These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

109 related articles for article (PubMed ID: 21355593)

  • 1. Role of poly(diallyldimethylammonium chloride) in selective polishing of polysilicon over silicon dioxide and silicon nitride films.
    Penta NK; Dandu Veera PR; Babu SV
    Langmuir; 2011 Apr; 27(7):3502-10. PubMed ID: 21355593
    [TBL] [Abstract][Full Text] [Related]  

  • 2. Reverse selectivity--high silicon nitride and low silicon dioxide removal rates using ceria abrasive-based dispersions.
    Veera Dandu PR; Devarapalli VK; Babu SV
    J Colloid Interface Sci; 2010 Jul; 347(2):267-76. PubMed ID: 20417523
    [TBL] [Abstract][Full Text] [Related]  

  • 3. Novel phosphate-functionalized silica-based dispersions for selectively polishing silicon nitride over silicon dioxide and polysilicon films.
    Veera Dandu PR; Penta NK; Peethala BC; Babu SV
    J Colloid Interface Sci; 2010 Aug; 348(1):114-8. PubMed ID: 20471025
    [TBL] [Abstract][Full Text] [Related]  

  • 4. Charge density and pH effects on polycation adsorption on poly-Si, SiO2, and Si3N4 films and impact on removal during chemical mechanical polishing.
    Penta NK; Veera PR; Babu SV
    ACS Appl Mater Interfaces; 2011 Oct; 3(10):4126-32. PubMed ID: 21939223
    [TBL] [Abstract][Full Text] [Related]  

  • 5. Adsorption behavior of anionic polyelectrolyte for chemical mechanical polishing (CMP).
    Kim S; So JH; Lee DJ; Yang SM
    J Colloid Interface Sci; 2008 Mar; 319(1):48-52. PubMed ID: 18078949
    [TBL] [Abstract][Full Text] [Related]  

  • 6. AFM study of forces between silica, silicon nitride and polyurethane pads.
    Sokolov I; Ong QK; Shodiev H; Chechik N; James D; Oliver M
    J Colloid Interface Sci; 2006 Aug; 300(2):475-81. PubMed ID: 16678193
    [TBL] [Abstract][Full Text] [Related]  

  • 7. Multilayer nanostructured porphyrin arrays constructed by layer-by-layer self-assembly.
    Smith AR; Ruggles JL; Yu A; Gentle IR
    Langmuir; 2009 Sep; 25(17):9873-8. PubMed ID: 19572527
    [TBL] [Abstract][Full Text] [Related]  

  • 8. Comparison of ceria nanoparticle concentrations in effluent from chemical mechanical polishing of silicon dioxide.
    Zazzera L; Mader B; Ellefson M; Eldridge J; Loper S; Zabasajja J; Qian J
    Environ Sci Technol; 2014 Nov; 48(22):13427-33. PubMed ID: 25317965
    [TBL] [Abstract][Full Text] [Related]  

  • 9. Reactive layer-by-layer films from solutions containing silicic acid and a Ti(IV) complex: preferential incorporation of silica and interactions of the obtained films with hexacyanoferrate anions.
    Ball V; Dahéron L; Arnoult C; Toniazzo V; Ruch D
    Langmuir; 2011 Mar; 27(5):1859-66. PubMed ID: 21204542
    [TBL] [Abstract][Full Text] [Related]  

  • 10. Super fine cerium hydroxide abrasives for SiO
    Son YH; Jeong GP; Kim PS; Han MH; Hong SW; Bae JY; Kim SI; Park JH; Park JG
    Sci Rep; 2021 Sep; 11(1):17736. PubMed ID: 34489499
    [TBL] [Abstract][Full Text] [Related]  

  • 11. Dielectric spectroscopy investigation on the interaction of poly(diallyldimethylammonium chloride) with sodium decyl sulfate in aqueous solution.
    Chen Z; Li XW; Zhao KS; Xiao JX; Yang LK
    J Phys Chem B; 2011 May; 115(19):5766-74. PubMed ID: 21506618
    [TBL] [Abstract][Full Text] [Related]  

  • 12. Nanostructured micellar films formed via layer-by-layer deposition of photoactive polymer.
    Zapotoczny S; Golonka M; Nowakowska M
    Langmuir; 2008 Jun; 24(11):5868-76. PubMed ID: 18459750
    [TBL] [Abstract][Full Text] [Related]  

  • 13. The Effects of Precursors on the Morphology and Chemical Mechanical Polishing Performance of Ceria-Based Abrasives.
    Zheng Y; Wang N; Feng Z; Tan X; Zhang Z; Han H; Huang X
    Materials (Basel); 2022 Oct; 15(21):. PubMed ID: 36363118
    [TBL] [Abstract][Full Text] [Related]  

  • 14. Highly porous silicon membranes fabricated from silicon nitride/silicon stacks.
    Qi C; Striemer CC; Gaborski TR; McGrath JL; Fauchet PM
    Small; 2014 Jul; 10(14):2946-53. PubMed ID: 24623562
    [TBL] [Abstract][Full Text] [Related]  

  • 15. Infrared study of the interaction of charged silica particles with TiO2 particles containing adsorbed cationic and anionic polyelectrolytes.
    Li H; Tripp CP
    Langmuir; 2005 Mar; 21(6):2585-90. PubMed ID: 15752056
    [TBL] [Abstract][Full Text] [Related]  

  • 16. Variation of ion-exchange capacity, zeta potential, and ion-transport selectivities with the number of layers in a multilayer polyelectrolyte film.
    Adusumilli M; Bruening ML
    Langmuir; 2009 Jul; 25(13):7478-85. PubMed ID: 19563229
    [TBL] [Abstract][Full Text] [Related]  

  • 17. Silicon Wafer CMP Slurry Using a Hydrolysis Reaction Accelerator with an Amine Functional Group Remarkably Enhances Polishing Rate.
    Bae JY; Han MH; Lee SJ; Kim ES; Lee K; Lee GS; Park JH; Park JG
    Nanomaterials (Basel); 2022 Nov; 12(21):. PubMed ID: 36364668
    [TBL] [Abstract][Full Text] [Related]  

  • 18. Silica particles settling characteristics and removal performances of oxide chemical mechanical polishing wastewater treated by electrocoagulation technology.
    Wang CT; Chou WL; Chen LS; Chang SY
    J Hazard Mater; 2009 Jan; 161(1):344-50. PubMed ID: 18448250
    [TBL] [Abstract][Full Text] [Related]  

  • 19. Comparative study of the uses of poly(4-vinylpyridine) and poly(diallyldimethylammonium) chloride for the removal of perchlorate from aqueous solution by polyelectrolyte-enhanced ultrafiltration.
    Roach JD; Lane RF; Hussain Y
    Water Res; 2011 Jan; 45(3):1387-93. PubMed ID: 21081244
    [TBL] [Abstract][Full Text] [Related]  

  • 20. Preparation of monomodal polyelectrolyte complex nanoparticles of PDADMAC/poly(maleic acid-alt-alpha-methylstyrene) by consecutive centrifugation.
    Müller M; Kessler B; Richter S
    Langmuir; 2005 Jul; 21(15):7044-51. PubMed ID: 16008421
    [TBL] [Abstract][Full Text] [Related]  

    [Next]    [New Search]
    of 6.