These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

154 related articles for article (PubMed ID: 18594592)

  • 21. Survey of Ti-, B-, and Y-based soft x-ray-extreme ultraviolet multilayer mirrors for the 2- to 12-nm wavelength region.
    Montcalm C; Kearney PA; Slaughter JM; Sullivan BT; Chaker M; Pépin H; Falco CM
    Appl Opt; 1996 Sep; 35(25):5134-47. PubMed ID: 21102948
    [TBL] [Abstract][Full Text] [Related]  

  • 22. Structural characterization and lifetime stability of Mo/Y extreme-ultraviolet multilayer mirrors.
    Kjornrattanawanich B; Bajt S
    Appl Opt; 2004 Nov; 43(32):5955-62. PubMed ID: 15587723
    [TBL] [Abstract][Full Text] [Related]  

  • 23. Low-stress and high-reflectance Mo/Si multilayers for extreme ultraviolet lithography by magnetron sputtering deposition with bias assistance.
    Yu B; Jin C; Yao S; Li C; Liu Y; Zhou F; Guo B; Wang H; Xie Y; Wang L
    Appl Opt; 2017 Sep; 56(26):7462-7468. PubMed ID: 29048070
    [TBL] [Abstract][Full Text] [Related]  

  • 24. Design and fabrication of highly heat-resistant Mo/Si multilayer soft X-ray mirrors with interleaved barrier layers.
    Takenaka H; Ito H; Haga T; Kawamura T
    J Synchrotron Radiat; 1998 May; 5(Pt 3):708-10. PubMed ID: 15263627
    [TBL] [Abstract][Full Text] [Related]  

  • 25. Refined extreme ultraviolet mask stack model.
    Makhotkin IA; Wu M; Soltwisch V; Scholze F; Philipsen V
    J Opt Soc Am A Opt Image Sci Vis; 2021 Apr; 38(4):498-503. PubMed ID: 33798178
    [TBL] [Abstract][Full Text] [Related]  

  • 26. Towards High Accuracy Reflectometry for Extreme-Ultraviolet Lithography.
    Tarrio C; Grantham S; Squires MB; Vest RE; Lucatorto TB
    J Res Natl Inst Stand Technol; 2003; 108(4):267-73. PubMed ID: 27413610
    [TBL] [Abstract][Full Text] [Related]  

  • 27. Characterisation of engineered defects in extreme ultraviolet mirror substrates using lab-scale extreme ultraviolet reflection ptychography.
    Lu H; Odstrčil M; Pooley C; Biller J; Mebonia M; He G; Praeger M; Juschkin L; Frey J; Brocklesby W
    Ultramicroscopy; 2023 Jul; 249():113720. PubMed ID: 37004492
    [TBL] [Abstract][Full Text] [Related]  

  • 28. Structural properties of subnanometer thick Y layers in extreme ultraviolet multilayer mirrors.
    Bosgra J; Zoethout E; van der Eerden AM; Verhoeven J; van de Kruijs RW; Yakshin AE; Bijkerk F
    Appl Opt; 2012 Dec; 51(36):8541-8. PubMed ID: 23262592
    [TBL] [Abstract][Full Text] [Related]  

  • 29. Mo/B4C/Si multilayer-coated photodiode with polarization sensitivity at an extreme-ultraviolet wavelength of 13.5 nm.
    Kjornrattanawanich B; Bajt S; Seely JF
    Appl Opt; 2004 Feb; 43(5):1082-90. PubMed ID: 15008487
    [TBL] [Abstract][Full Text] [Related]  

  • 30. Angular and Spectral Bandwidth of Extreme UV Multilayers Near Spacer Material Absorption Edges.
    Zameshin AA; Yakshin AE; Chandrasekaran A; Bijkerk F
    J Nanosci Nanotechnol; 2019 Jan; 19(1):602-608. PubMed ID: 30327075
    [TBL] [Abstract][Full Text] [Related]  

  • 31. Beryllium-Based Multilayer Mirrors and Filters for the Extreme Ultraviolet Range.
    Nikolay C; Alexey L; Andrey N; Dmitriy P; Alexey P; Vladimir P; Nikolay S; Franz S; Mewael S; Andrey S; Mikhail S; Nikolay T; Sergey Z
    J Nanosci Nanotechnol; 2019 Jan; 19(1):546-553. PubMed ID: 30327068
    [TBL] [Abstract][Full Text] [Related]  

  • 32. Experimental study and modeling of extreme ultraviolet 4000 lines/mm diffraction gratings coated with periodic and aperiodic Al/Mo/SiC multilayers.
    Mahmoud AHK; de Rossi S; Meltchakov E; Capitanio B; Thomasset M; Vallet M; Delmotte F
    Appl Opt; 2024 Jan; 63(1):30-41. PubMed ID: 38175002
    [TBL] [Abstract][Full Text] [Related]  

  • 33. Sub-diffraction-limited multilayer coatings for the 0.3 numerical aperture micro-exposure tool for extreme ultraviolet lithography.
    Soufli R; Hudyma RM; Spiller E; Gullikson EM; Schmidt MA; Robinson JC; Baker SL; Walton CC; Taylor JS
    Appl Opt; 2007 Jun; 46(18):3736-46. PubMed ID: 17538670
    [TBL] [Abstract][Full Text] [Related]  

  • 34. In situ reflectance measurements of soft-x-ray/extreme-ultraviolet Mo/Y multilayer mirrors.
    Montcalm C; Sullivan BT; Duguay S; Ranger M; Steffens W; Pépin H; Chaker M
    Opt Lett; 1995 Jun; 20(12):1450-2. PubMed ID: 19862045
    [TBL] [Abstract][Full Text] [Related]  

  • 35. Physico-Chemical Surface Modifications of Polyetheretherketone (PEEK) Using Extreme Ultraviolet (EUV) Radiation and EUV-Induced Nitrogen Plasma.
    Czwartos J; Budner B; Bartnik A; Wachulak P; Fiedorowicz H; Mierczyk Z
    Materials (Basel); 2020 Oct; 13(19):. PubMed ID: 33050110
    [TBL] [Abstract][Full Text] [Related]  

  • 36. Extreme-ultraviolet Mo/Si multilayer mirrors deposited by radio-frequency-magnetron sputtering.
    Montcalm C; Sullivan BT; Pépin H; Dobrowolski JA; Sutton M
    Appl Opt; 1994 Apr; 33(10):2057-68. PubMed ID: 20885544
    [TBL] [Abstract][Full Text] [Related]  

  • 37. Electron-induced interaction of selected hydrocarbons with TiO2 surfaces: the relevance to extreme ultraviolet lithography.
    Yakshinskiy BV; Zalkind S; Bartynski RA; Caudillo R
    J Phys Condens Matter; 2010 Mar; 22(8):084004. PubMed ID: 21389380
    [TBL] [Abstract][Full Text] [Related]  

  • 38. Atomic-precision multilayer coating of the first set of optics for an extreme-ultraviolet lithography prototype system.
    Montcalm C; Grabner RF; Hudyma RM; Schmidt MA; Spiller E; Walton CC; Wedowski M; Folta JA
    Appl Opt; 2002 Jun; 41(16):3262-9. PubMed ID: 12064411
    [TBL] [Abstract][Full Text] [Related]  

  • 39. Role of dynamic effects in the characterization of multilayers by means of power spectral density.
    Haase A; Soltwisch V; Laubis C; Scholze F
    Appl Opt; 2014 May; 53(14):3019-27. PubMed ID: 24922021
    [TBL] [Abstract][Full Text] [Related]  

  • 40. Enhancement of the reflectivity of Al/Zr multilayers by a novel structure.
    Zhong Q; Zhang Z; Qi R; Li J; Wang Z; Le Guen K; André JM; Jonnard P
    Opt Express; 2013 Jun; 21(12):14399-408. PubMed ID: 23787628
    [TBL] [Abstract][Full Text] [Related]  

    [Previous]   [Next]    [New Search]
    of 8.