These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.
247 related articles for article (PubMed ID: 23675942)
1. Conversion of bilayers of PS-b-PDMS block copolymer into closely packed, aligned silica nanopatterns. Wu NL; Harris KD; Buriak JM ACS Nano; 2013 Jun; 7(6):5595-606. PubMed ID: 23675942 [TBL] [Abstract][Full Text] [Related]
2. Swift nanopattern formation of PS-b-PMMA and PS-b-PDMS block copolymer films using a microwave assisted technique. Borah D; Senthamaraikannan R; Rasappa S; Kosmala B; Holmes JD; Morris MA ACS Nano; 2013 Aug; 7(8):6583-96. PubMed ID: 23859379 [TBL] [Abstract][Full Text] [Related]
3. Sub-10 nm feature size PS-b-PDMS block copolymer structures fabricated by a microwave-assisted solvothermal process. Borah D; Shaw MT; Holmes JD; Morris MA ACS Appl Mater Interfaces; 2013 Mar; 5(6):2004-12. PubMed ID: 23421383 [TBL] [Abstract][Full Text] [Related]
4. The fabrication of highly ordered block copolymer micellar arrays: control of the separation distances of silicon oxide dots. Yoo H; Park S Nanotechnology; 2010 Jun; 21(24):245304. PubMed ID: 20498523 [TBL] [Abstract][Full Text] [Related]
5. Tuning PDMS brush chemistry by UV-O3 exposure for PS-b-PDMS microphase separation and directed self-assembly. Borah D; Rasappa S; Senthamaraikannan R; Holmes JD; Morris MA Langmuir; 2013 Jul; 29(28):8959-68. PubMed ID: 23751134 [TBL] [Abstract][Full Text] [Related]
6. Selective sidewall wetting of polymer blocks in hydrogen silsesquioxane directed self-assembly of PS-b-PDMS. Hobbs RG; Farrell RA; Bolger CT; Kelly RA; Morris MA; Petkov N; Holmes JD ACS Appl Mater Interfaces; 2012 Sep; 4(9):4637-42. PubMed ID: 22856644 [TBL] [Abstract][Full Text] [Related]
7. Pulsed transfer etching of PS-PDMS block copolymers self-assembled in 193 nm lithography stacks. Girardot C; Böhme S; Archambault S; Salaün M; Latu-Romain E; Cunge G; Joubert O; Zelsmann M ACS Appl Mater Interfaces; 2014 Sep; 6(18):16276-82. PubMed ID: 25111901 [TBL] [Abstract][Full Text] [Related]
8. Sub-10 nm Silicon Nanopillar Fabrication Using Fast and Brushless Thermal Assembly of PS-b-PDMS Diblock Copolymer. Garnier J; Arias-Zapata J; Marconot O; Arnaud S; Böhme S; Girardot C; Buttard D; Zelsmann M ACS Appl Mater Interfaces; 2016 Apr; 8(15):9954-60. PubMed ID: 27020847 [TBL] [Abstract][Full Text] [Related]
10. Controlled Self-Assembly of Polystyrene- Lee TL; Lin JW; Ho RM ACS Appl Mater Interfaces; 2022 Dec; 14(48):54194-54202. PubMed ID: 36404593 [TBL] [Abstract][Full Text] [Related]
11. UV-solvent annealing of PDMS-majority and PS-majority PS-b-PDMS block copolymer films. Lee K; Kreider M; Bai W; Cheng LC; Dinachali SS; Tu KH; Huang T; Ntetsikas K; Liontos G; Avgeropoulos A; Ross CA Nanotechnology; 2016 Nov; 27(46):465301. PubMed ID: 27736809 [TBL] [Abstract][Full Text] [Related]
12. Sequential Nanopatterned Block Copolymer Self-Assembly on Surfaces. Jin C; Olsen BC; Wu NL; Luber EJ; Buriak JM Langmuir; 2016 Jun; 32(23):5890-8. PubMed ID: 27189878 [TBL] [Abstract][Full Text] [Related]
13. Fabrication of disposable topographic silicon oxide from sawtoothed patterns: control of arrays of gold nanoparticles. Cho H; Yoo H; Park S Langmuir; 2010 May; 26(10):7451-7. PubMed ID: 20000759 [TBL] [Abstract][Full Text] [Related]
14. Orientation and alignment control of microphase-separated PS-b-PDMS substrate patterns via polymer brush chemistry. Borah D; Rasappa S; Senthamaraikannan R; Kosmala B; Shaw MT; Holmes JD; Morris MA ACS Appl Mater Interfaces; 2013 Jan; 5(1):88-97. PubMed ID: 23227917 [TBL] [Abstract][Full Text] [Related]
15. Aligned sub-10-nm block copolymer patterns templated by post arrays. Chang JB; Son JG; Hannon AF; Alexander-Katz A; Ross CA; Berggren KK ACS Nano; 2012 Mar; 6(3):2071-7. PubMed ID: 22356624 [TBL] [Abstract][Full Text] [Related]
16. Controlling of 6 nm sized and 10 nm pitched dot arrays ordered along narrow guide lines using PS-PDMS self-assembly. Hosaka S; Akahane T; Huda M; Zhang H; Yin Y ACS Appl Mater Interfaces; 2014 May; 6(9):6208-11. PubMed ID: 24761797 [TBL] [Abstract][Full Text] [Related]
17. A generalized method for alignment of block copolymer films: solvent vapor annealing with soft shear. Qiang Z; Zhang Y; Groff JA; Cavicchi KA; Vogt BD Soft Matter; 2014 Aug; 10(32):6068-76. PubMed ID: 25004006 [TBL] [Abstract][Full Text] [Related]
18. Aligned silicon nanofins via the directed self-assembly of PS-b-P4VP block copolymer and metal oxide enhanced pattern transfer. Cummins C; Gangnaik A; Kelly RA; Borah D; O'Connell J; Petkov N; Georgiev YM; Holmes JD; Morris MA Nanoscale; 2015 Apr; 7(15):6712-21. PubMed ID: 25798892 [TBL] [Abstract][Full Text] [Related]