These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

253 related articles for article (PubMed ID: 19224020)

  • 1. Nanofabrication in cellulose acetate.
    Zeng H; Lajos R; Metlushko V; Elzy E; An SY; Sautner J
    Lab Chip; 2009 Mar; 9(5):699-703. PubMed ID: 19224020
    [TBL] [Abstract][Full Text] [Related]  

  • 2. Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art.
    Grigorescu AE; Hagen CW
    Nanotechnology; 2009 Jul; 20(29):292001. PubMed ID: 19567961
    [TBL] [Abstract][Full Text] [Related]  

  • 3. Nanoscale patterning by UV nanoimprint lithography using an organometallic resist.
    Acikgoz C; Vratzov B; Hempenius MA; Vancso GJ; Huskens J
    ACS Appl Mater Interfaces; 2009 Nov; 1(11):2645-50. PubMed ID: 20356138
    [TBL] [Abstract][Full Text] [Related]  

  • 4. A high resolution water soluble fullerene molecular resist for electron beam lithography.
    Chen X; Palmer RE; Robinson AP
    Nanotechnology; 2008 Jul; 19(27):275308. PubMed ID: 21828704
    [TBL] [Abstract][Full Text] [Related]  

  • 5. Nanostructured biosensing platform-shadow edge lithography for high-throughput nanofabrication.
    Bai JG; Yeo WH; Chung JH
    Lab Chip; 2009 Feb; 9(3):449-55. PubMed ID: 19156295
    [TBL] [Abstract][Full Text] [Related]  

  • 6. Flying plasmonic lens in the near field for high-speed nanolithography.
    Srituravanich W; Pan L; Wang Y; Sun C; Bogy DB; Zhang X
    Nat Nanotechnol; 2008 Dec; 3(12):733-7. PubMed ID: 19057593
    [TBL] [Abstract][Full Text] [Related]  

  • 7. Fabrication of anisotropically arrayed nano-slots metasurfaces using reflective plasmonic lithography.
    Luo J; Zeng B; Wang C; Gao P; Liu K; Pu M; Jin J; Zhao Z; Li X; Yu H; Luo X
    Nanoscale; 2015 Nov; 7(44):18805-12. PubMed ID: 26507847
    [TBL] [Abstract][Full Text] [Related]  

  • 8. Manipulation of nanoscale phase separation and optical properties of P3HT/PMMA polymer blends for photoluminescent electron beam resist.
    Wu MC; Liao HC; Chou Y; Hsu CP; Yen WC; Chuang CM; Lin YY; Chen CW; Chen YF; Su WF
    J Phys Chem B; 2010 Aug; 114(32):10277-84. PubMed ID: 20666566
    [TBL] [Abstract][Full Text] [Related]  

  • 9. Direct surface structuring of organometallic resists using nanoimprint lithography.
    Acikgoz C; Hempenius MA; Julius Vancso G; Huskens J
    Nanotechnology; 2009 Apr; 20(13):135304. PubMed ID: 19420495
    [TBL] [Abstract][Full Text] [Related]  

  • 10. Multi-silicon ridge nanofabrication by repeated edge lithography.
    Zhao Y; Berenschot E; Jansen H; Tas N; Huskens J; Elwenspoek M
    Nanotechnology; 2009 Aug; 20(31):315305. PubMed ID: 19597243
    [TBL] [Abstract][Full Text] [Related]  

  • 11. Fabrication of high-aspect-ratio Fresnel zone plates by e-beam lithography and electroplating.
    Chen YT; Lo TN; Chiu CW; Wang JY; Wang CL; Liu CJ; Wu SR; Jeng ST; Yang CC; Shiue J; Chen CH; Hwu Y; Yin GC; Lin HM; Je JH; Margaritondo G
    J Synchrotron Radiat; 2008 Mar; 15(Pt 2):170-5. PubMed ID: 18296784
    [TBL] [Abstract][Full Text] [Related]  

  • 12. Solution-processible fabrication of large-area patterned and unpatterned gold nanostructures.
    Zhang X; Liu H; Feng S
    Nanotechnology; 2009 Oct; 20(42):425303. PubMed ID: 19779226
    [TBL] [Abstract][Full Text] [Related]  

  • 13. Three-dimensional deep sub-diffraction optical beam lithography with 9 nm feature size.
    Gan Z; Cao Y; Evans RA; Gu M
    Nat Commun; 2013; 4():2061. PubMed ID: 23784312
    [TBL] [Abstract][Full Text] [Related]  

  • 14. Nanofabrication on unconventional substrates using transferred hard masks.
    Li L; Bayn I; Lu M; Nam CY; Schröder T; Stein A; Harris NC; Englund D
    Sci Rep; 2015 Jan; 5():7802. PubMed ID: 25588550
    [TBL] [Abstract][Full Text] [Related]  

  • 15. Sub-10 nm nanofabrication via nanoimprint directed self-assembly of block copolymers.
    Park SM; Liang X; Harteneck BD; Pick TE; Hiroshiba N; Wu Y; Helms BA; Olynick DL
    ACS Nano; 2011 Nov; 5(11):8523-31. PubMed ID: 21995511
    [TBL] [Abstract][Full Text] [Related]  

  • 16. High-energy electron beam lithography of octadecylphosphonic acid monolayers on aluminum.
    Gadegaard N; Chen X; Rutten FJ; Alexander MR
    Langmuir; 2008 Mar; 24(5):2057-63. PubMed ID: 18215077
    [TBL] [Abstract][Full Text] [Related]  

  • 17. Fabrication of high-resolution nanostructures of complex geometry by the single-spot nanolithography method.
    Samardak A; Anisimova M; Samardak A; Ognev A
    Beilstein J Nanotechnol; 2015; 6():976-86. PubMed ID: 25977869
    [TBL] [Abstract][Full Text] [Related]  

  • 18. Plasmonic devices with controllable resonances--an avenue towards high-speed and mass fabrication of optical meta-materials.
    Kurihara K; Rockstuhl C; Petit S; Yamakawa Y; Tominaga J
    J Microsc; 2008 Mar; 229(Pt 3):396-401. PubMed ID: 18331485
    [TBL] [Abstract][Full Text] [Related]  

  • 19. Sub-10 Nanometer Feature Size in Silicon Using Thermal Scanning Probe Lithography.
    Ryu Cho YK; Rawlings CD; Wolf H; Spieser M; Bisig S; Reidt S; Sousa M; Khanal SR; Jacobs TDB; Knoll AW
    ACS Nano; 2017 Dec; 11(12):11890-11897. PubMed ID: 29083870
    [TBL] [Abstract][Full Text] [Related]  

  • 20. Direct e-beam writing of dense and high aspect ratio nanostructures in thick layers of PMMA for electroplating.
    Gorelick S; Guzenko VA; Vila-Comamala J; David C
    Nanotechnology; 2010 Jul; 21(29):295303. PubMed ID: 20601756
    [TBL] [Abstract][Full Text] [Related]  

    [Next]    [New Search]
    of 13.