These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

102 related articles for article (PubMed ID: 21619023)

  • 1. Mold design rules for residual layer-free patterning in thermal imprint lithography.
    Yoon H; Lee SH; Sung SH; Suh KY; Char K
    Langmuir; 2011 Jun; 27(12):7944-8. PubMed ID: 21619023
    [TBL] [Abstract][Full Text] [Related]  

  • 2. Deformation of nanostructures on polymer molds during soft UV nanoimprint lithography.
    Gilles S; Diez M; Offenhäusser A; Lensen MC; Mayer D
    Nanotechnology; 2010 Jun; 21(24):245307. PubMed ID: 20498521
    [TBL] [Abstract][Full Text] [Related]  

  • 3. Fluorinated organic-inorganic hybrid mold as a new stamp for nanoimprint and soft lithography.
    Choi DG; Jeong JH; Sim YS; Lee ES; Kim WS; Bae BS
    Langmuir; 2005 Oct; 21(21):9390-2. PubMed ID: 16207009
    [TBL] [Abstract][Full Text] [Related]  

  • 4. Low-cost, durable master molds for thermal-NIL, UV-NIL, and injection molding.
    Dundar Arisoy F; Czolkos I; Johansson A; Nielsen T; Watkins JJ
    Nanotechnology; 2020 Jan; 31(1):015302. PubMed ID: 31530757
    [TBL] [Abstract][Full Text] [Related]  

  • 5. Design of reversible cross-linkers for step and flash imprint lithography imprint resists.
    Palmieri F; Adams J; Long B; Heath W; Tsiartas P; Willson CG
    ACS Nano; 2007 Nov; 1(4):307-12. PubMed ID: 19206681
    [TBL] [Abstract][Full Text] [Related]  

  • 6. Soft thermal nanoimprint with a 10 nm feature size.
    Pandey A; Tzadka S; Yehuda D; Schvartzman M
    Soft Matter; 2019 Apr; 15(13):2897-2904. PubMed ID: 30849161
    [TBL] [Abstract][Full Text] [Related]  

  • 7. Replica mold for nanoimprint lithography from a novel hybrid resin.
    Lee BK; Hong LY; Lee HY; Kim DP; Kawai T
    Langmuir; 2009 Oct; 25(19):11768-76. PubMed ID: 19711924
    [TBL] [Abstract][Full Text] [Related]  

  • 8. The fabrication of a flexible mold for high resolution soft ultraviolet nanoimprint lithography.
    Koo N; Plachetka U; Otto M; Bolten J; Jeong JH; Lee ES; Kurz H
    Nanotechnology; 2008 Jun; 19(22):225304. PubMed ID: 21825759
    [TBL] [Abstract][Full Text] [Related]  

  • 9. Surface patterning of glass via electrostatic imprinting using a platinum mold.
    Youn SW; Takagi H; Park SC; Takahashi M; Maeda R
    J Nanosci Nanotechnol; 2012 Apr; 12(4):3181-5. PubMed ID: 22849084
    [TBL] [Abstract][Full Text] [Related]  

  • 10. On the mechanism of low-pressure imprint lithography: capillarity vs viscous flow.
    Khang DY; Lee HH
    Langmuir; 2008 May; 24(10):5459-63. PubMed ID: 18412377
    [TBL] [Abstract][Full Text] [Related]  

  • 11. Double-layer imprint lithography on wafers and foils from the submicrometer to the millimeter scale.
    Moonen PF; Yakimets I; Péter M; Meinders ER; Huskens J
    ACS Appl Mater Interfaces; 2011 Apr; 3(4):1041-8. PubMed ID: 21395235
    [TBL] [Abstract][Full Text] [Related]  

  • 12. Polybenzoxazine as a mold-release agent for nanoimprint lithography.
    Wang CF; Chiou SF; Ko FH; Chen JK; Chou CT; Huang CF; Kuo SW; Chang FC
    Langmuir; 2007 May; 23(11):5868-71. PubMed ID: 17458981
    [TBL] [Abstract][Full Text] [Related]  

  • 13. A new mold structure to replicate patterns over 1 microm in depth for substrate conformal imprint lithography.
    Kim G; Jeong M; Park H; Lim H; Lee J; Choi K
    J Nanosci Nanotechnol; 2013 Dec; 13(12):8036-40. PubMed ID: 24266187
    [TBL] [Abstract][Full Text] [Related]  

  • 14. Simple Isopropanol-Assisted Direct Soft Imprint Lithography for Residue-Free Microstructure Patterning.
    Zhou Q; Lan L; Li Y; Chen B; Huang B; Su H; Xu J; Yang S; Peng J
    ACS Appl Mater Interfaces; 2024 May; 16(21):27560-27565. PubMed ID: 38757777
    [TBL] [Abstract][Full Text] [Related]  

  • 15. Alignment for imprint lithography using nDSE and shallow molds.
    Picciotto C; Gao J; Yu Z; Wu W
    Nanotechnology; 2009 Jun; 20(25):255304. PubMed ID: 19487804
    [TBL] [Abstract][Full Text] [Related]  

  • 16. Efficient methods of nanoimprint stamp cleaning based on imprint self-cleaning effect.
    Meng F; Luo G; Maximov I; Montelius L; Zhou Y; Nilsson L; Carlberg P; Heidari B; Chu J; Xu HQ
    Nanotechnology; 2011 May; 22(18):185301. PubMed ID: 21415472
    [TBL] [Abstract][Full Text] [Related]  

  • 17. Mold cleaning with polydimethylsiloxane for nanoimprint lithography.
    Lin P; Pi S; Jiang H; Xia Q
    Nanotechnology; 2013 Aug; 24(32):325301. PubMed ID: 23863298
    [TBL] [Abstract][Full Text] [Related]  

  • 18. Masterless soft lithography: patterning UV/ozone-induced adhesion on poly(dimethylsiloxane) surfaces.
    Childs WR; Motala MJ; Lee KJ; Nuzzo RG
    Langmuir; 2005 Oct; 21(22):10096-105. PubMed ID: 16229532
    [TBL] [Abstract][Full Text] [Related]  

  • 19. Large-area patterning of coinage-metal thin films using decal transfer lithography.
    Childs WR; Nuzzo RG
    Langmuir; 2005 Jan; 21(1):195-202. PubMed ID: 15620303
    [TBL] [Abstract][Full Text] [Related]  

  • 20. Photocurable silsesquioxane-based formulations as versatile resins for nanoimprint lithography.
    Lee BK; Cha NG; Hong LY; Kim DP; Tanaka H; Lee HY; Kawai T
    Langmuir; 2010 Sep; 26(18):14915-22. PubMed ID: 20731343
    [TBL] [Abstract][Full Text] [Related]  

    [Next]    [New Search]
    of 6.