These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.
119 related articles for article (PubMed ID: 22401350)
1. Immobilization of enzyme and antibody on ALD-HfO2-EIS structure by NH3 plasma treatment. Wang IS; Lin YT; Huang CH; Lu TF; Lue CE; Yang P; Pijanswska DG; Yang CM; Wang JC; Yu JS; Chang YS; Chou C; Lai CS Nanoscale Res Lett; 2012 Mar; 7(1):179. PubMed ID: 22401350 [TBL] [Abstract][Full Text] [Related]
2. Preparation of Remote Plasma Atomic Layer-Deposited HfO Yoo JH; Park WJ; Kim SW; Lee GR; Kim JH; Lee JH; Uhm SH; Lee HC Nanomaterials (Basel); 2023 Jun; 13(11):. PubMed ID: 37299688 [TBL] [Abstract][Full Text] [Related]
3. Surface Passivation of Silicon Using HfO Zhang XY; Hsu CH; Lien SY; Chen SY; Huang W; Yang CH; Kung CY; Zhu WZ; Xiong FB; Meng XG Nanoscale Res Lett; 2017 Dec; 12(1):324. PubMed ID: 28476082 [TBL] [Abstract][Full Text] [Related]
4. NH Lin CF; Kao CH; Lin CY; Chen KL; Lin YH Nanomaterials (Basel); 2020 Mar; 10(3):. PubMed ID: 32210105 [TBL] [Abstract][Full Text] [Related]
5. Structural, Optical and Electrical Properties of HfO Kim KM; Jang JS; Yoon SG; Yun JY; Chung NK Materials (Basel); 2020 Apr; 13(9):. PubMed ID: 32344793 [TBL] [Abstract][Full Text] [Related]
7. Structural properties and sensing performance of high-k Nd2TiO5 thin layer-based electrolyte-insulator-semiconductor for pH detection and urea biosensing. Pan TM; Lin JC; Wu MH; Lai CS Biosens Bioelectron; 2009 May; 24(9):2864-70. PubMed ID: 19297144 [TBL] [Abstract][Full Text] [Related]
8. Post-Cleaning Effect on a HfO2 Gate Stack Using a NF3/NH3 Plasma. Lee MS; Oh HJ; Lee JH; Lee IG; Shin WG; Kim KD; Park JG; Ko DH J Nanosci Nanotechnol; 2016 May; 16(5):4808-13. PubMed ID: 27483826 [TBL] [Abstract][Full Text] [Related]
10. Structure and Electrical Behavior of Hafnium-Praseodymium Oxide Thin Films Grown by Atomic Layer Deposition. Kukli K; Aarik L; Vinuesa G; Dueñas S; Castán H; García H; Kasikov A; Ritslaid P; Piirsoo HM; Aarik J Materials (Basel); 2022 Jan; 15(3):. PubMed ID: 35160824 [TBL] [Abstract][Full Text] [Related]
11. Hardness, Modulus, and Refractive Index of Plasma-Assisted Atomic-Layer-Deposited Hafnium Oxide Thin Films Doped with Aluminum Oxide. Kull M; Piirsoo HM; Tarre A; Mändar H; Tamm A; Jõgiaas T Nanomaterials (Basel); 2023 May; 13(10):. PubMed ID: 37242023 [TBL] [Abstract][Full Text] [Related]
13. Silicon Passivation by Ultrathin Hafnium Oxide Layer for Photoelectrochemical Applications. Staišiūnas L; Kalinauskas P; Juzeliūnas E; Grigucevičienė A; Leinartas K; Niaura G; Stanionytė S; Selskis A Front Chem; 2022; 10():859023. PubMed ID: 35402375 [TBL] [Abstract][Full Text] [Related]
14. Achieving a Low-Voltage, High-Mobility IGZO Transistor through an ALD-Derived Bilayer Channel and a Hafnia-Based Gate Dielectric Stack. Cho MH; Choi CH; Seul HJ; Cho HC; Jeong JK ACS Appl Mater Interfaces; 2021 Apr; 13(14):16628-16640. PubMed ID: 33793185 [TBL] [Abstract][Full Text] [Related]
15. Nanostructures Stacked on Hafnium Oxide Films Interfacing Graphene and Silicon Oxide Layers as Resistive Switching Media. Kahro T; Raudonen K; Merisalu J; Tarre A; Ritslaid P; Kasikov A; Jõgiaas T; Käämbre T; Otsus M; Kozlova J; Alles H; Tamm A; Kukli K Nanomaterials (Basel); 2023 Apr; 13(8):. PubMed ID: 37110908 [TBL] [Abstract][Full Text] [Related]
16. Uniformity of HfO Choi B; Kim HU; Jeon N Nanomaterials (Basel); 2022 Dec; 13(1):. PubMed ID: 36616071 [TBL] [Abstract][Full Text] [Related]
17. Corrosion Protection of Copper Using Al Daubert JS; Hill GT; Gotsch HN; Gremaud AP; Ovental JS; Williams PS; Oldham CJ; Parsons GN ACS Appl Mater Interfaces; 2017 Feb; 9(4):4192-4201. PubMed ID: 28098440 [TBL] [Abstract][Full Text] [Related]
18. Improved growth behavior of atomic-layer-deposited high-k dielectrics on multilayer MoS2 by oxygen plasma pretreatment. Yang J; Kim S; Choi W; Park SH; Jung Y; Cho MH; Kim H ACS Appl Mater Interfaces; 2013 Jun; 5(11):4739-44. PubMed ID: 23683268 [TBL] [Abstract][Full Text] [Related]
19. Plasma-Enhanced Atomic Layer Deposition of HfO Beladiya V; Faraz T; Schmitt P; Munser AS; Schröder S; Riese S; Mühlig C; Schachtler D; Steger F; Botha R; Otto F; Fritz T; van Helvoirt C; Kessels WMM; Gargouri H; Szeghalmi A ACS Appl Mater Interfaces; 2022 Mar; 14(12):14677-14692. PubMed ID: 35311275 [TBL] [Abstract][Full Text] [Related]
20. Comparison of NH Kao CH; Chen KL; Chiu YS; Hao LS; Chen SM; Li MH; Lee ML; Chen H Membranes (Basel); 2022 Feb; 12(2):. PubMed ID: 35207109 [TBL] [Abstract][Full Text] [Related] [Next] [New Search]