These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.
148 related articles for article (PubMed ID: 21079291)
1. Toward sub-20 nm hybrid nanofabrication by combining the molecular ruler method and electron beam lithography. Li CB; Hasegawa T; Tanaka H; Miyazaki H; Odaka S; Tsukagoshi K; Aono M Nanotechnology; 2010 Dec; 21(49):495304. PubMed ID: 21079291 [TBL] [Abstract][Full Text] [Related]
2. Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art. Grigorescu AE; Hagen CW Nanotechnology; 2009 Jul; 20(29):292001. PubMed ID: 19567961 [TBL] [Abstract][Full Text] [Related]
3. Effect of molecular adsorption on the electrical conductance of single au nanowires fabricated by electron-beam lithography and focused ion beam etching. Shi P; Zhang J; Lin HY; Bohn PW Small; 2010 Nov; 6(22):2598-603. PubMed ID: 20957763 [TBL] [Abstract][Full Text] [Related]
4. Direct and reliable patterning of plasmonic nanostructures with sub-10-nm gaps. Duan H; Hu H; Kumar K; Shen Z; Yang JK ACS Nano; 2011 Sep; 5(9):7593-600. PubMed ID: 21846105 [TBL] [Abstract][Full Text] [Related]
5. Investigation of a nanofabrication process to achieve high aspect-ratio nanostructures on a quartz substrate. Mohamed K; Alkaisi MM Nanotechnology; 2013 Jan; 24(1):015302. PubMed ID: 23221357 [TBL] [Abstract][Full Text] [Related]
6. Reliable fabrication of 3 nm gaps between nanoelectrodes by electron-beam lithography. Manheller M; Trellenkamp S; Waser R; Karthäuser S Nanotechnology; 2012 Mar; 23(12):125302. PubMed ID: 22414820 [TBL] [Abstract][Full Text] [Related]
7. Single digit nanofabrication by step-and-repeat nanoimprint lithography. Peroz C; Dhuey S; Cornet M; Vogler M; Olynick D; Cabrini S Nanotechnology; 2012 Jan; 23(1):015305. PubMed ID: 22155980 [TBL] [Abstract][Full Text] [Related]
9. Effect of catalyst shape and etchant composition on etching direction in metal-assisted chemical etching of silicon to fabricate 3D nanostructures. Hildreth OJ; Lin W; Wong CP ACS Nano; 2009 Dec; 3(12):4033-42. PubMed ID: 19954171 [TBL] [Abstract][Full Text] [Related]
10. Sub-100 nm silicon nanowires by laser interference lithography and metal-assisted etching. de Boor J; Geyer N; Wittemann JV; Gösele U; Schmidt V Nanotechnology; 2010 Mar; 21(9):095302. PubMed ID: 20110585 [TBL] [Abstract][Full Text] [Related]
11. Carbon nanotube nanoelectronic devices compatible with transmission electron microscopy. Wang H; Luo J; Schäffel F; Rümmeli MH; Briggs GA; Warner JH Nanotechnology; 2011 Jun; 22(24):245305. PubMed ID: 21508501 [TBL] [Abstract][Full Text] [Related]
12. Three-dimensional deep sub-diffraction optical beam lithography with 9 nm feature size. Gan Z; Cao Y; Evans RA; Gu M Nat Commun; 2013; 4():2061. PubMed ID: 23784312 [TBL] [Abstract][Full Text] [Related]
13. Development of Nickel-Based Negative Tone Metal Oxide Cluster Resists for Sub-10 nm Electron Beam and Helium Ion Beam Lithography. Kumar R; Chauhan M; Moinuddin MG; Sharma SK; Gonsalves KE ACS Appl Mater Interfaces; 2020 Apr; 12(17):19616-19624. PubMed ID: 32267144 [TBL] [Abstract][Full Text] [Related]
14. Optimization of e-beam lithography parameters for nanofabrication of sub-50 nm gold nanowires and nanogaps based on a bilayer lift-off process. Sahin O; Albayrak OM; Yapici MK Nanotechnology; 2024 Jul; 35(39):. PubMed ID: 38959870 [TBL] [Abstract][Full Text] [Related]
15. Controllable nanofabrication of aggregate-like nanoparticle substrates and evaluation for surface-enhanced Raman spectroscopy. Wells SM; Retterer SD; Oran JM; Sepaniak MJ ACS Nano; 2009 Dec; 3(12):3845-53. PubMed ID: 19911835 [TBL] [Abstract][Full Text] [Related]
16. 5 nm Nanogap Electrodes and Arrays by Super-resolution Laser Lithography. Qin L; Huang Y; Xia F; Wang L; Ning J; Chen H; Wang X; Zhang W; Peng Y; Liu Q; Zhang Z Nano Lett; 2020 Jul; 20(7):4916-4923. PubMed ID: 32559096 [TBL] [Abstract][Full Text] [Related]
17. Molecular rulers for scaling down nanostructures. Hatzor A; Weiss P Science; 2001 Feb; 291(5506):1019-20. PubMed ID: 11161210 [TBL] [Abstract][Full Text] [Related]
18. Quantized patterning using nanoimprinted blanks. Chou SY; Li WD; Liang X Nanotechnology; 2009 Apr; 20(15):155303. PubMed ID: 19420545 [TBL] [Abstract][Full Text] [Related]
19. Aberration-Corrected Electron Beam Lithography at the One Nanometer Length Scale. Manfrinato VR; Stein A; Zhang L; Nam CY; Yager KG; Stach EA; Black CT Nano Lett; 2017 Aug; 17(8):4562-4567. PubMed ID: 28418673 [TBL] [Abstract][Full Text] [Related]
20. Facile fabrication of microfluidic systems using electron beam lithography. Mali P; Sarkar A; Lal R Lab Chip; 2006 Feb; 6(2):310-5. PubMed ID: 16450043 [TBL] [Abstract][Full Text] [Related] [Next] [New Search]