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6. Mass fabrication of resistive random access crossbar arrays by step and flash imprint lithography. Yun DK; Kim KD; Kim S; Lee JH; Park HH; Jeong JH; Choi YK; Choi DG Nanotechnology; 2009 Nov; 20(44):445305. PubMed ID: 19809105 [TBL] [Abstract][Full Text] [Related]
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