These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

104 related articles for article (PubMed ID: 19405476)

  • 1. Pattern size reduction effect via a "mix and match" sequential imprinting technique.
    Chong KS; Low HY
    Langmuir; 2009 Jun; 25(11):6559-64. PubMed ID: 19405476
    [TBL] [Abstract][Full Text] [Related]  

  • 2. Deformation of nanostructures on polymer molds during soft UV nanoimprint lithography.
    Gilles S; Diez M; Offenhäusser A; Lensen MC; Mayer D
    Nanotechnology; 2010 Jun; 21(24):245307. PubMed ID: 20498521
    [TBL] [Abstract][Full Text] [Related]  

  • 3. Replica mold for nanoimprint lithography from a novel hybrid resin.
    Lee BK; Hong LY; Lee HY; Kim DP; Kawai T
    Langmuir; 2009 Oct; 25(19):11768-76. PubMed ID: 19711924
    [TBL] [Abstract][Full Text] [Related]  

  • 4. Nanoscale patterning by UV nanoimprint lithography using an organometallic resist.
    Acikgoz C; Vratzov B; Hempenius MA; Vancso GJ; Huskens J
    ACS Appl Mater Interfaces; 2009 Nov; 1(11):2645-50. PubMed ID: 20356138
    [TBL] [Abstract][Full Text] [Related]  

  • 5. The fabrication scheme of a high resolution and high aspect ratio UV-nanoimprint mold.
    Lim K; Wi JS; Nam SW; Park SY; Lee JJ; Kim KB
    Nanotechnology; 2009 Dec; 20(49):495303. PubMed ID: 19893150
    [TBL] [Abstract][Full Text] [Related]  

  • 6. Room-temperature imprinting poly(acrylic acid)/poly(allylamine hydrochloride) multilayer films by using polymer molds.
    Lu Y; Chen X; Hu W; Lu N; Sun J; Shen J
    Langmuir; 2007 Mar; 23(6):3254-9. PubMed ID: 17269813
    [TBL] [Abstract][Full Text] [Related]  

  • 7. Facile size-tunable fabrication of functional tin dioxide nanostructures by multiple size reduction lithography.
    Park HH; Law WL; Zhang X; Hwang SY; Jung SH; Shin HB; Kang HK; Park HH; Hill RH; Ko CK
    ACS Appl Mater Interfaces; 2012 May; 4(5):2507-14. PubMed ID: 22476795
    [TBL] [Abstract][Full Text] [Related]  

  • 8. Shape and feature size control of colloidal crystal-based patterns using stretched polydimethylsiloxane replica molds.
    Choi HK; Im SH; Park OO
    Langmuir; 2009 Oct; 25(20):12011-4. PubMed ID: 19821618
    [TBL] [Abstract][Full Text] [Related]  

  • 9. Vapor-phase self-assembled monolayer for improved mold release in nanoimprint lithography.
    Jung GY; Li Z; Wu W; Chen Y; Olynick DL; Wang SY; Tong WM; Williams RS
    Langmuir; 2005 Feb; 21(4):1158-61. PubMed ID: 15697253
    [TBL] [Abstract][Full Text] [Related]  

  • 10. Polybenzoxazine as a mold-release agent for nanoimprint lithography.
    Wang CF; Chiou SF; Ko FH; Chen JK; Chou CT; Huang CF; Kuo SW; Chang FC
    Langmuir; 2007 May; 23(11):5868-71. PubMed ID: 17458981
    [TBL] [Abstract][Full Text] [Related]  

  • 11. Relaxation behavior of polymer structures fabricated by nanoimprint lithography.
    Ding Y; Ro HW; Germer TA; Douglas JF; Okerberg BC; Karim A; Soles CL
    ACS Nano; 2007 Sep; 1(2):84-92. PubMed ID: 19206524
    [TBL] [Abstract][Full Text] [Related]  

  • 12. Sub-10 nm nanofabrication via nanoimprint directed self-assembly of block copolymers.
    Park SM; Liang X; Harteneck BD; Pick TE; Hiroshiba N; Wu Y; Helms BA; Olynick DL
    ACS Nano; 2011 Nov; 5(11):8523-31. PubMed ID: 21995511
    [TBL] [Abstract][Full Text] [Related]  

  • 13. Fluorinated organic-inorganic hybrid mold as a new stamp for nanoimprint and soft lithography.
    Choi DG; Jeong JH; Sim YS; Lee ES; Kim WS; Bae BS
    Langmuir; 2005 Oct; 21(21):9390-2. PubMed ID: 16207009
    [TBL] [Abstract][Full Text] [Related]  

  • 14. Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art.
    Grigorescu AE; Hagen CW
    Nanotechnology; 2009 Jul; 20(29):292001. PubMed ID: 19567961
    [TBL] [Abstract][Full Text] [Related]  

  • 15. Measurement of pull-off force on imprinted nanopatterns in an inert liquid.
    Kim JK; Lee DE; Lee WI; Suh KY
    Nanotechnology; 2010 Jul; 21(29):295306. PubMed ID: 20601765
    [TBL] [Abstract][Full Text] [Related]  

  • 16. Simple and scalable preparation of master mold for nanoimprint lithography.
    Yamada Y; Ito K; Miura A; Iizuka H; Wakayama H
    Nanotechnology; 2017 May; 28(20):205303. PubMed ID: 28445164
    [TBL] [Abstract][Full Text] [Related]  

  • 17. Double layer lift-off nanofabrication controlled gaps of nanoelectrodes with sub-100 nm by nanoimprint lithography.
    Wang S; Shi Q; Chai J; Cheng K; Du Z
    Nanotechnology; 2015 May; 26(18):185301. PubMed ID: 25873043
    [TBL] [Abstract][Full Text] [Related]  

  • 18. Templated assembly of metal nanoparticles in nanoimprinted patterns for metal nanowire fabrication.
    Kim EU; Baeg KJ; Noh YY; Kim DY; Lee T; Park I; Jung GY
    Nanotechnology; 2009 Sep; 20(35):355302. PubMed ID: 19671958
    [TBL] [Abstract][Full Text] [Related]  

  • 19. Fabrication of split-ring resonators by tilted nanoimprint lithography.
    Gao L; Lin L; Hao J; Wang W; Ma R; Xu H; Yu J; Lu N; Wang W; Chi L
    J Colloid Interface Sci; 2011 Aug; 360(1):320-3. PubMed ID: 21592486
    [TBL] [Abstract][Full Text] [Related]  

  • 20. Fabrication of complex patterns with a wide range of feature sizes from a single line prepattern by successive application of capillary force lithography.
    Lee SK; Jung JM; Lee JS; Jung HT
    Langmuir; 2010 Sep; 26(17):14359-63. PubMed ID: 20806967
    [TBL] [Abstract][Full Text] [Related]  

    [Next]    [New Search]
    of 6.