146 related articles for article (PubMed ID: 22905282)
1. Probing the Structure and Chemistry of Perylenetetracarboxylic Dianhydride on Graphene Before and After Atomic Layer Deposition of Alumina.
Johns JE; Karmel HJ; Alaboson JM; Hersam MC
J Phys Chem Lett; 2012 Jul; 3(15):1974-1979. PubMed ID: 22905282
[TBL] [Abstract][Full Text] [Related]
2. Seeding atomic layer deposition of high-k dielectrics on epitaxial graphene with organic self-assembled monolayers.
Alaboson JM; Wang QH; Emery JD; Lipson AL; Bedzyk MJ; Elam JW; Pellin MJ; Hersam MC
ACS Nano; 2011 Jun; 5(6):5223-32. PubMed ID: 21553842
[TBL] [Abstract][Full Text] [Related]
3. Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides.
Nourbakhsh A; Adelmann C; Song Y; Lee CS; Asselberghs I; Huyghebaert C; Brizzi S; Tallarida M; Schmeisser D; Van Elshocht S; Heyns M; Kong J; Palacios T; De Gendt S
Nanoscale; 2015 Jun; 7(24):10781-9. PubMed ID: 26036353
[TBL] [Abstract][Full Text] [Related]
4. Interface Electrical Properties of Al
Fisichella G; Schilirò E; Di Franco S; Fiorenza P; Lo Nigro R; Roccaforte F; Ravesi S; Giannazzo F
ACS Appl Mater Interfaces; 2017 Mar; 9(8):7761-7771. PubMed ID: 28135063
[TBL] [Abstract][Full Text] [Related]
5. Functionalized graphene as an ultrathin seed layer for the atomic layer deposition of conformal high-k dielectrics on graphene.
Shin WC; Bong JH; Choi SY; Cho BJ
ACS Appl Mater Interfaces; 2013 Nov; 5(22):11515-9. PubMed ID: 24171487
[TBL] [Abstract][Full Text] [Related]
6. Seeding atomic layer deposition of alumina on graphene with yttria.
Dahal A; Addou R; Azcatl A; Coy-Diaz H; Lu N; Peng X; de Dios F; Kim J; Kim MJ; Wallace RM; Batzill M
ACS Appl Mater Interfaces; 2015 Jan; 7(3):2082-7. PubMed ID: 25556522
[TBL] [Abstract][Full Text] [Related]
7. In Situ Observation of Initial Stage in Dielectric Growth and Deposition of Ultrahigh Nucleation Density Dielectric on Two-Dimensional Surfaces.
Park JH; Movva HC; Chagarov E; Sardashti K; Chou H; Kwak I; Hu KT; Fullerton-Shirey SK; Choudhury P; Banerjee SK; Kummel AC
Nano Lett; 2015 Oct; 15(10):6626-33. PubMed ID: 26393281
[TBL] [Abstract][Full Text] [Related]
8. Two-dimensional BN buffer for plasma enhanced atomic layer deposition of Al
Snure M; Vangala SR; Prusnick T; Grzybowski G; Crespo A; Leedy KD
Sci Rep; 2020 Sep; 10(1):14699. PubMed ID: 32895395
[TBL] [Abstract][Full Text] [Related]
9. Effect of Al
Acharya J; Goul R; Romine D; Sakidja R; Wu J
ACS Appl Mater Interfaces; 2019 Aug; 11(33):30368-30375. PubMed ID: 31356739
[TBL] [Abstract][Full Text] [Related]
10. Atomic-Layer-Deposition Growth of an Ultrathin HfO
Xiao M; Qiu C; Zhang Z; Peng LM
ACS Appl Mater Interfaces; 2017 Oct; 9(39):34050-34056. PubMed ID: 28901123
[TBL] [Abstract][Full Text] [Related]
11. Selective-Area, Water-Free Atomic Layer Deposition of Metal Oxides on Graphene Defects.
Mazza MF; Cabán-Acevedo M; Fu HJ; Meier MC; Thompson AC; Ifkovits ZP; Carim AI; Lewis NS
ACS Mater Au; 2022 Mar; 2(2):74-78. PubMed ID: 36855765
[TBL] [Abstract][Full Text] [Related]
12. Quantitatively enhanced reliability and uniformity of high-κ dielectrics on graphene enabled by self-assembled seeding layers.
Sangwan VK; Jariwala D; Filippone SA; Karmel HJ; Johns JE; Alaboson JM; Marks TJ; Lauhon LJ; Hersam MC
Nano Lett; 2013 Mar; 13(3):1162-7. PubMed ID: 23387502
[TBL] [Abstract][Full Text] [Related]
13. Hydrophobic Surface Treatment and Interrupted Atomic Layer Deposition for Highly Resistive Al
Jeon JH; Jerng SK; Akbar K; Chun SH
ACS Appl Mater Interfaces; 2016 Nov; 8(43):29637-29641. PubMed ID: 27735182
[TBL] [Abstract][Full Text] [Related]
14. Continuous and ultrathin platinum films on graphene using atomic layer deposition: a combined computational and experimental study.
Karasulu B; Vervuurt RH; Kessels WM; Bol AA
Nanoscale; 2016 Dec; 8(47):19829-19845. PubMed ID: 27878204
[TBL] [Abstract][Full Text] [Related]
15. Ambient-Stable Two-Dimensional CrI
Gish JT; Lebedev D; Stanev TK; Jiang S; Georgopoulos L; Song TW; Lim G; Garvey ES; Valdman L; Balogun O; Sofer Z; Sangwan VK; Stern NP; Hersam MC
ACS Nano; 2021 Jun; 15(6):10659-10667. PubMed ID: 34101433
[TBL] [Abstract][Full Text] [Related]
16. Parameter Space of Atomic Layer Deposition of Ultrathin Oxides on Graphene.
Aria AI; Nakanishi K; Xiao L; Braeuninger-Weimer P; Sagade AA; Alexander-Webber JA; Hofmann S
ACS Appl Mater Interfaces; 2016 Nov; 8(44):30564-30575. PubMed ID: 27723305
[TBL] [Abstract][Full Text] [Related]
17. Probing the Dielectric Properties of Ultrathin Al/Al
Acharya J; Wilt J; Liu B; Wu J
ACS Appl Mater Interfaces; 2018 Jan; 10(3):3112-3120. PubMed ID: 29293311
[TBL] [Abstract][Full Text] [Related]
18. Atomic layer deposited high-k dielectric on graphene by functionalization through atmospheric plasma treatment.
Shin JW; Kang MH; Oh S; Yang BC; Seong K; Ahn HS; Lee TH; An J
Nanotechnology; 2018 May; 29(19):195602. PubMed ID: 29461257
[TBL] [Abstract][Full Text] [Related]
19. Ultrathin oxide films by atomic layer deposition on graphene.
Wang L; Travis JJ; Cavanagh AS; Liu X; Koenig SP; Huang PY; George SM; Bunch JS
Nano Lett; 2012 Jul; 12(7):3706-10. PubMed ID: 22716769
[TBL] [Abstract][Full Text] [Related]
20. Fluorinated graphene and hexagonal boron nitride as ALD seed layers for graphene-based van der Waals heterostructures.
Guo H; Liu Y; Xu Y; Meng N; Wang H; Hasan T; Wang X; Luo J; Yu B
Nanotechnology; 2014 Sep; 25(35):355202. PubMed ID: 25116064
[TBL] [Abstract][Full Text] [Related]
[Next] [New Search]
