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22. Layer-by-layer design method for multilayers with barrier layers: application to Si/Mo multilayers for extreme-ultraviolet lithography. Larruquert JI J Opt Soc Am A Opt Image Sci Vis; 2004 Sep; 21(9):1750-60. PubMed ID: 15384442 [TBL] [Abstract][Full Text] [Related]
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