189 related articles for article (PubMed ID: 22854453)
1. Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection.
van den Boogaard AJ; van Goor FA; Louis E; Bijkerk F
Opt Lett; 2012 Jan; 37(2):160-2. PubMed ID: 22854453
[TBL] [Abstract][Full Text] [Related]
2. Infrared diffractive filtering for extreme ultraviolet multilayer Bragg reflectors.
Medvedev VV; van den Boogaard AJ; van der Meer R; Yakshin AE; Louis E; Krivtsun VM; Bijkerk F
Opt Express; 2013 Jul; 21(14):16964-74. PubMed ID: 23938545
[TBL] [Abstract][Full Text] [Related]
3. UV spectral filtering by surface structured multilayer mirrors.
Huang Q; Paardekooper DM; Zoethout E; Medvedev VV; van de Kruijs R; Bosgra J; Louis E; Bijkerk F
Opt Lett; 2014 Mar; 39(5):1185-8. PubMed ID: 24690702
[TBL] [Abstract][Full Text] [Related]
4. Extreme ultraviolet multilayer mirror with near-zero IR reflectance.
Soer WA; Gawlitza P; van Herpen MM; Jak MJ; Braun S; Muys P; Banine VY
Opt Lett; 2009 Dec; 34(23):3680-2. PubMed ID: 19953160
[TBL] [Abstract][Full Text] [Related]
5. Advanced materials for multilayer mirrors for extreme ultraviolet solar astronomy.
Bogachev SA; Chkhalo NI; Kuzin SV; Pariev DE; Polkovnikov VN; Salashchenko NN; Shestov SV; Zuev SY
Appl Opt; 2016 Mar; 55(9):2126-35. PubMed ID: 27140543
[TBL] [Abstract][Full Text] [Related]
6. Infrared suppression by hybrid EUV multilayer--IR etalon structures.
Medvedev VV; Yakshin AE; van de Kruijs RW; Krivtsun VM; Yakunin AM; Koshelev KN; Bijkerk F
Opt Lett; 2011 Sep; 36(17):3344-6. PubMed ID: 21886205
[TBL] [Abstract][Full Text] [Related]
7. High efficiency structured EUV multilayer mirror for spectral filtering of long wavelengths.
Huang Q; de Boer M; Barreaux J; van der Meer R; Louis E; Bijkerk F
Opt Express; 2014 Aug; 22(16):19365-74. PubMed ID: 25321021
[TBL] [Abstract][Full Text] [Related]
8. Infrared antireflective filtering for extreme ultraviolet multilayer Bragg reflectors.
Medvedev VV; Yakshin AE; van de Kruijs RW; Krivtsun VM; Yakunin AM; Koshelev KN; Bijkerk F
Opt Lett; 2012 Apr; 37(7):1169-71. PubMed ID: 22466184
[TBL] [Abstract][Full Text] [Related]
9. Mo/Si and Mo/Be multilayer thin films on Zerodur substrates for extreme-ultraviolet lithography.
Mirkarimi PB; Bajt S; Wall MA
Appl Opt; 2000 Apr; 39(10):1617-25. PubMed ID: 18345060
[TBL] [Abstract][Full Text] [Related]
10. Iridium/silicon multilayers for extreme ultraviolet applications in the 20-35 nm wavelength range.
Zuppella P; Monaco G; Corso AJ; Nicolosi P; Windt DL; Bello V; Mattei G; Pelizzo MG
Opt Lett; 2011 Apr; 36(7):1203-5. PubMed ID: 21479030
[TBL] [Abstract][Full Text] [Related]
11. Structured Mo/Si multilayers for IR-suppression in laser-produced EUV light sources.
Trost M; Schröder S; Duparré A; Risse S; Feigl T; Zeitner UD; Tünnermann A
Opt Express; 2013 Nov; 21(23):27852-64. PubMed ID: 24514302
[TBL] [Abstract][Full Text] [Related]
12. Triple-wavelength, narrowband Mg/SiC multilayers with corrosion barriers and high peak reflectance in the 25-80 nm wavelength region.
Fernández-Perea M; Soufli R; Robinson JC; Rodríguez-De Marcos L; Méndez JA; Larruquert JI; Gullikson EM
Opt Express; 2012 Oct; 20(21):24018-29. PubMed ID: 23188369
[TBL] [Abstract][Full Text] [Related]
13. High-reflection Mo/Be/Si multilayers for EUV lithography.
Chkhalo NI; Gusev SA; Nechay AN; Pariev DE; Polkovnikov VN; Salashchenko NN; Schäfers F; Sertsu MG; Sokolov A; Svechnikov MV; Tatarsky DA
Opt Lett; 2017 Dec; 42(24):5070-5073. PubMed ID: 29240139
[TBL] [Abstract][Full Text] [Related]
14. Influence of barrier interlayers on the performance of Mo/Be multilayer mirrors for next-generation EUV lithography.
Svechnikov MV; Chkhalo NI; Gusev SA; Nechay AN; Pariev DE; Pestov AE; Polkovnikov VN; Tatarskiy DA; Salashchenko NN; Schäfers F; Sertsu MG; Sokolov A; Vainer YA; Zorina MV
Opt Express; 2018 Dec; 26(26):33718-33731. PubMed ID: 30650805
[TBL] [Abstract][Full Text] [Related]
15. Extreme-ultraviolet radiation filtering by freestanding transmission gratings.
Gruntman M
Appl Opt; 1995 Sep; 34(25):5732-7. PubMed ID: 21060405
[TBL] [Abstract][Full Text] [Related]
16. Atomic-precision multilayer coating of the first set of optics for an extreme-ultraviolet lithography prototype system.
Montcalm C; Grabner RF; Hudyma RM; Schmidt MA; Spiller E; Walton CC; Wedowski M; Folta JA
Appl Opt; 2002 Jun; 41(16):3262-9. PubMed ID: 12064411
[TBL] [Abstract][Full Text] [Related]
17. Short period La/B and LaN/B multilayer mirrors for ~6.8 nm wavelength.
Makhotkin IA; Zoethout E; van de Kruijs R; Yakunin SN; Louis E; Yakunin AM; Banine V; Müllender S; Bijkerk F
Opt Express; 2013 Dec; 21(24):29894-904. PubMed ID: 24514540
[TBL] [Abstract][Full Text] [Related]
18. Extreme-ultraviolet Mo/Si multilayer mirrors deposited by radio-frequency-magnetron sputtering.
Montcalm C; Sullivan BT; Pépin H; Dobrowolski JA; Sutton M
Appl Opt; 1994 Apr; 33(10):2057-68. PubMed ID: 20885544
[TBL] [Abstract][Full Text] [Related]
19. Design of multilayer extreme-ultraviolet mirrors for enhanced reflectivity.
Singh M; Braat JJ
Appl Opt; 2000 May; 39(13):2189-97. PubMed ID: 18345125
[TBL] [Abstract][Full Text] [Related]
20. Extreme ultraviolet performance of a multilayer coated high density toroidal grating.
Thomas RJ; Keski-Kuha RA; Neupert WM; Condor CE; Gum JS
Appl Opt; 1991 Jun; 30(16):2245-51. PubMed ID: 20700200
[TBL] [Abstract][Full Text] [Related]
[Next] [New Search]
