461 related articles for article (PubMed ID: 18583055)
1. Fabrication of hierarchical micro/nanostructures via scanning probe lithography and wet chemical etching.
Choi I; Kim Y; Yi J
Ultramicroscopy; 2008 Sep; 108(10):1205-9. PubMed ID: 18583055
[TBL] [Abstract][Full Text] [Related]
2. Method for fabricating micro/nanostructures via scanning probe microscope and anisotropic wet etching.
Hu K; Wang Q
J Nanosci Nanotechnol; 2013 Jun; 13(6):3966-71. PubMed ID: 23862434
[TBL] [Abstract][Full Text] [Related]
3. A high-yield fabrication process for silicon neural probes.
Oh SJ; Song JK; Kim JW; Kim SJ
IEEE Trans Biomed Eng; 2006 Feb; 53(2):351-4. PubMed ID: 16485767
[TBL] [Abstract][Full Text] [Related]
4. Directed positioning of single cells in microwells fabricated by scanning probe lithography and wet etching methods.
Choi I; Yang YI; Kim YJ; Kim Y; Hahn JS; Choi K; Yi J
Langmuir; 2008 Mar; 24(6):2597-602. PubMed ID: 18225920
[TBL] [Abstract][Full Text] [Related]
5. Superhydrophobic silicon surfaces with micro-nano hierarchical structures via deep reactive ion etching and galvanic etching.
He Y; Jiang C; Yin H; Chen J; Yuan W
J Colloid Interface Sci; 2011 Dec; 364(1):219-29. PubMed ID: 21889158
[TBL] [Abstract][Full Text] [Related]
6. Maskless and resist-free rapid prototyping of three-dimensional structures through electron beam induced deposition (EBID) of carbon in combination with metal-assisted chemical etching (MaCE) of silicon.
Rykaczewski K; Hildreth OJ; Kulkarni D; Henry MR; Kim SK; Wong CP; Tsukruk VV; Fedorov AG
ACS Appl Mater Interfaces; 2010 Apr; 2(4):969-73. PubMed ID: 20356053
[TBL] [Abstract][Full Text] [Related]
7. Multi-silicon ridge nanofabrication by repeated edge lithography.
Zhao Y; Berenschot E; Jansen H; Tas N; Huskens J; Elwenspoek M
Nanotechnology; 2009 Aug; 20(31):315305. PubMed ID: 19597243
[TBL] [Abstract][Full Text] [Related]
8. Simultaneous fabrication of very high aspect ratio positive nano- to milliscale structures.
Chen LQ; Chan-Park MB; Zhang Q; Chen P; Li CM; Li S
Small; 2009 May; 5(9):1043-50. PubMed ID: 19235805
[TBL] [Abstract][Full Text] [Related]
9. Three-dimensional etching profiles and surface speciations (via attenuated total reflection-fourier transform infrared spectroscopy) of silicon nanowires in NH4F-buffered HF solutions: a double passivation model.
Teo BK; Chen WW; Sun XH; Wang SD; Lee ST
J Phys Chem B; 2005 Nov; 109(46):21716-24. PubMed ID: 16853821
[TBL] [Abstract][Full Text] [Related]
10. Ga(+) beam lithography for nanoscale silicon reactive ion etching.
Henry MD; Shearn MJ; Chhim B; Scherer A
Nanotechnology; 2010 Jun; 21(24):245303. PubMed ID: 20484788
[TBL] [Abstract][Full Text] [Related]
11. Maskless lithography using silicon oxide etch-stop layer induced by megahertz repetition femtosecond laser pulses.
Kiani A; Venkatakrishnan K; Tan B; Venkataramanan V
Opt Express; 2011 May; 19(11):10834-42. PubMed ID: 21643340
[TBL] [Abstract][Full Text] [Related]
12. Friction-induced nanofabrication on monocrystalline silicon.
Yu B; Dong H; Qian L; Chen Y; Yu J; Zhou Z
Nanotechnology; 2009 Nov; 20(46):465303. PubMed ID: 19847028
[TBL] [Abstract][Full Text] [Related]
13. Fabrication of poly(3-hydroxybutyrate-co-3-hydroxyhexanoate) (PHBHHx) microstructures using soft lithography for scaffold applications.
Wang Z; Hu H; Wang Y; Wang Y; Wu Q; Liu L; Chen G
Biomaterials; 2006 Apr; 27(12):2550-7. PubMed ID: 16364433
[TBL] [Abstract][Full Text] [Related]
14. Fabrication of nanopore arrays and ultrathin silicon nitride membranes by block-copolymer-assisted lithography.
Popa AM; Niedermann P; Heinzelmann H; Hubbell JA; Pugin R
Nanotechnology; 2009 Dec; 20(48):485303. PubMed ID: 19880976
[TBL] [Abstract][Full Text] [Related]
15. Etching behavior of silicon nanowires with HF and NH4F and surface characterization by attenuated total reflection Fourier transform infrared spectroscopy: similarities and differences between one-dimensional and two-dimensional silicon surfaces.
Chen WW; Sun XH; Wang SD; Lee ST; Teo BK
J Phys Chem B; 2005 Jun; 109(21):10871-9. PubMed ID: 16852323
[TBL] [Abstract][Full Text] [Related]
16. Controlled Patterning of Vertical Silicon Structures Using Polymer Lithography and Wet Chemical Etching.
Kim HJ; Lee SH; Lee J; Lee ES; Choi JH; Jung JY; Jeong JH; Choi DG
J Nanosci Nanotechnol; 2015 Jun; 15(6):4522-9. PubMed ID: 26369075
[TBL] [Abstract][Full Text] [Related]
17. The fabrication of diversiform nanostructure forests based on residue nanomasks synthesized by oxygen plasma removal of photoresist.
Mao H; Wu D; Wu W; Xu J; Hao Y
Nanotechnology; 2009 Nov; 20(44):445304. PubMed ID: 19809108
[TBL] [Abstract][Full Text] [Related]
18. A nonlithographic top-down electrochemical approach for creating hierarchical (micro-nano) superhydrophobic silicon surfaces.
Wang MF; Raghunathan N; Ziaie B
Langmuir; 2007 Feb; 23(5):2300-3. PubMed ID: 17266346
[TBL] [Abstract][Full Text] [Related]
19. Patterning of various silicon structures via polymer lithography and catalytic chemical etching.
Lee JP; Bang BM; Choi S; Kim T; Park S
Nanotechnology; 2011 Jul; 22(27):275305. PubMed ID: 21597138
[TBL] [Abstract][Full Text] [Related]
20. Periodic arrays of deep nanopores made in silicon with reactive ion etching and deep UV lithography.
Woldering LA; Willem Tjerkstra R; Jansen HV; Setija ID; Vos WL
Nanotechnology; 2008 Apr; 19(14):145304. PubMed ID: 21817758
[TBL] [Abstract][Full Text] [Related]
[Next] [New Search]
