These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

145 related articles for article (PubMed ID: 22780100)

  • 1. A simulation study on the effect of cross-linking agent concentration for defect tolerant demolding in UV nanoimprint lithography.
    Amirsadeghi A; Lee JJ; Park S
    Langmuir; 2012 Aug; 28(31):11546-54. PubMed ID: 22780100
    [TBL] [Abstract][Full Text] [Related]  

  • 2. Simulation and investigation of factors affecting high aspect ratio UV embossing.
    Chan-Park MB; Lam YC; Laulia P; Joshi SC
    Langmuir; 2005 Mar; 21(5):2000-7. PubMed ID: 15723501
    [TBL] [Abstract][Full Text] [Related]  

  • 3. Interfacial Interactions during Demolding in Nanoimprint Lithography.
    Li M; Chen Y; Luo W; Cheng X
    Micromachines (Basel); 2021 Mar; 12(4):. PubMed ID: 33805114
    [TBL] [Abstract][Full Text] [Related]  

  • 4. Quantitative characterizations of a nanopatterned bonded wafer: force determination for nanoimprint lithography stamp removal.
    Landis S; Chaix N; Gourgon C; Leveder T
    Nanotechnology; 2008 Mar; 19(12):125305. PubMed ID: 21817726
    [TBL] [Abstract][Full Text] [Related]  

  • 5. The role of hydrophobic silane coating on Si stamps in nanoimprint lithography.
    Amirsadeghi A; Brumfield L; Choi J; Brown E; Lee JJ; Park S
    J Appl Phys; 2017 Jan; 121(4):044909. PubMed ID: 29632415
    [TBL] [Abstract][Full Text] [Related]  

  • 6. Efficient methods of nanoimprint stamp cleaning based on imprint self-cleaning effect.
    Meng F; Luo G; Maximov I; Montelius L; Zhou Y; Nilsson L; Carlberg P; Heidari B; Chu J; Xu HQ
    Nanotechnology; 2011 May; 22(18):185301. PubMed ID: 21415472
    [TBL] [Abstract][Full Text] [Related]  

  • 7. Durable diamond-like carbon templates for UV nanoimprint lithography.
    Tao L; Ramachandran S; Nelson CT; Lin M; Overzet LJ; Goeckner M; Lee G; Willson CG; Wu W; Hu W
    Nanotechnology; 2008 Mar; 19(10):105302. PubMed ID: 21817695
    [TBL] [Abstract][Full Text] [Related]  

  • 8. An oxygen-insensitive degradable resist for fabricating metallic patterns on highly curved surfaces by UV-nanoimprint lithography.
    Hu X; Huang S; Gu R; Yuan C; Ge H; Chen Y
    Macromol Rapid Commun; 2014 Oct; 35(19):1712-8. PubMed ID: 25186342
    [TBL] [Abstract][Full Text] [Related]  

  • 9. Evaluation of resistless Ga⁺ beam lithography for UV NIL stamp fabrication.
    Rumler M; Fader R; Haas A; Rommel M; Bauer AJ; Frey L
    Nanotechnology; 2013 Sep; 24(36):365302. PubMed ID: 23942207
    [TBL] [Abstract][Full Text] [Related]  

  • 10. Silylcarborane acrylate nanoimprint lithography resists.
    Simon YC; Moran IW; Carter KR; Coughlin EB
    ACS Appl Mater Interfaces; 2009 Sep; 1(9):1887-92. PubMed ID: 20355810
    [TBL] [Abstract][Full Text] [Related]  

  • 11. Resist Filling Study for UV Nanoimprint Lithography Using Stamps with Various Micro/Nano Ratios.
    Yin M; Sun H; Wang H
    Micromachines (Basel); 2018 Jul; 9(7):. PubMed ID: 30424268
    [TBL] [Abstract][Full Text] [Related]  

  • 12. Adhesion force measurement between the stamp and the resin in ultraviolet nanoimprint lithography--an investigative approach.
    Perumal J; Yoon TH; Jang HS; Lee JJ; Kim DP
    Nanotechnology; 2009 Feb; 20(5):055704. PubMed ID: 19417363
    [TBL] [Abstract][Full Text] [Related]  

  • 13. Burger Model as the Best Option for Modeling of Viscoelastic Behavior of Resists for Nanoimprint Lithography.
    Grzywacz H; Jenczyk P; Milczarek M; Michałowski M; Jarząbek DM
    Materials (Basel); 2021 Nov; 14(21):. PubMed ID: 34772164
    [TBL] [Abstract][Full Text] [Related]  

  • 14. Molecular Dynamics Study on Behavior of Resist Molecules in UV-Nanoimprint Lithography Filling Process.
    Iwata J; Ando T
    Nanomaterials (Basel); 2022 Jul; 12(15):. PubMed ID: 35893522
    [TBL] [Abstract][Full Text] [Related]  

  • 15. Controlling mold releasing propensity--the role of surface energy and a multiple chain transfer agent.
    Kim BG; Jeong EJ; Kwon KH; Yoo YE; Choi DS; Kim J
    ACS Appl Mater Interfaces; 2012 Jul; 4(7):3465-70. PubMed ID: 22757660
    [TBL] [Abstract][Full Text] [Related]  

  • 16. Polybenzoxazine as a mold-release agent for nanoimprint lithography.
    Wang CF; Chiou SF; Ko FH; Chen JK; Chou CT; Huang CF; Kuo SW; Chang FC
    Langmuir; 2007 May; 23(11):5868-71. PubMed ID: 17458981
    [TBL] [Abstract][Full Text] [Related]  

  • 17. Boron nitride stamp for ultra-violet nanoimprinting lithography fabricated by focused ion beam lithography.
    Altun AO; Jeong JH; Rha JJ; Kim KD; Lee ES
    Nanotechnology; 2007 Nov; 18(46):465302. PubMed ID: 21730473
    [TBL] [Abstract][Full Text] [Related]  

  • 18. Selection of UV-resins for nanostructured molds for thermal-NIL.
    Jia Z; Choi J; Park S
    Nanotechnology; 2018 Sep; 29(36):365302. PubMed ID: 29911991
    [TBL] [Abstract][Full Text] [Related]  

  • 19. Deformation of nanostructures on polymer molds during soft UV nanoimprint lithography.
    Gilles S; Diez M; Offenhäusser A; Lensen MC; Mayer D
    Nanotechnology; 2010 Jun; 21(24):245307. PubMed ID: 20498521
    [TBL] [Abstract][Full Text] [Related]  

  • 20. Improvement of the non-uniform resist patterns in the thermal nanoimprint process using Si stamp with nanoscale rod patterns.
    Kim Y; Jang H; Park S; Ha D; Lee J
    J Nanosci Nanotechnol; 2011 Jan; 11(1):301-5. PubMed ID: 21446444
    [TBL] [Abstract][Full Text] [Related]  

    [Next]    [New Search]
    of 8.