These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

145 related articles for article (PubMed ID: 21825784)

  • 21. Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat.
    Suh HS; Kim DH; Moni P; Xiong S; Ocola LE; Zaluzec NJ; Gleason KK; Nealey PF
    Nat Nanotechnol; 2017 Jul; 12(6):575-581. PubMed ID: 28346456
    [TBL] [Abstract][Full Text] [Related]  

  • 22. Hierarchical patterns of three-dimensional block-copolymer films formed by electrohydrodynamic jet printing and self-assembly.
    Onses MS; Song C; Williamson L; Sutanto E; Ferreira PM; Alleyne AG; Nealey PF; Ahn H; Rogers JA
    Nat Nanotechnol; 2013 Sep; 8(9):667-75. PubMed ID: 23975188
    [TBL] [Abstract][Full Text] [Related]  

  • 23. Lamellae orientation in block copolymer films with ionic complexes.
    Wang JY; Chen W; Sievert JD; Russell TP
    Langmuir; 2008 Apr; 24(7):3545-50. PubMed ID: 18281999
    [TBL] [Abstract][Full Text] [Related]  

  • 24. Combining double patterning with self-assembled block copolymer lamellae to fabricate 10.5 nm full-pitch line/space patterns.
    Zhou C; Dolejsi M; Xiong S; Ren J; Ashley EM; Craig GSW; Nealey PF
    Nanotechnology; 2019 Nov; 30(45):455302. PubMed ID: 31342916
    [TBL] [Abstract][Full Text] [Related]  

  • 25. Directed self-assembly of a high-chi block copolymer for the fabrication of optical nanoresonators.
    Rasappa S; Schulte L; Ndoni S; Niemi T
    Nanoscale; 2018 Oct; 10(38):18306-18314. PubMed ID: 30246842
    [TBL] [Abstract][Full Text] [Related]  

  • 26. Perpendicular Block Copolymer Microdomains in High Aspect Ratio Templates.
    Bai W; Gadelrab K; Alexander-Katz A; Ross CA
    Nano Lett; 2015 Oct; 15(10):6901-8. PubMed ID: 26390190
    [TBL] [Abstract][Full Text] [Related]  

  • 27. Directed assembly of high molecular weight block copolymers: highly ordered line patterns of perpendicularly oriented lamellae with large periods.
    Kim E; Ahn H; Park S; Lee H; Lee M; Lee S; Kim T; Kwak EA; Lee JH; Lei X; Huh J; Bang J; Lee B; Ryu du Y
    ACS Nano; 2013 Mar; 7(3):1952-60. PubMed ID: 23441640
    [TBL] [Abstract][Full Text] [Related]  

  • 28. The effect of random copolymer on the characteristic dimensions of cylinder-forming PS-b-PMMA thin films.
    Andreozzi A; Poliani E; Seguini G; Perego M
    Nanotechnology; 2011 May; 22(18):185304. PubMed ID: 21415473
    [TBL] [Abstract][Full Text] [Related]  

  • 29. Selective directed self-assembly of coexisting morphologies using block copolymer blends.
    Stein A; Wright G; Yager KG; Doerk GS; Black CT
    Nat Commun; 2016 Aug; 7():12366. PubMed ID: 27480327
    [TBL] [Abstract][Full Text] [Related]  

  • 30. Controlling order in block copolymer thin films for nanopatterning applications.
    Marencic AP; Register RA
    Annu Rev Chem Biomol Eng; 2010; 1():277-97. PubMed ID: 22432582
    [TBL] [Abstract][Full Text] [Related]  

  • 31. Directed Self-Assembly and Pattern Transfer of Five Nanometer Block Copolymer Lamellae.
    Lane AP; Yang X; Maher MJ; Blachut G; Asano Y; Someya Y; Mallavarapu A; Sirard SM; Ellison CJ; Willson CG
    ACS Nano; 2017 Aug; 11(8):7656-7665. PubMed ID: 28700207
    [TBL] [Abstract][Full Text] [Related]  

  • 32. Sub-10 nm feature size PS-b-PDMS block copolymer structures fabricated by a microwave-assisted solvothermal process.
    Borah D; Shaw MT; Holmes JD; Morris MA
    ACS Appl Mater Interfaces; 2013 Mar; 5(6):2004-12. PubMed ID: 23421383
    [TBL] [Abstract][Full Text] [Related]  

  • 33. Proximity injection of plasticizing molecules to self-assembling polymers for large-area, ultrafast nanopatterning in the sub-10-nm regime.
    Jeong JW; Hur YH; Kim HJ; Kim JM; Park WI; Kim MJ; Kim BJ; Jung YS
    ACS Nano; 2013 Aug; 7(8):6747-57. PubMed ID: 23815388
    [TBL] [Abstract][Full Text] [Related]  

  • 34. Aligned sub-10-nm block copolymer patterns templated by post arrays.
    Chang JB; Son JG; Hannon AF; Alexander-Katz A; Ross CA; Berggren KK
    ACS Nano; 2012 Mar; 6(3):2071-7. PubMed ID: 22356624
    [TBL] [Abstract][Full Text] [Related]  

  • 35. Rectangular patterns using block copolymer directed assembly for high bit aspect ratio patterned media.
    Ruiz R; Dobisz E; Albrecht TR
    ACS Nano; 2011 Jan; 5(1):79-84. PubMed ID: 21182251
    [TBL] [Abstract][Full Text] [Related]  

  • 36. Directing Block Copolymer Self-Assembly on Patterned Substrates.
    Gunkel I
    Small; 2018 Nov; 14(46):e1802872. PubMed ID: 30318828
    [TBL] [Abstract][Full Text] [Related]  

  • 37. On the self-assembly of brush block copolymers in thin films.
    Hong SW; Gu W; Huh J; Sveinbjornsson BR; Jeong G; Grubbs RH; Russell TP
    ACS Nano; 2013 Nov; 7(11):9684-92. PubMed ID: 24156297
    [TBL] [Abstract][Full Text] [Related]  

  • 38. Orthogonally Aligned Block Copolymer Line Patterns on Minimal Topographic Patterns.
    Choi J; Li Y; Kim PY; Liu F; Kim H; Yu DM; Huh J; Carter KR; Russell TP
    ACS Appl Mater Interfaces; 2018 Mar; 10(9):8324-8332. PubMed ID: 29443490
    [TBL] [Abstract][Full Text] [Related]  

  • 39. Boundary-directed epitaxy of block copolymers.
    Jacobberger RM; Thapar V; Wu GP; Chang TH; Saraswat V; Way AJ; Jinkins KR; Ma Z; Nealey PF; Hur SM; Xiong S; Arnold MS
    Nat Commun; 2020 Aug; 11(1):4151. PubMed ID: 32814775
    [TBL] [Abstract][Full Text] [Related]  

  • 40. Oligosaccharide/silicon-containing block copolymers with 5 nm features for lithographic applications.
    Cushen JD; Otsuka I; Bates CM; Halila S; Fort S; Rochas C; Easley JA; Rausch EL; Thio A; Borsali R; Willson CG; Ellison CJ
    ACS Nano; 2012 Apr; 6(4):3424-33. PubMed ID: 22456229
    [TBL] [Abstract][Full Text] [Related]  

    [Previous]   [Next]    [New Search]
    of 8.