These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

165 related articles for article (PubMed ID: 21727527)

  • 1. Stamp design effect on 100 nm feature size for 8 inch NanoImprint lithography.
    Landis S; Chaix N; Gourgon C; Perret C; Leveder T
    Nanotechnology; 2006 May; 17(10):2701-9. PubMed ID: 21727527
    [TBL] [Abstract][Full Text] [Related]  

  • 2. Influence of the molecular weight and imprint conditions on the formation of capillary bridges in nanoimprint lithography.
    Chaix N; Gourgon C; Landis S; Perret C; Fink M; Reuther F; Mecerreyes D
    Nanotechnology; 2006 Aug; 17(16):4082-7. PubMed ID: 21727542
    [TBL] [Abstract][Full Text] [Related]  

  • 3. Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art.
    Grigorescu AE; Hagen CW
    Nanotechnology; 2009 Jul; 20(29):292001. PubMed ID: 19567961
    [TBL] [Abstract][Full Text] [Related]  

  • 4. Improvement of the non-uniform resist patterns in the thermal nanoimprint process using Si stamp with nanoscale rod patterns.
    Kim Y; Jang H; Park S; Ha D; Lee J
    J Nanosci Nanotechnol; 2011 Jan; 11(1):301-5. PubMed ID: 21446444
    [TBL] [Abstract][Full Text] [Related]  

  • 5. Quantitative characterizations of a nanopatterned bonded wafer: force determination for nanoimprint lithography stamp removal.
    Landis S; Chaix N; Gourgon C; Leveder T
    Nanotechnology; 2008 Mar; 19(12):125305. PubMed ID: 21817726
    [TBL] [Abstract][Full Text] [Related]  

  • 6. Probing polymer deformation profiles at varying depths in nanoimprint lithography.
    Wang Z; Ding Y
    Nanotechnology; 2010 Mar; 21(10):105301. PubMed ID: 20154381
    [TBL] [Abstract][Full Text] [Related]  

  • 7. Efficient methods of nanoimprint stamp cleaning based on imprint self-cleaning effect.
    Meng F; Luo G; Maximov I; Montelius L; Zhou Y; Nilsson L; Carlberg P; Heidari B; Chu J; Xu HQ
    Nanotechnology; 2011 May; 22(18):185301. PubMed ID: 21415472
    [TBL] [Abstract][Full Text] [Related]  

  • 8. Step and repeat UV nanoimprint lithography on pre-spin coated resist film: a promising route for fabricating nanodevices.
    Peroz C; Dhuey S; Volger M; Wu Y; Olynick D; Cabrini S
    Nanotechnology; 2010 Nov; 21(44):445301. PubMed ID: 20921594
    [TBL] [Abstract][Full Text] [Related]  

  • 9. Fabrication of complex patterns with a wide range of feature sizes from a single line prepattern by successive application of capillary force lithography.
    Lee SK; Jung JM; Lee JS; Jung HT
    Langmuir; 2010 Sep; 26(17):14359-63. PubMed ID: 20806967
    [TBL] [Abstract][Full Text] [Related]  

  • 10. Surface-enhanced Raman spectroscopy substrates created via electron beam lithography and nanotransfer printing.
    Abu Hatab NA; Oran JM; Sepaniak MJ
    ACS Nano; 2008 Feb; 2(2):377-85. PubMed ID: 19206640
    [TBL] [Abstract][Full Text] [Related]  

  • 11. Nanoscale patterning by UV nanoimprint lithography using an organometallic resist.
    Acikgoz C; Vratzov B; Hempenius MA; Vancso GJ; Huskens J
    ACS Appl Mater Interfaces; 2009 Nov; 1(11):2645-50. PubMed ID: 20356138
    [TBL] [Abstract][Full Text] [Related]  

  • 12. Boron nitride stamp for ultra-violet nanoimprinting lithography fabricated by focused ion beam lithography.
    Altun AO; Jeong JH; Rha JJ; Kim KD; Lee ES
    Nanotechnology; 2007 Nov; 18(46):465302. PubMed ID: 21730473
    [TBL] [Abstract][Full Text] [Related]  

  • 13. Silicon Metalens Fabrication from Electron Beam to UV-Nanoimprint Lithography.
    Baracu AM; Avram MA; Breazu C; Bunea MC; Socol M; Stanculescu A; Matei E; Thrane PCV; Dirdal CA; Dinescu A; Rasoga O
    Nanomaterials (Basel); 2021 Sep; 11(9):. PubMed ID: 34578646
    [TBL] [Abstract][Full Text] [Related]  

  • 14. Nanoscale patterning of organic monolayers by catalytic stamp lithography: scope and limitations.
    Mizuno H; Buriak JM
    ACS Appl Mater Interfaces; 2009 Dec; 1(12):2711-20. PubMed ID: 20356148
    [TBL] [Abstract][Full Text] [Related]  

  • 15. Resist Filling Study for UV Nanoimprint Lithography Using Stamps with Various Micro/Nano Ratios.
    Yin M; Sun H; Wang H
    Micromachines (Basel); 2018 Jul; 9(7):. PubMed ID: 30424268
    [TBL] [Abstract][Full Text] [Related]  

  • 16. The fabrication of Co-Pt electro-deposited bit patterned media with nanoimprint lithography.
    Sohn JS; Lee D; Cho E; Kim HS; Lee BK; Lee MB; Suh SJ
    Nanotechnology; 2009 Jan; 20(2):025302. PubMed ID: 19417268
    [TBL] [Abstract][Full Text] [Related]  

  • 17. Microfabrication using elastomeric stamp deformation.
    Fan X; Tran DT; Brennan DP; Oliver SR
    J Phys Chem B; 2006 Jun; 110(24):11986-90. PubMed ID: 16800506
    [TBL] [Abstract][Full Text] [Related]  

  • 18. Direct surface structuring of organometallic resists using nanoimprint lithography.
    Acikgoz C; Hempenius MA; Julius Vancso G; Huskens J
    Nanotechnology; 2009 Apr; 20(13):135304. PubMed ID: 19420495
    [TBL] [Abstract][Full Text] [Related]  

  • 19. Self-modulating polymer resist patterns in pressure-assisted capillary force lithography.
    Yoon H; Kee Choi M; Suh KY; Char K
    J Colloid Interface Sci; 2010 Jun; 346(2):476-82. PubMed ID: 20362997
    [TBL] [Abstract][Full Text] [Related]  

  • 20. Thermal expansion and contraction of an elastomer stamp causes position-dependent polymer patterns in capillary force lithography.
    Kim B; Park M; Kim YS; Jeong U
    ACS Appl Mater Interfaces; 2011 Dec; 3(12):4695-702. PubMed ID: 21986492
    [TBL] [Abstract][Full Text] [Related]  

    [Next]    [New Search]
    of 9.