These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

171 related articles for article (PubMed ID: 22408984)

  • 21. Efficient visible luminescence of nanocrystalline silicon prepared from amorphous silicon films by thermal annealing and stain etching.
    Timoshenko VY; Gonchar KA; Mirgorodskiy IV; Maslova NE; Nikulin VE; Mussabek GK; Taurbaev YT; Svanbayev EA; Taurbaev TI
    Nanoscale Res Lett; 2011 Apr; 6(1):349. PubMed ID: 21711891
    [TBL] [Abstract][Full Text] [Related]  

  • 22. Low temperature silicon nitride by hot wire chemical vapour deposition for the use in impermeable thin film encapsulation on flexible substrates.
    Spee DA; van der Werf CH; Rath JK; Schropp RE
    J Nanosci Nanotechnol; 2011 Sep; 11(9):8202-5. PubMed ID: 22097555
    [TBL] [Abstract][Full Text] [Related]  

  • 23. PECVD based silicon oxynitride thin films for nano photonic on chip interconnects applications.
    Sharma SK; Barthwal S; Singh V; Kumar A; Dwivedi PK; Prasad B; Kumar D
    Micron; 2013 Jan; 44():339-46. PubMed ID: 23092929
    [TBL] [Abstract][Full Text] [Related]  

  • 24. Polymorphous silicon thin films obtained by plasma-enhanced chemical vapor deposition using dichlorosilane as silicon precursor.
    Remolina A; Monroy BM; García-Sánchez MF; Ponce A; Bizarro M; Alonso JC; Ortiz A; Santana G
    Nanotechnology; 2009 Jun; 20(24):245604. PubMed ID: 19471076
    [TBL] [Abstract][Full Text] [Related]  

  • 25. Investigation of structural disorder using electron temperature in VHF-PECVD on hydrogenated amorphous silicon films for thin film solar cell applications.
    Shin C; Park J; Kim S; Jang J; Jung J; Lee YJ; Yi J
    J Nanosci Nanotechnol; 2014 Oct; 14(10):8110-6. PubMed ID: 25942934
    [TBL] [Abstract][Full Text] [Related]  

  • 26. Structural and emission properties of Tb
    Labbé C; An YT; Zatryb G; Portier X; Podhorodecki A; Marie P; Frilay C; Cardin J; Gourbilleau F
    Nanotechnology; 2017 Mar; 28(11):115710. PubMed ID: 28140358
    [TBL] [Abstract][Full Text] [Related]  

  • 27. Role of trimethylboron to silane ratio on the properties of p-type nanocrystalline silicon thin film deposited by radio frequency plasma enhanced chemical vapour deposition.
    Aguas H; Filonovich SA; Bernacka-Wojcik I; Fortunato E; Martins R
    J Nanosci Nanotechnol; 2010 Apr; 10(4):2547-51. PubMed ID: 20355460
    [TBL] [Abstract][Full Text] [Related]  

  • 28. Structure and 1/f noise of boron doped polymorphous silicon films.
    Li SB; Wu ZM; Jiang YD; Li W; Liao NM; Yu JS
    Nanotechnology; 2008 Feb; 19(8):085706. PubMed ID: 21730737
    [TBL] [Abstract][Full Text] [Related]  

  • 29. Spectroscopic ellipsometry analysis of amorphous silicon thin films for Si-nanocrystals.
    Park J; Iftiquar SM; Kim Y; Park S; Lee S; Kim J; Yi J
    J Nanosci Nanotechnol; 2012 Apr; 12(4):3228-32. PubMed ID: 22849094
    [TBL] [Abstract][Full Text] [Related]  

  • 30. Enhanced Photoluminescence of Hydrogenated Amorphous Silicon Carbide Thin Films by Means of a Fast Thermal Annealing Process.
    Vivaldo I; Ambrosio RC; López R; Flores-Méndez J; Sánchez-Gaspariano LA; Moreno M; Candia F
    Materials (Basel); 2020 Jun; 13(11):. PubMed ID: 32531932
    [TBL] [Abstract][Full Text] [Related]  

  • 31. [Spectral Characteristics of Si Quantum Dots Embedded in SiN(x) Thin Films Prepared by Magnetron Co-Sputtering].
    Chen XB; Yang W; Duan LF; Zhang LY; Yang PZ; Song ZN
    Guang Pu Xue Yu Guang Pu Fen Xi; 2015 Jul; 35(7):1770-3. PubMed ID: 26717722
    [TBL] [Abstract][Full Text] [Related]  

  • 32. Thermal expansion coefficient and thermomechanical properties of SiN(x) thin films prepared by plasma-enhanced chemical vapor deposition.
    Tien CL; Lin TW
    Appl Opt; 2012 Oct; 51(30):7229-35. PubMed ID: 23089776
    [TBL] [Abstract][Full Text] [Related]  

  • 33. Theoretical evaluation of thermal decomposition of dichlorosilane for plasma-enhanced atomic layer deposition of silicon nitride: the important role of surface hydrogen.
    Hartmann G; Ventzek PLG; Iwao T; Ishibashi K; Hwang GS
    Phys Chem Chem Phys; 2018 Nov; 20(46):29152-29158. PubMed ID: 30426994
    [TBL] [Abstract][Full Text] [Related]  

  • 34. The role of plasma chemistry on functional silicon nitride film properties deposited at low-temperature by mixing two frequency powers using PECVD.
    Sahu BB; Yin YY; Tsutsumi T; Hori M; Han JG
    Phys Chem Chem Phys; 2016 May; 18(18):13033-44. PubMed ID: 27109293
    [TBL] [Abstract][Full Text] [Related]  

  • 35. Exploring High Refractive Index Silicon-Rich Nitride Films by Low-Temperature Inductively Coupled Plasma Chemical Vapor Deposition and Applications for Integrated Waveguides.
    Ng DK; Wang Q; Wang T; Ng SK; Toh YT; Lim KP; Yang Y; Tan DT
    ACS Appl Mater Interfaces; 2015 Oct; 7(39):21884-9. PubMed ID: 26375453
    [TBL] [Abstract][Full Text] [Related]  

  • 36. Effects of Microwave-Assisted Heat Treatments on the Nanostructural Evolution of Amorphous Silicon Oxycarbide Thin Films.
    Lee SH; Yun HS; Yun BG; Cho NH
    J Nanosci Nanotechnol; 2021 Sep; 21(9):4797-4806. PubMed ID: 33691869
    [TBL] [Abstract][Full Text] [Related]  

  • 37. Revealing Structural Disorder in Hydrogenated Amorphous Silicon for a Low-Loss Photonic Platform at Visible Frequencies.
    Yang Y; Yoon G; Park S; Namgung SD; Badloe T; Nam KT; Rho J
    Adv Mater; 2021 Mar; 33(9):e2005893. PubMed ID: 33511758
    [TBL] [Abstract][Full Text] [Related]  

  • 38. Effect of thermal treatment on the growth, structure and luminescence of nitride-passivated silicon nanoclusters.
    Wilson PR; Roschuk T; Dunn K; Normand EN; Chelomentsev E; Zalloum OH; Wojcik J; Mascher P
    Nanoscale Res Lett; 2011 Feb; 6(1):168. PubMed ID: 21711680
    [TBL] [Abstract][Full Text] [Related]  

  • 39. Ge nanodot-mediated densification and crystallization of low-pressure chemical vapor deposited Si
    Peng KP; Huang TL; George T; Lin HC; Li PW
    Nanotechnology; 2019 Oct; 30(40):405201. PubMed ID: 31247602
    [TBL] [Abstract][Full Text] [Related]  

  • 40. Nanocomposite metal amorphous-carbon thin films deposited by hybrid PVD and PECVD technique.
    Teixeira V; Soares P; Martins AJ; Carneiro J; Cerqueira F
    J Nanosci Nanotechnol; 2009 Jul; 9(7):4061-6. PubMed ID: 19916409
    [TBL] [Abstract][Full Text] [Related]  

    [Previous]   [Next]    [New Search]
    of 9.