These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.
345 related articles for article (PubMed ID: 22121626)
21. Atomic layer deposition of Al-doped ZnO/Al2O3 double layers on vertically aligned carbon nanofiber arrays. Malek GA; Brown E; Klankowski SA; Liu J; Elliot AJ; Lu R; Li J; Wu J ACS Appl Mater Interfaces; 2014 May; 6(9):6865-71. PubMed ID: 24689702 [TBL] [Abstract][Full Text] [Related]
22. Atomic Layer Deposition of High-Quality Al Huang B; Zheng M; Zhao Y; Wu J; Thong JTL ACS Appl Mater Interfaces; 2019 Sep; 11(38):35438-35443. PubMed ID: 31476859 [TBL] [Abstract][Full Text] [Related]
23. Nucleation and growth mechanisms of Al Zhang H; Chiappe D; Meersschaut J; Conard T; Franquet A; Nuytten T; Mannarino M; Radu I; Vandervorst W; Delabie A J Chem Phys; 2017 Feb; 146(5):052810. PubMed ID: 28178804 [TBL] [Abstract][Full Text] [Related]
24. The impact of thickness and thermal annealing on refractive index for aluminum oxide thin films deposited by atomic layer deposition. Wang ZY; Zhang RJ; Lu HL; Chen X; Sun Y; Zhang Y; Wei YF; Xu JP; Wang SY; Zheng YX; Chen LY Nanoscale Res Lett; 2015; 10():46. PubMed ID: 25852343 [TBL] [Abstract][Full Text] [Related]
25. Synthesis of TiO Lemago HH; Addin FS; Kárajz DA; Igricz T; Parditka B; Erdélyi Z; Hessz D; Szilágyi IM Nanomaterials (Basel); 2023 Apr; 13(8):. PubMed ID: 37110896 [TBL] [Abstract][Full Text] [Related]
26. Surface and interfacial study of atomic layer deposited Al Zhu H; Addou R; Wang Q; Nie Y; Cho K; Kim MJ; Wallace RM Nanotechnology; 2020 Jan; 31(5):055704. PubMed ID: 31618710 [TBL] [Abstract][Full Text] [Related]
27. Nano-oxide thin films deposited via atomic layer deposition on microchannel plates. Yan B; Liu S; Heng Y Nanoscale Res Lett; 2015; 10():162. PubMed ID: 25883544 [TBL] [Abstract][Full Text] [Related]
28. Al Schilirò E; Fiorenza P; Lo Nigro R; Galizia B; Greco G; Di Franco S; Bongiorno C; La Via F; Giannazzo F; Roccaforte F Materials (Basel); 2023 Aug; 16(16):. PubMed ID: 37629929 [TBL] [Abstract][Full Text] [Related]
29. Structural evolution and the control of defects in atomic layer deposited HfO2-Al2O3 stacked films on GaAs. Kang YS; Kim DK; Jeong KS; Cho MH; Kim CY; Chung KB; Kim H; Kim DC ACS Appl Mater Interfaces; 2013 Mar; 5(6):1982-9. PubMed ID: 23438318 [TBL] [Abstract][Full Text] [Related]
30. Effect of Co-Reactants on Interfacial Oxidation in Atomic Layer Deposition of Oxides on Metal Surfaces. Swarup JV; Chuang HR; You AL; Engstrom JR ACS Appl Mater Interfaces; 2024 Apr; 16(13):16983-16995. PubMed ID: 38506615 [TBL] [Abstract][Full Text] [Related]
31. Electronic Structure and Charge-Trapping Characteristics of the Al Xu W; Zhang Y; Tang Z; Shao Z; Zhou G; Qin M; Zeng M; Wu S; Zhang Z; Gao J; Lu X; Liu J Nanoscale Res Lett; 2017 Dec; 12(1):270. PubMed ID: 28410556 [TBL] [Abstract][Full Text] [Related]
32. Competition between Al DuMont JW; George SM J Chem Phys; 2017 Feb; 146(5):052819. PubMed ID: 28178819 [TBL] [Abstract][Full Text] [Related]
33. Selective Pulsed Chemical Vapor Deposition of Water-Free TiO Huang J; Cho Y; Zhang Z; Jan A; Wong KT; Nemani SD; Yieh E; Kummel AC ACS Appl Mater Interfaces; 2022 Apr; 14(13):15716-15727. PubMed ID: 35316031 [TBL] [Abstract][Full Text] [Related]
34. Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices. Negara MA; Kitano M; Long RD; McIntyre PC ACS Appl Mater Interfaces; 2016 Aug; 8(32):21089-94. PubMed ID: 27459343 [TBL] [Abstract][Full Text] [Related]
35. Atomic layer etching of Al2O3 using sequential, self-limiting thermal reactions with Sn(acac)2 and hydrogen fluoride. Lee Y; George SM ACS Nano; 2015 Feb; 9(2):2061-70. PubMed ID: 25604976 [TBL] [Abstract][Full Text] [Related]
36. In Hwang ES; Kim JS; Jeon SM; Lee SJ; Jang Y; Cho DY; Hwang CS Nanotechnology; 2018 Apr; 29(15):155203. PubMed ID: 29420311 [TBL] [Abstract][Full Text] [Related]
37. Thermal stability of atomic layer deposited Ru layer on Si and TaN/Si for barrier application of Cu interconnection. Shin DC; Kim MR; Lee JH; Choi BH; Lee HK J Nanosci Nanotechnol; 2012 Jul; 12(7):5631-7. PubMed ID: 22966623 [TBL] [Abstract][Full Text] [Related]
38. Modulating the interface quality and electrical properties of HfTiO/InGaAs gate stack by atomic-layer-deposition-derived Al₂O₃ passivation layer. He G; Gao J; Chen H; Cui J; Sun Z; Chen X ACS Appl Mater Interfaces; 2014 Dec; 6(24):22013-25. PubMed ID: 25471009 [TBL] [Abstract][Full Text] [Related]
39. The Characteristics of Transparent Non-Volatile Memory Devices Employing Si-Rich SiO Park JH; Shin MH; Yi JS Nanomaterials (Basel); 2019 May; 9(5):. PubMed ID: 31121917 [TBL] [Abstract][Full Text] [Related]
40. Structural, optical, and mechanical properties of TiO Ghazaryan L; Handa S; Schmitt P; Beladiya V; Roddatis V; Tünnermann A; Szeghalmi A Nanotechnology; 2021 Feb; 32(9):095709. PubMed ID: 33207326 [TBL] [Abstract][Full Text] [Related] [Previous] [Next] [New Search]