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68. Ultra-high aspect ratio Si nanowires fabricated with plasma etching: plasma processing, mechanical stability analysis against adhesion and capillary forces and oleophobicity. Zeniou A; Ellinas K; Olziersky A; Gogolides E Nanotechnology; 2014 Jan; 25(3):035302. PubMed ID: 24346308 [TBL] [Abstract][Full Text] [Related]
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