These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.
7. Optical thin film production with continuous reoptimization of layer thicknesses. Holm C Appl Opt; 1979 Jun; 18(12):1978-82. PubMed ID: 20212589 [TBL] [Abstract][Full Text] [Related]
8. Interference effects in the sum frequency generation spectra of thin organic films. I. Theoretical modeling and simulation. Tong Y; Zhao Y; Li N; Osawa M; Davies PB; Ye S J Chem Phys; 2010 Jul; 133(3):034704. PubMed ID: 20649347 [TBL] [Abstract][Full Text] [Related]
10. Interference effects in the sum frequency generation spectra of thin organic films. II: Applications to different thin-film systems. Tong Y; Zhao Y; Li N; Ma Y; Osawa M; Davies PB; Ye S J Chem Phys; 2010 Jul; 133(3):034705. PubMed ID: 20649348 [TBL] [Abstract][Full Text] [Related]
11. Determination of (n,k) for absorbing thin films using reflectance measurements. Siqueiros JM; Regalado LE; Machorro R Appl Opt; 1988 Oct; 27(20):4260-4. PubMed ID: 20539554 [TBL] [Abstract][Full Text] [Related]
12. Practical magnetron sputtering system for the deposition of optical multilayer coatings. Dobrowolski JA; Pekelsky JR; Pelletier R; Ranger M; Sullivan BT; Waldorf AJ Appl Opt; 1992 Jul; 31(19):3784-9. PubMed ID: 20725354 [TBL] [Abstract][Full Text] [Related]
13. The rapid and precise determination of the optical thickness of thin coatings in a vacuum. van Heel AC; van Vonno W Appl Opt; 1967 May; 6(5):793-7. PubMed ID: 20057851 [TBL] [Abstract][Full Text] [Related]
14. Monitoring the Thickness of Thin MgF(2) and LiF Films on Al by Reflectance Measurements Using the 1216-A Line of Hydrogen. Hutcheson ET; Cox JT; Hass G; Hunter WR Appl Opt; 1972 Jul; 11(7):1590-3. PubMed ID: 20119191 [TBL] [Abstract][Full Text] [Related]
15. Stresses developed in optical film coatings. Ennos AE Appl Opt; 1966 Jan; 5(1):51-61. PubMed ID: 20048786 [TBL] [Abstract][Full Text] [Related]
16. Achieving a given reflectance for unpolarized light by controlling the incidence angle and the thickness of a transparent thin film on an absorbing substrate: application to energy equipartition in the four-detector photopolarimeter. Azzam RM; Giardina KA Appl Opt; 1992 Mar; 31(7):935-42. PubMed ID: 20720703 [TBL] [Abstract][Full Text] [Related]
17. Determination of optical constants of absorbing materials using transmission and reflection of thin films on partially metallized substrates: analysis of the new (T,R(m)) technique. Hjortsberg A Appl Opt; 1981 Apr; 20(7):1254-63. PubMed ID: 20309294 [TBL] [Abstract][Full Text] [Related]
18. Evolution of optical thin films by sputtering. Coleman WJ Appl Opt; 1974 Apr; 13(4):946-51. PubMed ID: 20126104 [TBL] [Abstract][Full Text] [Related]