These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

114 related articles for article (PubMed ID: 22121596)

  • 21. Beam drift and partial probe coherence effects in EUV reflective-mode coherent diffractive imaging.
    Helfenstein P; Rajeev R; Mochi I; Kleibert A; Vaz CAF; Ekinci Y
    Opt Express; 2018 Apr; 26(9):12242-12256. PubMed ID: 29716137
    [TBL] [Abstract][Full Text] [Related]  

  • 22. Interface morphology of Mo/Si multilayer systems with varying Mo layer thickness studied by EUV diffuse scattering.
    Haase A; Soltwisch V; Braun S; Laubis C; Scholze F
    Opt Express; 2017 Jun; 25(13):15441-15455. PubMed ID: 28788969
    [TBL] [Abstract][Full Text] [Related]  

  • 23. Mo/B4C/Si multilayer-coated photodiode with polarization sensitivity at an extreme-ultraviolet wavelength of 13.5 nm.
    Kjornrattanawanich B; Bajt S; Seely JF
    Appl Opt; 2004 Feb; 43(5):1082-90. PubMed ID: 15008487
    [TBL] [Abstract][Full Text] [Related]  

  • 24. Structural properties of Al/Mo/SiC multilayers with high reflectivity for extreme ultraviolet light.
    Hu MH; Le Guen K; André JM; Jonnard P; Meltchakov E; Delmotte F; Galtayries A
    Opt Express; 2010 Sep; 18(19):20019-28. PubMed ID: 20940893
    [TBL] [Abstract][Full Text] [Related]  

  • 25. Mo/Si and Mo/Be multilayer thin films on Zerodur substrates for extreme-ultraviolet lithography.
    Mirkarimi PB; Bajt S; Wall MA
    Appl Opt; 2000 Apr; 39(10):1617-25. PubMed ID: 18345060
    [TBL] [Abstract][Full Text] [Related]  

  • 26. Fast rigorous mask model for extreme ultraviolet lithography.
    Zhang Z; Li S; Wang X; Cheng W
    Appl Opt; 2020 Aug; 59(24):7376-7389. PubMed ID: 32902506
    [TBL] [Abstract][Full Text] [Related]  

  • 27. EUV reflectance and scattering of Mo/Si multilayers on differently polished substrates.
    Schröder S; Feigl T; Duparré A; Tünnermann A
    Opt Express; 2007 Oct; 15(21):13997-4012. PubMed ID: 19550673
    [TBL] [Abstract][Full Text] [Related]  

  • 28. Improved ptychographic inspection of EUV reticles via inclusion of prior information.
    Ansuinelli P; Coene WMJ; Urbach HP
    Appl Opt; 2020 Jul; 59(20):5937-5947. PubMed ID: 32672737
    [TBL] [Abstract][Full Text] [Related]  

  • 29. Evaluation of Metal Absorber Materials for Beyond Extreme Ultraviolet Lithography.
    Hong S; Kim JS; Lee JU; Lee SM; Kim JH; Ahn J
    J Nanosci Nanotechnol; 2015 Nov; 15(11):8652-5. PubMed ID: 26726569
    [TBL] [Abstract][Full Text] [Related]  

  • 30. Optical performance of extreme ultraviolet lithography mask with an indium tin oxide absorber.
    Kang HY; Park S; Hwangbo CK; Seo HS; Kim SS; Cho HK
    J Nanosci Nanotechnol; 2012 Apr; 12(4):3330-3. PubMed ID: 22849118
    [TBL] [Abstract][Full Text] [Related]  

  • 31. Design, fabrication, and analysis of chirped multilayer mirrors for reflection of extreme-ultraviolet attosecond pulses.
    Wonisch A; Neuhäusler U; Kabachnik NM; Uphues T; Uiberacker M; Yakovlev V; Krausz F; Drescher M; Kleineberg U; Heinzmann U
    Appl Opt; 2006 Jun; 45(17):4147-56. PubMed ID: 16761058
    [TBL] [Abstract][Full Text] [Related]  

  • 32. Towards High Accuracy Reflectometry for Extreme-Ultraviolet Lithography.
    Tarrio C; Grantham S; Squires MB; Vest RE; Lucatorto TB
    J Res Natl Inst Stand Technol; 2003; 108(4):267-73. PubMed ID: 27413610
    [TBL] [Abstract][Full Text] [Related]  

  • 33. La/B(4)C multilayer mirrors with an additional wavelength suppression.
    Naujok P; Yulin S; Bianco A; Mahne N; Kaiser N; Tünnermann A
    Opt Express; 2015 Feb; 23(4):4289-95. PubMed ID: 25836465
    [TBL] [Abstract][Full Text] [Related]  

  • 34. High-performance EUV/soft X-ray ellipsometry system using multilayer mirrors.
    Kawamura T; Delaunay JJ; Takenaka H; Hayashi T; Watanabe Y
    J Synchrotron Radiat; 1998 May; 5(Pt 3):735-7. PubMed ID: 15263636
    [TBL] [Abstract][Full Text] [Related]  

  • 35. Thin film multilayer filters for solar EUV telescopes.
    Chkhalo NI; Drozdov MN; Kluenkov EB; Kuzin SV; Lopatin AY; Luchin VI; Salashchenko NN; Tsybin NN; Zuev SY
    Appl Opt; 2016 Jun; 55(17):4683-90. PubMed ID: 27409026
    [TBL] [Abstract][Full Text] [Related]  

  • 36. Properties of broadband depth-graded multilayer mirrors for EUV optical systems.
    Yakshin AE; Kozhevnikov IV; Zoethout E; Louis E; Bijkerk F
    Opt Express; 2010 Mar; 18(7):6957-71. PubMed ID: 20389715
    [TBL] [Abstract][Full Text] [Related]  

  • 37. Extreme-ultraviolet-induced oxidation of Mo/Si multilayers.
    Benoit N; Schröder S; Yulin S; Feigl T; Duparré A; Kaiser N; Tünnermann A
    Appl Opt; 2008 Jul; 47(19):3455-62. PubMed ID: 18594592
    [TBL] [Abstract][Full Text] [Related]  

  • 38. Electro-optical system for scanning microscopy of extreme ultraviolet masks with a high harmonic generation source.
    Naulleau PP; Anderson CN; Anderson EH; Andreson N; Chao W; Choi C; Goldberg KA; Gullikson EM; Kim SS; Lee D; Miyakawa R; Park J; Rekawa S; Salmassi F
    Opt Express; 2014 Aug; 22(17):20144-54. PubMed ID: 25321224
    [TBL] [Abstract][Full Text] [Related]  

  • 39. Amplitude versus phase effects in extreme ultraviolet lithography mask scattering and imaging.
    Naulleau PP; Benk M; Goldberg KA; Gullikson EM; Wojdyla A; Wang YG; Neureuther A
    Appl Opt; 2017 Apr; 56(12):3325-3328. PubMed ID: 28430243
    [TBL] [Abstract][Full Text] [Related]  

  • 40. Analysis of buried interfaces in multilayer mirrors using grazing incidence extreme ultraviolet reflectometry near resonance edges.
    Sertsu MG; Nardello M; Giglia A; Corso AJ; Maurizio C; Juschkin L; Nicolosi P
    Appl Opt; 2015 Dec; 54(35):10351-8. PubMed ID: 26836858
    [TBL] [Abstract][Full Text] [Related]  

    [Previous]   [Next]    [New Search]
    of 6.