275 related articles for article (PubMed ID: 19916401)
21. Optoelectronic Characterization of Ta-Doped ZnO Thin Films by Pulsed Laser Deposition.
Koo HS; Peng JC; Chen M; Chin HI; Chen JY; Wu MK
J Nanosci Nanotechnol; 2015 Nov; 15(11):9222-7. PubMed ID: 26726672
[TBL] [Abstract][Full Text] [Related]
22. A Study on Formation of Aluminum-Doped Zinc Oxide Films by Pulsed-Direct Current Sputtering for CIGS Solar Cells.
Zhao Z; Ryu H; Lee H; Kwon SJ; Cho ES
J Nanosci Nanotechnol; 2021 Sep; 21(9):4632-4637. PubMed ID: 33691842
[TBL] [Abstract][Full Text] [Related]
23. Enhancement of the crystalline Ge film growth by inductively coupled plasma-assisted pulsed DC sputtering.
Kim E; Han SH
J Nanosci Nanotechnol; 2014 Nov; 14(11):8567-71. PubMed ID: 25958564
[TBL] [Abstract][Full Text] [Related]
24. Fluorine-doped tin oxide films grown by pulsed direct current magnetron sputtering with an Sn target.
Liao BH; Kuo CC; Chen PJ; Lee CC
Appl Opt; 2011 Mar; 50(9):C106-10. PubMed ID: 21460922
[TBL] [Abstract][Full Text] [Related]
25. [Preparation of large area Al-ZnO thin film by DC magnetron sputtering].
Jiao F; Liao C; Han JF; Zhou Z
Guang Pu Xue Yu Guang Pu Fen Xi; 2009 Mar; 29(3):698-701. PubMed ID: 19455803
[TBL] [Abstract][Full Text] [Related]
26. Deposition of F-doped ZnO transparent thin films using ZnF2-doped ZnO target under different sputtering substrate temperatures.
Wang FH; Yang CF; Lee YH
Nanoscale Res Lett; 2014 Feb; 9(1):97. PubMed ID: 24572004
[TBL] [Abstract][Full Text] [Related]
27. Spatially Resolved Optoelectronic Properties of Al-Doped Zinc Oxide Thin Films Deposited by Radio-Frequency Magnetron Plasma Sputtering Without Substrate Heating.
Stamate E
Nanomaterials (Basel); 2019 Dec; 10(1):. PubMed ID: 31861533
[TBL] [Abstract][Full Text] [Related]
28. [Structure and luminescence properties of ZnO films prepared by RF magnetron sputtering].
Xu XL; Ma SY; Chen Y; Zhang GH; Sun XJ; Wei JJ
Guang Pu Xue Yu Guang Pu Fen Xi; 2008 Sep; 28(9):2028-32. PubMed ID: 19093554
[TBL] [Abstract][Full Text] [Related]
29. Investigation on Transparent, Conductive ZnO:Al Films Deposited by Atomic Layer Deposition Process.
Zhao K; Xie J; Zhao Y; Han D; Wang Y; Liu B; Dong J
Nanomaterials (Basel); 2022 Jan; 12(1):. PubMed ID: 35010122
[TBL] [Abstract][Full Text] [Related]
30. Study of the properties of ZnO:Zn thin films obtained from ZnO/Zn/ZnO structure deposited by DC sputtering.
Vasquez-A MA; Goiz O; Baca-Arroyo R; Andraca-Adame JA; Romero-Paredes G; Peña-Sierra R
J Nanosci Nanotechnol; 2012 Dec; 12(12):9234-7. PubMed ID: 23447983
[TBL] [Abstract][Full Text] [Related]
31. Thin transparent W-doped indium-zinc oxide (WIZO) layer on glass.
Lee YJ; Lim BW; Kim JH; Kim TW; Oh BY; Heo GS; Kim KY
J Nanosci Nanotechnol; 2012 Jul; 12(7):5604-8. PubMed ID: 22966618
[TBL] [Abstract][Full Text] [Related]
32. High transparent conductive Ga-doped ZnO-based multilayer thin films with embedded ultrathin TiN layer deposited in oxygen-containing atmosphere.
Liu Y; Yu H; Zeng Q; Ruan Q
Opt Lett; 2023 Dec; 48(23):6296-6299. PubMed ID: 38039251
[TBL] [Abstract][Full Text] [Related]
33. Electrical and optical properties of Eu-doped indium oxide thin films deposited by radio-frequency magnetron sputtering.
Woo JK; Cho S
J Nanosci Nanotechnol; 2014 Dec; 14(12):8982-6. PubMed ID: 25970995
[TBL] [Abstract][Full Text] [Related]
34. Comparative Study of Aluminum-Doped Zinc Oxide, Gallium-Doped Zinc Oxide and Indium-Doped Tin Oxide Thin Films Deposited by Radio Frequency Magnetron Sputtering.
Khan S; Stamate E
Nanomaterials (Basel); 2022 May; 12(9):. PubMed ID: 35564248
[TBL] [Abstract][Full Text] [Related]
35. Electrical and Optical Properties of Hydrogen Doped Aluminum-Doped Zinc Oxide Thin Films for Low Cost Applications.
Park YS; Park Y; Kwon S; Kim EK; Choi W; Kim D; Kim M; Lee J
J Nanosci Nanotechnol; 2016 May; 16(5):5096-9. PubMed ID: 27483879
[TBL] [Abstract][Full Text] [Related]
36. Investigation of the Microstructure, Optical, Electrical and Nanomechanical Properties of ZnOx Thin Films Deposited by Magnetron Sputtering.
Mazur M; Obstarczyk A; Posadowski W; Domaradzki J; Kiełczawa S; Wiatrowski A; Wojcieszak D; Kalisz M; Grobelny M; Szmidt J
Materials (Basel); 2022 Sep; 15(19):. PubMed ID: 36233893
[TBL] [Abstract][Full Text] [Related]
37. Controllable Formation of (004)-Orientated Nb:TiO
Yang X; Zhang MJ; Min Y; Xu M; Mei Z; Liang J; Hu J; Yuan S; Xiao S; Duan Y; Liu F; Lin H; Lin Y; Pan F
ACS Appl Mater Interfaces; 2017 Aug; 9(34):29021-29029. PubMed ID: 28791868
[TBL] [Abstract][Full Text] [Related]
38. Study of vanadium doped ZnO films prepared by dc reactive magnetron sputtering at different substrate temperatures.
Meng L; Teixeira V; Dos Santos MP
J Nanosci Nanotechnol; 2013 Feb; 13(2):1381-4. PubMed ID: 23646642
[TBL] [Abstract][Full Text] [Related]
39. Near infrared ray annealing effects on the properties of Al-doped ZnO thin films prepared by spin-coating method.
Jun MC; Park SU; Chae MS; Shin DJ; Ha JG; Koo SM; Lee KJ; Moon BM; Song CY; Koh JH
J Nanosci Nanotechnol; 2013 Sep; 13(9):6312-5. PubMed ID: 24205651
[TBL] [Abstract][Full Text] [Related]
40. Physical and Optical Properties of SnO2/ZnO Film Prepared by an RF Magnetron Sputtering Method.
Park J; Lee I; Kim J
J Nanosci Nanotechnol; 2016 Mar; 16(3):2983-6. PubMed ID: 27455746
[TBL] [Abstract][Full Text] [Related]
[Previous] [Next] [New Search]
