134 related articles for article (PubMed ID: 21182251)
1. Rectangular patterns using block copolymer directed assembly for high bit aspect ratio patterned media.
Ruiz R; Dobisz E; Albrecht TR
ACS Nano; 2011 Jan; 5(1):79-84. PubMed ID: 21182251
[TBL] [Abstract][Full Text] [Related]
2. Integration of nanoimprint lithography with block copolymer directed self-assembly for fabrication of a sub-20 nm template for bit-patterned media.
Yang X; Xiao S; Hu W; Hwu J; van de Veerdonk R; Wago K; Lee K; Kuo D
Nanotechnology; 2014 Oct; 25(39):395301. PubMed ID: 25189432
[TBL] [Abstract][Full Text] [Related]
3. Directed Block Copolymer Assembly versus Electron Beam Lithography for Bit-Patterned Media with Areal Density of 1 Terabit/inch(2) and Beyond.
Yang X; Wan L; Xiao S; Xu Y; Weller DK
ACS Nano; 2009 Jul; 3(7):1844-58. PubMed ID: 19572736
[TBL] [Abstract][Full Text] [Related]
4. Large-scale parallel arrays of silicon nanowires via block copolymer directed self-assembly.
Farrell RA; Kinahan NT; Hansel S; Stuen KO; Petkov N; Shaw MT; West LE; Djara V; Dunne RJ; Varona OG; Gleeson PG; Jung SJ; Kim HY; Koleśnik MM; Lutz T; Murray CP; Holmes JD; Nealey PF; Duesberg GS; Krstić V; Morris MA
Nanoscale; 2012 May; 4(10):3228-36. PubMed ID: 22481430
[TBL] [Abstract][Full Text] [Related]
5. Pattern dimensions and feature shapes of ternary blends of block copolymer and low molecular weight homopolymers directed to assemble on chemically nanopatterned surfaces.
Nagpal U; Kang H; Craig GS; Nealey PF; de Pablo JJ
ACS Nano; 2011 Jul; 5(7):5673-82. PubMed ID: 21661763
[TBL] [Abstract][Full Text] [Related]
6. Graphoepitaxy of cylinder-forming block copolymers for use as templates to pattern magnetic metal dot arrays.
Xiao S; Yang X; Edwards EW; La YH; Nealey PF
Nanotechnology; 2005 Jul; 16(7):S324-9. PubMed ID: 21727448
[TBL] [Abstract][Full Text] [Related]
7. Servo-integrated patterned media by hybrid directed self-assembly.
Xiao S; Yang X; Steiner P; Hsu Y; Lee K; Wago K; Kuo D
ACS Nano; 2014 Nov; 8(11):11854-9. PubMed ID: 25380228
[TBL] [Abstract][Full Text] [Related]
8. Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries.
Stoykovich MP; Kang H; Daoulas KCh; Liu G; Liu CC; de Pablo JJ; Müller M; Nealey PF
ACS Nano; 2007 Oct; 1(3):168-75. PubMed ID: 19206647
[TBL] [Abstract][Full Text] [Related]
9. Effect of film thickness and domain spacing on defect densities in directed self-assembly of cylindrical morphology block copolymers.
Mishra V; Fredrickson GH; Kramer EJ
ACS Nano; 2012 Mar; 6(3):2629-41. PubMed ID: 22339501
[TBL] [Abstract][Full Text] [Related]
10. Density multiplication and improved lithography by directed block copolymer assembly.
Ruiz R; Kang H; Detcheverry FA; Dobisz E; Kercher DS; Albrecht TR; de Pablo JJ; Nealey PF
Science; 2008 Aug; 321(5891):936-9. PubMed ID: 18703735
[TBL] [Abstract][Full Text] [Related]
11. Surface-directed dewetting of a block copolymer for fabricating highly uniform nanostructured microdroplets and concentric nanorings.
Farrell RA; Kehagias N; Shaw MT; Reboud V; Zelsmann M; Holmes JD; Sotomayor Torres CM; Morris MA
ACS Nano; 2011 Feb; 5(2):1073-85. PubMed ID: 21226483
[TBL] [Abstract][Full Text] [Related]
12. The fabrication of Co-Pt electro-deposited bit patterned media with nanoimprint lithography.
Sohn JS; Lee D; Cho E; Kim HS; Lee BK; Lee MB; Suh SJ
Nanotechnology; 2009 Jan; 20(2):025302. PubMed ID: 19417268
[TBL] [Abstract][Full Text] [Related]
13. A universal approach for template-directed assembly of ultrahigh density magnetic nanodot arrays.
Xia G; Wang S; Jeong SJ
Nanotechnology; 2010 Dec; 21(48):485302. PubMed ID: 21051798
[TBL] [Abstract][Full Text] [Related]
14. Ordering kinetics of block copolymers directed by periodic two-dimensional rectangular fields.
Li W; Xie N; Qiu F; Yang Y; Shi AC
J Chem Phys; 2011 Apr; 134(14):144901. PubMed ID: 21495768
[TBL] [Abstract][Full Text] [Related]
15. The fabrication scheme of a high resolution and high aspect ratio UV-nanoimprint mold.
Lim K; Wi JS; Nam SW; Park SY; Lee JJ; Kim KB
Nanotechnology; 2009 Dec; 20(49):495303. PubMed ID: 19893150
[TBL] [Abstract][Full Text] [Related]
16. Three-dimensional mesoporous structures fabricated by independent stacking of self-assembled films on suspended membranes.
Rose F; Bosworth JK; Dobisz EA; Ruiz R
Nanotechnology; 2011 Jan; 22(3):035603. PubMed ID: 21149954
[TBL] [Abstract][Full Text] [Related]
17. Directed self-assembly of cylinder-forming block copolymers: prepatterning effect on pattern quality and density multiplication factor.
Wan L; Yang X
Langmuir; 2009 Nov; 25(21):12408-13. PubMed ID: 19799403
[TBL] [Abstract][Full Text] [Related]
18. Dense high aspect ratio hydrogen silsesquioxane nanostructures by 100 keV electron beam lithography.
Vila-Comamala J; Gorelick S; Guzenko VA; Färm E; Ritala M; David C
Nanotechnology; 2010 Jul; 21(28):285305. PubMed ID: 20562479
[TBL] [Abstract][Full Text] [Related]
19. Aligned sub-10-nm block copolymer patterns templated by post arrays.
Chang JB; Son JG; Hannon AF; Alexander-Katz A; Ross CA; Berggren KK
ACS Nano; 2012 Mar; 6(3):2071-7. PubMed ID: 22356624
[TBL] [Abstract][Full Text] [Related]
20. Directed assembly of high molecular weight block copolymers: highly ordered line patterns of perpendicularly oriented lamellae with large periods.
Kim E; Ahn H; Park S; Lee H; Lee M; Lee S; Kim T; Kwak EA; Lee JH; Lei X; Huh J; Bang J; Lee B; Ryu du Y
ACS Nano; 2013 Mar; 7(3):1952-60. PubMed ID: 23441640
[TBL] [Abstract][Full Text] [Related]
[Next] [New Search]