structured Mo/Si multilayers for IR-suppression in laser-produced EUV light sources.
Trost M; Schröder S; Duparré A; Risse S; Feigl T; Zeitner UD; Tünnermann A
Opt Express; 2013 Nov; 21(23):27852-64. PubMed ID: 24514302
[TBL] [Abstract][Full Text] [Related]
7. Spectral purification and infrared light recycling in extreme ultraviolet lithography sources.
Bayraktar M; van Goor FA; Boller KJ; Bijkerk F
Opt Express; 2014 Apr; 22(7):8633-9. PubMed ID: 24718234
[TBL] [Abstract][Full Text] [Related]
8. Design of reflective phase retarders in the extreme ultraviolet based on chirped Mo/Si multilayer mirrors.
Yang S; Chen S; Lin C
J Synchrotron Radiat; 2021 Sep; 28(Pt 5):1437-1443. PubMed ID: 34475291
[TBL] [Abstract][Full Text] [Related]
9. Experimental comparison of extreme-ultraviolet multilayers for solar physics.
Windt DL; Donguy S; Seely J; Kjornrattanawanich B
Appl Opt; 2004 Mar; 43(9):1835-48. PubMed ID: 15065713
[TBL] [Abstract][Full Text] [Related]
10. In situ reflectance measurements of soft-x-ray/extreme-ultraviolet Mo/Y multilayer mirrors.
Montcalm C; Sullivan BT; Duguay S; Ranger M; Steffens W; Pépin H; Chaker M
Opt Lett; 1995 Jun; 20(12):1450-2. PubMed ID: 19862045
[TBL] [Abstract][Full Text] [Related]
11. Design and performance of capping layers for extreme-ultraviolet multilayer mirrors.
Bajt S; Chapman HN; Nguyen N; Alameda J; Robinson JC; Malinowski M; Gullikson E; Aquila A; Tarrio C; Grantham S
Appl Opt; 2003 Oct; 42(28):5750-8. PubMed ID: 14528939
[TBL] [Abstract][Full Text] [Related]
12. Influence of barrier interlayers on the performance of Mo/Be multilayer mirrors for next-generation EUV lithography.
Svechnikov MV; Chkhalo NI; Gusev SA; Nechay AN; Pariev DE; Pestov AE; Polkovnikov VN; Tatarskiy DA; Salashchenko NN; Schäfers F; Sertsu MG; Sokolov A; Vainer YA; Zorina MV
Opt Express; 2018 Dec; 26(26):33718-33731. PubMed ID: 30650805
[TBL] [Abstract][Full Text] [Related]
13. Highly selective etching of SnO2 absorber in binary mask structure for extreme ultra-violet lithography.
Lee SJ; Jung CY; Park SJ; Hwangbo CK; Seo HS; Kim SS; Lee NE
J Nanosci Nanotechnol; 2012 Apr; 12(4):3334-40. PubMed ID: 22849119
[TBL] [Abstract][Full Text] [Related]
14. Investigating the Degradation of EUV Transmittance of an EUV Pellicle Membrane.
Wi SJ; Jang YJ; Lee DG; Kim SY; Ahn J
Membranes (Basel); 2022 Dec; 13(1):. PubMed ID: 36676812
[TBL] [Abstract][Full Text] [Related]
15. Tin deposition on ruthenium and its influence on blistering in multi-layer mirrors.
Onwudinanti C; Brocks G; Koelman V; Morgan T; Tao S
Phys Chem Chem Phys; 2021 Jul; 23(25):13878-13884. PubMed ID: 34114582
[TBL] [Abstract][Full Text] [Related]
16. High-reflection Mo/Be/Si multilayers for EUV lithography.
Chkhalo NI; Gusev SA; Nechay AN; Pariev DE; Polkovnikov VN; Salashchenko NN; Schäfers F; Sertsu MG; Sokolov A; Svechnikov MV; Tatarsky DA
Opt Lett; 2017 Dec; 42(24):5070-5073. PubMed ID: 29240139
[TBL] [Abstract][Full Text] [Related]
17. Laser-plasma debris from a rotating cryogenic-solid-Xe target.
Amano S; Inaoka Y; Hiraishi H; Miyamoto S; Mochizuki T
Rev Sci Instrum; 2010 Feb; 81(2):023104. PubMed ID: 20192482
[TBL] [Abstract][Full Text] [Related]
18. In-line extreme ultraviolet polarizer with hybrid configuration.
Yang M; Tong X; Sun Y; Jiang D; Zhou C; Zhang D
Rev Sci Instrum; 2009 Mar; 80(3):033105. PubMed ID: 19334905
[TBL] [Abstract][Full Text] [Related]
19. Damage threshold measurements on EUV optics using focused radiation from a table-top laser produced plasma source.
Barkusky F; Bayer A; Döring S; Grossmann P; Mann K
Opt Express; 2010 Mar; 18(5):4346-55. PubMed ID: 20389446
[TBL] [Abstract][Full Text] [Related]
20. Recovery of Multilayer-Coated Zerodur and ULE Optics for Extreme-Ultraviolet Lithography by Recoating, Reactive-Ion Etching, and Wet-Chemical Processes.
Mirkarimi PB; Baker SL; Montcalm C; Folta JA
Appl Opt; 2001 Jan; 40(1):62-70. PubMed ID: 18356974
[TBL] [Abstract][Full Text] [Related]
[Next] [New Search]