These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

240 related articles for article (PubMed ID: 22802500)

  • 1. Lithography for enabling advances in integrated circuits and devices.
    Garner CM
    Philos Trans A Math Phys Eng Sci; 2012 Aug; 370(1973):4015-41. PubMed ID: 22802500
    [TBL] [Abstract][Full Text] [Related]  

  • 2. Synchrotron Radiation Lithography for Manufacturing Integrated Circuits Beyond 100 nm.
    Kinoshita H; Watanabe T; Niibe M
    J Synchrotron Radiat; 1998 May; 5(Pt 3):320-5. PubMed ID: 15263499
    [TBL] [Abstract][Full Text] [Related]  

  • 3. A new era of semiconductor genetics using ion-sensitive field-effect transistors: the gene-sensitive integrated cell.
    Toumazou C; Thay TS; Georgiou P
    Philos Trans A Math Phys Eng Sci; 2014 Mar; 372(2012):20130112. PubMed ID: 24567478
    [TBL] [Abstract][Full Text] [Related]  

  • 4. Selective electroless metallization of patterned polymeric films for lithography applications.
    Zabetakis D; Dressick WJ
    ACS Appl Mater Interfaces; 2009 Jan; 1(1):4-25. PubMed ID: 20355746
    [TBL] [Abstract][Full Text] [Related]  

  • 5. Trends in imprint lithography for biological applications.
    Truskett VN; Watts MP
    Trends Biotechnol; 2006 Jul; 24(7):312-7. PubMed ID: 16759722
    [TBL] [Abstract][Full Text] [Related]  

  • 6. Advances in Nanoimprint Lithography.
    Traub MC; Longsine W; Truskett VN
    Annu Rev Chem Biomol Eng; 2016 Jun; 7():583-604. PubMed ID: 27070763
    [TBL] [Abstract][Full Text] [Related]  

  • 7. Fabrication of ultrahigh density metal-cell-metal crossbar memory devices with only two cycles of lithography and dry-etch procedures.
    Zong BY; Goh JY; Guo ZB; Luo P; Wang CC; Qiu JJ; Ho P; Chen YJ; Zhang MS; Han GC
    Nanotechnology; 2013 Jun; 24(24):245303. PubMed ID: 23690027
    [TBL] [Abstract][Full Text] [Related]  

  • 8. Lithography, metrology and nanomanufacturing.
    Liddle JA; Gallatin GM
    Nanoscale; 2011 Jul; 3(7):2679-88. PubMed ID: 21487581
    [TBL] [Abstract][Full Text] [Related]  

  • 9. Single-digit-resolution nanopatterning with extreme ultraviolet light for the 2.5 nm technology node and beyond.
    Mojarad N; Hojeij M; Wang L; Gobrecht J; Ekinci Y
    Nanoscale; 2015 Mar; 7(9):4031-7. PubMed ID: 25653148
    [TBL] [Abstract][Full Text] [Related]  

  • 10. Solution-processed ambipolar organic field-effect transistors and inverters.
    Meijer EJ; de Leeuw DM; Setayesh S; van Veenendaal E; Huisman BH; Blom PW; Hummelen JC; Scherf U; Kadam J; Klapwijk TM
    Nat Mater; 2003 Oct; 2(10):678-82. PubMed ID: 14502272
    [TBL] [Abstract][Full Text] [Related]  

  • 11. Nanoimprint lithography steppers for volume fabrication of leading-edge semiconductor integrated circuits.
    Sreenivasan SV
    Microsyst Nanoeng; 2017; 3():17075. PubMed ID: 31057889
    [TBL] [Abstract][Full Text] [Related]  

  • 12. Metal contact engineering and registration-free fabrication of complementary metal-oxide semiconductor integrated circuits using aligned carbon nanotubes.
    Wang C; Ryu K; Badmaev A; Zhang J; Zhou C
    ACS Nano; 2011 Feb; 5(2):1147-53. PubMed ID: 21271709
    [TBL] [Abstract][Full Text] [Related]  

  • 13. Area-selective growth of functional molecular architectures.
    Wang W; Chi L
    Acc Chem Res; 2012 Oct; 45(10):1646-56. PubMed ID: 22830409
    [TBL] [Abstract][Full Text] [Related]  

  • 14. Spin-based logic in semiconductors for reconfigurable large-scale circuits.
    Dery H; Dalal P; Cywiński Ł; Sham LJ
    Nature; 2007 May; 447(7144):573-6. PubMed ID: 17538616
    [TBL] [Abstract][Full Text] [Related]  

  • 15. Pressure driven digital logic in PDMS based microfluidic devices fabricated by multilayer soft lithography.
    Devaraju NS; Unger MA
    Lab Chip; 2012 Nov; 12(22):4809-15. PubMed ID: 23000861
    [TBL] [Abstract][Full Text] [Related]  

  • 16. Few electron limit of n-type metal oxide semiconductor single electron transistors.
    Prati E; De Michielis M; Belli M; Cocco S; Fanciulli M; Kotekar-Patil D; Ruoff M; Kern DP; Wharam DA; Verduijn J; Tettamanzi GC; Rogge S; Roche B; Wacquez R; Jehl X; Vinet M; Sanquer M
    Nanotechnology; 2012 Jun; 23(21):215204. PubMed ID: 22552118
    [TBL] [Abstract][Full Text] [Related]  

  • 17. Large-scale integration: what is yet to come?
    Noyce RN
    Science; 1977 Mar; 195(4283):1102-6. PubMed ID: 17789715
    [TBL] [Abstract][Full Text] [Related]  

  • 18. Lithography Technology for Micro- and Nanofabrication.
    Baek D; Lee SH; Jun BH; Lee SH
    Adv Exp Med Biol; 2021; 1309():217-233. PubMed ID: 33782874
    [TBL] [Abstract][Full Text] [Related]  

  • 19. Designing solution-processable air-stable liquid crystalline crosslinkable semiconductors.
    McCulloch I; Bailey C; Genevicius K; Heeney M; Shkunov M; Sparrowe D; Tierney S; Zhang W; Baldwin R; Kreouzis T; Andreasen JW; Breiby DW; Nielsen MM
    Philos Trans A Math Phys Eng Sci; 2006 Oct; 364(1847):2779-87. PubMed ID: 16973489
    [TBL] [Abstract][Full Text] [Related]  

  • 20. Recent advances in large-scale assembly of semiconducting inorganic nanowires and nanofibers for electronics, sensors and photovoltaics.
    Long YZ; Yu M; Sun B; Gu CZ; Fan Z
    Chem Soc Rev; 2012 Jun; 41(12):4560-80. PubMed ID: 22573265
    [TBL] [Abstract][Full Text] [Related]  

    [Next]    [New Search]
    of 12.