These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

267 related articles for article (PubMed ID: 23421383)

  • 1. Sub-10 nm feature size PS-b-PDMS block copolymer structures fabricated by a microwave-assisted solvothermal process.
    Borah D; Shaw MT; Holmes JD; Morris MA
    ACS Appl Mater Interfaces; 2013 Mar; 5(6):2004-12. PubMed ID: 23421383
    [TBL] [Abstract][Full Text] [Related]  

  • 2. Swift nanopattern formation of PS-b-PMMA and PS-b-PDMS block copolymer films using a microwave assisted technique.
    Borah D; Senthamaraikannan R; Rasappa S; Kosmala B; Holmes JD; Morris MA
    ACS Nano; 2013 Aug; 7(8):6583-96. PubMed ID: 23859379
    [TBL] [Abstract][Full Text] [Related]  

  • 3. Orientation and alignment control of microphase-separated PS-b-PDMS substrate patterns via polymer brush chemistry.
    Borah D; Rasappa S; Senthamaraikannan R; Kosmala B; Shaw MT; Holmes JD; Morris MA
    ACS Appl Mater Interfaces; 2013 Jan; 5(1):88-97. PubMed ID: 23227917
    [TBL] [Abstract][Full Text] [Related]  

  • 4. Tuning PDMS brush chemistry by UV-O3 exposure for PS-b-PDMS microphase separation and directed self-assembly.
    Borah D; Rasappa S; Senthamaraikannan R; Holmes JD; Morris MA
    Langmuir; 2013 Jul; 29(28):8959-68. PubMed ID: 23751134
    [TBL] [Abstract][Full Text] [Related]  

  • 5. Conversion of bilayers of PS-b-PDMS block copolymer into closely packed, aligned silica nanopatterns.
    Wu NL; Harris KD; Buriak JM
    ACS Nano; 2013 Jun; 7(6):5595-606. PubMed ID: 23675942
    [TBL] [Abstract][Full Text] [Related]  

  • 6. Pulsed transfer etching of PS-PDMS block copolymers self-assembled in 193 nm lithography stacks.
    Girardot C; Böhme S; Archambault S; Salaün M; Latu-Romain E; Cunge G; Joubert O; Zelsmann M
    ACS Appl Mater Interfaces; 2014 Sep; 6(18):16276-82. PubMed ID: 25111901
    [TBL] [Abstract][Full Text] [Related]  

  • 7. Nanoscale silicon substrate patterns from self-assembly of cylinder forming poly(styrene)-block-poly(dimethylsiloxane) block copolymer on silane functionalized surfaces.
    Borah D; Cummins C; Rasappa S; Watson SM; Pike AR; Horrocks BR; Fulton DA; Houlton A; Liontos G; Ntetsikas K; Avgeropoulos A; Morris MA
    Nanotechnology; 2017 Jan; 28(4):044001. PubMed ID: 27981945
    [TBL] [Abstract][Full Text] [Related]  

  • 8. Deconvoluting the mechanism of microwave annealing of block copolymer thin films.
    Jin C; Murphy JN; Harris KD; Buriak JM
    ACS Nano; 2014 Apr; 8(4):3979-91. PubMed ID: 24655292
    [TBL] [Abstract][Full Text] [Related]  

  • 9. Sub-10 nm nanofabrication via nanoimprint directed self-assembly of block copolymers.
    Park SM; Liang X; Harteneck BD; Pick TE; Hiroshiba N; Wu Y; Helms BA; Olynick DL
    ACS Nano; 2011 Nov; 5(11):8523-31. PubMed ID: 21995511
    [TBL] [Abstract][Full Text] [Related]  

  • 10. Solvothermal Vapor Annealing of Lamellar Poly(styrene)-block-poly(d,l-lactide) Block Copolymer Thin Films for Directed Self-Assembly Application.
    Cummins C; Mokarian-Tabari P; Andreazza P; Sinturel C; Morris MA
    ACS Appl Mater Interfaces; 2016 Mar; 8(12):8295-304. PubMed ID: 26950246
    [TBL] [Abstract][Full Text] [Related]  

  • 11. Sub-10 nm Silicon Nanopillar Fabrication Using Fast and Brushless Thermal Assembly of PS-b-PDMS Diblock Copolymer.
    Garnier J; Arias-Zapata J; Marconot O; Arnaud S; Böhme S; Girardot C; Buttard D; Zelsmann M
    ACS Appl Mater Interfaces; 2016 Apr; 8(15):9954-60. PubMed ID: 27020847
    [TBL] [Abstract][Full Text] [Related]  

  • 12. Directed Self-Assembly of Star-Block Copolymers by Topographic Nanopatterns through Nucleation and Growth Mechanism.
    Krishnan MR; Lu KY; Chiu WY; Chen IC; Lin JW; Lo TY; Georgopanos P; Avgeropoulos A; Lee MC; Ho RM
    Small; 2018 Apr; 14(16):e1704005. PubMed ID: 29573555
    [TBL] [Abstract][Full Text] [Related]  

  • 13. Ultrafast Self-Assembly of Sub-10 nm Block Copolymer Nanostructures by Solvent-Free High-Temperature Laser Annealing.
    Jiang J; Jacobs AG; Wenning B; Liedel C; Thompson MO; Ober CK
    ACS Appl Mater Interfaces; 2017 Sep; 9(37):31317-31324. PubMed ID: 28598156
    [TBL] [Abstract][Full Text] [Related]  

  • 14. Fast assembly of ordered block copolymer nanostructures through microwave annealing.
    Zhang X; Harris KD; Wu NL; Murphy JN; Buriak JM
    ACS Nano; 2010 Nov; 4(11):7021-9. PubMed ID: 20964379
    [TBL] [Abstract][Full Text] [Related]  

  • 15. The fabrication of highly ordered block copolymer micellar arrays: control of the separation distances of silicon oxide dots.
    Yoo H; Park S
    Nanotechnology; 2010 Jun; 21(24):245304. PubMed ID: 20498523
    [TBL] [Abstract][Full Text] [Related]  

  • 16. Study of the kinetics and mechanism of rapid self-assembly in block copolymer thin films during solvo-microwave annealing.
    Mokarian-Tabari P; Cummins C; Rasappa S; Simao C; Sotomayor Torres CM; Holmes JD; Morris MA
    Langmuir; 2014 Sep; 30(35):10728-39. PubMed ID: 25137566
    [TBL] [Abstract][Full Text] [Related]  

  • 17. Chemical patterns from surface grafted resists for directed assembly of block copolymers.
    Han E; Kim M; Gopalan P
    ACS Nano; 2012 Feb; 6(2):1823-9. PubMed ID: 22243029
    [TBL] [Abstract][Full Text] [Related]  

  • 18. Aligned silicon nanofins via the directed self-assembly of PS-b-P4VP block copolymer and metal oxide enhanced pattern transfer.
    Cummins C; Gangnaik A; Kelly RA; Borah D; O'Connell J; Petkov N; Georgiev YM; Holmes JD; Morris MA
    Nanoscale; 2015 Apr; 7(15):6712-21. PubMed ID: 25798892
    [TBL] [Abstract][Full Text] [Related]  

  • 19. Directed Block Copolymer Assembly versus Electron Beam Lithography for Bit-Patterned Media with Areal Density of 1 Terabit/inch(2) and Beyond.
    Yang X; Wan L; Xiao S; Xu Y; Weller DK
    ACS Nano; 2009 Jul; 3(7):1844-58. PubMed ID: 19572736
    [TBL] [Abstract][Full Text] [Related]  

  • 20. The sensitivity of random polymer brush-lamellar polystyrene-b-polymethylmethacrylate block copolymer systems to process conditions.
    Borah D; Rasappa S; Senthamaraikannan R; Shaw MT; Holmes JD; Morris MA
    J Colloid Interface Sci; 2013 Mar; 393():192-202. PubMed ID: 23218235
    [TBL] [Abstract][Full Text] [Related]  

    [Next]    [New Search]
    of 14.