252 related articles for article (PubMed ID: 19942766)
1. Nanoscale lithography via electron beam induced deposition.
Guan Y; Fowlkes JD; Retterer ST; Simpson ML; Rack PD
Nanotechnology; 2008 Dec; 19(50):505302. PubMed ID: 19942766
[TBL] [Abstract][Full Text] [Related]
2. Ga(+) beam lithography for nanoscale silicon reactive ion etching.
Henry MD; Shearn MJ; Chhim B; Scherer A
Nanotechnology; 2010 Jun; 21(24):245303. PubMed ID: 20484788
[TBL] [Abstract][Full Text] [Related]
3. Using colloid lithography to fabricate silicon nanopillar arrays on silicon substrates.
Chen JK; Qui JQ; Fan SK; Kuo SW; Ko FH; Chu CW; Chang FC
J Colloid Interface Sci; 2012 Feb; 367(1):40-8. PubMed ID: 22104277
[TBL] [Abstract][Full Text] [Related]
4. Maskless and resist-free rapid prototyping of three-dimensional structures through electron beam induced deposition (EBID) of carbon in combination with metal-assisted chemical etching (MaCE) of silicon.
Rykaczewski K; Hildreth OJ; Kulkarni D; Henry MR; Kim SK; Wong CP; Tsukruk VV; Fedorov AG
ACS Appl Mater Interfaces; 2010 Apr; 2(4):969-73. PubMed ID: 20356053
[TBL] [Abstract][Full Text] [Related]
5. Observation of free surface-induced bending upon nanopatterning of ultrathin strained silicon layer.
Moutanabbir O; Reiche M; Zakharov N; Naumann F; Petzold M
Nanotechnology; 2011 Jan; 22(4):045701. PubMed ID: 21157010
[TBL] [Abstract][Full Text] [Related]
6. Nanoscale patterning by UV nanoimprint lithography using an organometallic resist.
Acikgoz C; Vratzov B; Hempenius MA; Vancso GJ; Huskens J
ACS Appl Mater Interfaces; 2009 Nov; 1(11):2645-50. PubMed ID: 20356138
[TBL] [Abstract][Full Text] [Related]
7. Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art.
Grigorescu AE; Hagen CW
Nanotechnology; 2009 Jul; 20(29):292001. PubMed ID: 19567961
[TBL] [Abstract][Full Text] [Related]
8. 3D ordered nanostructures fabricated by nanosphere lithography using an organometallic etch mask.
Ling XY; Acikgoz C; Phang IY; Hempenius MA; Reinhoudt DN; Vancso GJ; Huskens J
Nanoscale; 2010 Aug; 2(8):1455-60. PubMed ID: 20820734
[TBL] [Abstract][Full Text] [Related]
9. Fabrication of high-resolution nanostructures of complex geometry by the single-spot nanolithography method.
Samardak A; Anisimova M; Samardak A; Ognev A
Beilstein J Nanotechnol; 2015; 6():976-86. PubMed ID: 25977869
[TBL] [Abstract][Full Text] [Related]
10. Liquid-precursor electron-beam-induced deposition of Pt nanostructures: dose, proximity, resolution.
Donev EU; Hastings JT
Nanotechnology; 2009 Dec; 20(50):505302. PubMed ID: 19923651
[TBL] [Abstract][Full Text] [Related]
11. Patterning of various silicon structures via polymer lithography and catalytic chemical etching.
Lee JP; Bang BM; Choi S; Kim T; Park S
Nanotechnology; 2011 Jul; 22(27):275305. PubMed ID: 21597138
[TBL] [Abstract][Full Text] [Related]
12. A nanoscale three-dimensional Monte Carlo simulation of electron-beam-induced deposition with gas dynamics.
Smith DA; Fowlkes JD; Rack PD
Nanotechnology; 2007 Jul; 18(26):265308. PubMed ID: 21730402
[TBL] [Abstract][Full Text] [Related]
13. Large-scale parallel arrays of silicon nanowires via block copolymer directed self-assembly.
Farrell RA; Kinahan NT; Hansel S; Stuen KO; Petkov N; Shaw MT; West LE; Djara V; Dunne RJ; Varona OG; Gleeson PG; Jung SJ; Kim HY; Koleśnik MM; Lutz T; Murray CP; Holmes JD; Nealey PF; Duesberg GS; Krstić V; Morris MA
Nanoscale; 2012 May; 4(10):3228-36. PubMed ID: 22481430
[TBL] [Abstract][Full Text] [Related]
14. Patterned growth of silicon oxide nanowires from iron ion implanted SiO2 substrates.
Choi Y; Johnson JL; Ural A
Nanotechnology; 2009 Apr; 20(13):135307. PubMed ID: 19420498
[TBL] [Abstract][Full Text] [Related]
15. Manipulation of nanoscale phase separation and optical properties of P3HT/PMMA polymer blends for photoluminescent electron beam resist.
Wu MC; Liao HC; Chou Y; Hsu CP; Yen WC; Chuang CM; Lin YY; Chen CW; Chen YF; Su WF
J Phys Chem B; 2010 Aug; 114(32):10277-84. PubMed ID: 20666566
[TBL] [Abstract][Full Text] [Related]
16. Nanostructure fabrication by ultra-high-resolution environmental scanning electron microscopy.
Toth M; Lobo CJ; Knowles WR; Phillips MR; Postek MT; Vladár AE
Nano Lett; 2007 Feb; 7(2):525-30. PubMed ID: 17298020
[TBL] [Abstract][Full Text] [Related]
17. Functionally decoupled soft lithography for patterning polymer brushes.
Moran IW; Ell JR; Carter KR
Small; 2011 Sep; 7(18):2669-74. PubMed ID: 21818847
[TBL] [Abstract][Full Text] [Related]
18. Aluminum oxide mask fabrication by focused ion beam implantation combined with wet etching.
Liu Z; Iltanen K; Chekurov N; Grigoras K; Tittonen I
Nanotechnology; 2013 May; 24(17):175304. PubMed ID: 23571491
[TBL] [Abstract][Full Text] [Related]
19. High resolution radially symmetric nanostructures from simultaneous electron beam induced etching and deposition.
Lobo CJ; Toth M; Wagner R; Thiel BL; Lysaght M
Nanotechnology; 2008 Jan; 19(2):025303. PubMed ID: 21817540
[TBL] [Abstract][Full Text] [Related]
20. Plasma-Etched Pattern Transfer of Sub-10 nm Structures Using a Metal-Organic Resist and Helium Ion Beam Lithography.
Lewis SM; Hunt MS; DeRose GA; Alty HR; Li J; Wertheim A; De Rose L; Timco GA; Scherer A; Yeates SG; Winpenny REP
Nano Lett; 2019 Sep; 19(9):6043-6048. PubMed ID: 31424217
[TBL] [Abstract][Full Text] [Related]
[Next] [New Search]
