306 related articles for article (PubMed ID: 23092929)
1. PECVD based silicon oxynitride thin films for nano photonic on chip interconnects applications.
Sharma SK; Barthwal S; Singh V; Kumar A; Dwivedi PK; Prasad B; Kumar D
Micron; 2013 Jan; 44():339-46. PubMed ID: 23092929
[TBL] [Abstract][Full Text] [Related]
2. [Influence of annealing and sputtering ambience on the photoluminescence of silicon nitride thin films].
Jia XY; Xu Z; Zhao SL; Zhang FJ; Zhao DW; Tang Y; Li Y; Zhou CL; Wang WJ
Guang Pu Xue Yu Guang Pu Fen Xi; 2008 Nov; 28(11):2494-7. PubMed ID: 19271474
[TBL] [Abstract][Full Text] [Related]
3. Atmospheric-pressure plasma-enhanced chemical vapor deposition of a-SiCN:H films: role of precursors on the film growth and properties.
Guruvenket S; Andrie S; Simon M; Johnson KW; Sailer RA
ACS Appl Mater Interfaces; 2012 Oct; 4(10):5293-9. PubMed ID: 22979919
[TBL] [Abstract][Full Text] [Related]
4. Phase stabilization by rapid thermal annealing in amorphous hydrogenated silicon nitride film.
Singh SP; Srivastava P; Ghosh S; Khan SA; Vijaya Prakash G
J Phys Condens Matter; 2009 Mar; 21(9):095010. PubMed ID: 21817383
[TBL] [Abstract][Full Text] [Related]
5. [Bonding structure in silicon nitride thin films containing silicon nano-particles].
Ding WG; Yu W; Yang YB; Zhang JY; Fu GS
Guang Pu Xue Yu Guang Pu Fen Xi; 2006 Oct; 26(10):1798-801. PubMed ID: 17205723
[TBL] [Abstract][Full Text] [Related]
6. [Comparative study on photoluminescence from Ge/PS and Ge/SiO2 thin films].
Sun XJ; Ma SY; Wei JJ; Xu XL
Guang Pu Xue Yu Guang Pu Fen Xi; 2008 Sep; 28(9):2033-7. PubMed ID: 19093555
[TBL] [Abstract][Full Text] [Related]
7. Structural and optical properties of silicon oxynitride on silicon planar waveguides.
Giudice MD; Bruno F; Cicinelli T; Valli M
Appl Opt; 1990 Aug; 29(24):3489-96. PubMed ID: 20567442
[TBL] [Abstract][Full Text] [Related]
8. Structural evolution of nanocrystalline silicon thin films synthesized in high-density, low-temperature reactive plasmas.
Cheng Q; Xu S; Ostrikov KK
Nanotechnology; 2009 May; 20(21):215606. PubMed ID: 19423937
[TBL] [Abstract][Full Text] [Related]
9. Ellipsometric and Rutherford Back scattering Spectrometry studies of SiO(X)N(Y) films elaborated by plasma-enhanced chemical vapour deposition technique.
Mahamdi R; Boulesbaa M; Saci L; Mansour F; Molliet C; Collet M; Temple-Boyer P
J Nanosci Nanotechnol; 2011 Oct; 11(10):9118-22. PubMed ID: 22400311
[TBL] [Abstract][Full Text] [Related]
10. Structural and emission properties of Tb
Labbé C; An YT; Zatryb G; Portier X; Podhorodecki A; Marie P; Frilay C; Cardin J; Gourbilleau F
Nanotechnology; 2017 Mar; 28(11):115710. PubMed ID: 28140358
[TBL] [Abstract][Full Text] [Related]
11. Influence of annealing temperature on Raman and photoluminescence spectra of electron beam evaporated TiO₂ thin films.
Vishwas M; Narasimha Rao K; Chakradhar RP
Spectrochim Acta A Mol Biomol Spectrosc; 2012 Dec; 99():33-6. PubMed ID: 23041919
[TBL] [Abstract][Full Text] [Related]
12. Low-temperature deposition of high-quality silicon oxynitride films for CMOS-integrated optics.
Rangarajan B; Kovalgin AY; Wörhoff K; Schmitz J
Opt Lett; 2013 Mar; 38(6):941-3. PubMed ID: 23503267
[TBL] [Abstract][Full Text] [Related]
13. Reactive ion assisted deposition of aluminum oxynitride thin films.
Hwangbo CK; Lingg LJ; Lehan JP; Macleod HA; Suits F
Appl Opt; 1989 Jul; 28(14):2779-84. PubMed ID: 20555598
[TBL] [Abstract][Full Text] [Related]
14. Low-pressure chemical vapor deposition silicon-oxynitride films for integrated optics.
Gleine W; Müller J
Appl Opt; 1992 Apr; 31(12):2036-40. PubMed ID: 20720856
[TBL] [Abstract][Full Text] [Related]
15. Compositional and optical properties of SiO x films and (SiO x /SiO y ) junctions deposited by HFCVD.
Vázquez-Valerdi DE; Luna-López JA; Carrillo-López J; García-Salgado G; Benítez-Lara A; Espinosa-Torres ND
Nanoscale Res Lett; 2014; 9(1):422. PubMed ID: 25342935
[TBL] [Abstract][Full Text] [Related]
16. Structure and 1/f noise of boron doped polymorphous silicon films.
Li SB; Wu ZM; Jiang YD; Li W; Liao NM; Yu JS
Nanotechnology; 2008 Feb; 19(8):085706. PubMed ID: 21730737
[TBL] [Abstract][Full Text] [Related]
17. Kinetic Monte Carlo simulations of surface growth during plasma deposition of silicon thin films.
Pandey SC; Singh T; Maroudas D
J Chem Phys; 2009 Jul; 131(3):034503. PubMed ID: 19624205
[TBL] [Abstract][Full Text] [Related]
18. Magnetron co-sputtered silicon-containing hydroxyapatite thin films--an in vitro study.
Thian ES; Huang J; Best SM; Barber ZH; Bonfield W
Biomaterials; 2005 Jun; 26(16):2947-56. PubMed ID: 15603789
[TBL] [Abstract][Full Text] [Related]
19. Nano-polycrystalline vanadium oxide thin films prepared by pulsed laser deposition.
Wang YL; Li MC; Chen XK; Wu G; Yang JP; Wang R; Zhao LC
J Nanosci Nanotechnol; 2008 May; 8(5):2604-8. PubMed ID: 18572691
[TBL] [Abstract][Full Text] [Related]
20. Low-plasma and high-temperature PECVD grown silicon-rich SiO(x) film with enhanced carrier tunneling and light emission.
Lin GR; Lin CJ; Lin CT
Nanotechnology; 2007 Oct; 18(39):395202. PubMed ID: 21730413
[TBL] [Abstract][Full Text] [Related]
[Next] [New Search]
