These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

232 related articles for article (PubMed ID: 23675942)

  • 21. Topcoat-Assisted Perpendicular and Straightly Parallel Coexisting Orientations of Block Copolymer Films.
    Jeong J; Ha JS; Lee SS; Son JG
    Macromol Rapid Commun; 2015 Jul; 36(13):1261-6. PubMed ID: 25867964
    [TBL] [Abstract][Full Text] [Related]  

  • 22. Robust block copolymer mask for nanopatterning polymer films.
    Chao CC; Wang TC; Ho RM; Georgopanos P; Avgeropoulos A; Thomas EL
    ACS Nano; 2010 Apr; 4(4):2088-94. PubMed ID: 20201544
    [TBL] [Abstract][Full Text] [Related]  

  • 23. Effect of Entrapped Solvent on the Evolution of Lateral Order in Self-Assembled P(S-r-MMA)/PS-b-PMMA Systems with Different Thicknesses.
    Giammaria TJ; Ferrarese Lupi F; Seguini G; Sparnacci K; Antonioli D; Gianotti V; Laus M; Perego M
    ACS Appl Mater Interfaces; 2017 Sep; 9(37):31215-31223. PubMed ID: 28195457
    [TBL] [Abstract][Full Text] [Related]  

  • 24. Enhanced Lateral Ordering in Cylinder Forming PS-b-PMMA Block Copolymers Exploiting the Entrapped Solvent.
    Seguini G; Zanenga F; Giammaria TJ; Ceresoli M; Sparnacci K; Antonioli D; Gianotti V; Laus M; Perego M
    ACS Appl Mater Interfaces; 2016 Mar; 8(12):8280-8. PubMed ID: 26959626
    [TBL] [Abstract][Full Text] [Related]  

  • 25. Fabrication of Graphoepitaxial Gate-All-Around Si Circuitry Patterned Nanowire Arrays Using Block Copolymer Assisted Hard Mask Approach.
    Ghoshal T; Senthamaraikannan R; Shaw MT; Lundy R; Selkirk A; Morris MA
    ACS Nano; 2021 Jun; 15(6):9550-9558. PubMed ID: 34042425
    [TBL] [Abstract][Full Text] [Related]  

  • 26. Directed self-assembly of cylinder-forming block copolymers: prepatterning effect on pattern quality and density multiplication factor.
    Wan L; Yang X
    Langmuir; 2009 Nov; 25(21):12408-13. PubMed ID: 19799403
    [TBL] [Abstract][Full Text] [Related]  

  • 27. Directed Self-Assembly of Star-Block Copolymers by Topographic Nanopatterns through Nucleation and Growth Mechanism.
    Krishnan MR; Lu KY; Chiu WY; Chen IC; Lin JW; Lo TY; Georgopanos P; Avgeropoulos A; Lee MC; Ho RM
    Small; 2018 Apr; 14(16):e1704005. PubMed ID: 29573555
    [TBL] [Abstract][Full Text] [Related]  

  • 28. Highly Ordered Porous Inorganic Structures
    Esmeraldo Paiva A; Baez Vasquez JF; Selkirk A; Prochukhan N; G L Medeiros Borsagli F; Morris M
    ACS Appl Mater Interfaces; 2022 Aug; 14(30):35265-35275. PubMed ID: 35876355
    [TBL] [Abstract][Full Text] [Related]  

  • 29. Interfacial Energy-Controlled Top Coats for Gyroid/Cylinder Phase Transitions of Polystyrene-block-polydimethylsiloxane Block Copolymer Thin Films.
    Ryu IH; Kim YJ; Jung YS; Lim JS; Ross CA; Son JG
    ACS Appl Mater Interfaces; 2017 May; 9(20):17427-17434. PubMed ID: 28470057
    [TBL] [Abstract][Full Text] [Related]  

  • 30. Orientation-controlled self-assembled nanolithography using a polystyrene-polydimethylsiloxane block copolymer.
    Jung YS; Ross CA
    Nano Lett; 2007 Jul; 7(7):2046-50. PubMed ID: 17570733
    [TBL] [Abstract][Full Text] [Related]  

  • 31. High-throughput preparation of complex multi-scale patterns from block copolymer/homopolymer blend films.
    Park H; Kim JU; Park S
    Nanoscale; 2012 Feb; 4(4):1362-7. PubMed ID: 22241398
    [TBL] [Abstract][Full Text] [Related]  

  • 32. Highly ordered nanoporous template from triblock copolymer.
    Lee DH; Park S; Gu W; Russell TP
    ACS Nano; 2011 Feb; 5(2):1207-14. PubMed ID: 21291282
    [TBL] [Abstract][Full Text] [Related]  

  • 33. Collective behavior of block copolymer thin films within periodic topographical structures.
    Perego M; Andreozzi A; Vellei A; Ferrarese Lupi F; Seguini G
    Nanotechnology; 2013 Jun; 24(24):245301. PubMed ID: 23680847
    [TBL] [Abstract][Full Text] [Related]  

  • 34. Negative-tone block copolymer lithography by in situ surface chemical modification.
    Kim BH; Byeon KJ; Kim JY; Kim J; Jin HM; Cho JY; Jeong SJ; Shin J; Lee H; Kim SO
    Small; 2014 Oct; 10(20):4207-12. PubMed ID: 24912807
    [TBL] [Abstract][Full Text] [Related]  

  • 35. Preferential Alignment of Incommensurate Block Copolymer Dot Arrays Forming Moiré Superstructures.
    Jin C; Olsen BC; Luber EJ; Buriak JM
    ACS Nano; 2017 Mar; 11(3):3237-3246. PubMed ID: 28225584
    [TBL] [Abstract][Full Text] [Related]  

  • 36. Nanoporous block copolymer micelle/micelle multilayer films with dual optical properties.
    Cho J; Hong J; Char K; Caruso F
    J Am Chem Soc; 2006 Aug; 128(30):9935-42. PubMed ID: 16866553
    [TBL] [Abstract][Full Text] [Related]  

  • 37. Thickness and Microdomain Orientation of Asymmetric PS-b-PMMA Block Copolymer Films Inside Periodic Gratings.
    Ferrarese Lupi F; Aprile G; Giammaria TJ; Seguini G; Zuccheri G; De Leo N; Boarino L; Laus M; Perego M
    ACS Appl Mater Interfaces; 2015 Oct; 7(42):23615-22. PubMed ID: 26439144
    [TBL] [Abstract][Full Text] [Related]  

  • 38. Orienting block copolymer microdomains with block copolymer brushes.
    Gu W; Hong SW; Russell TP
    ACS Nano; 2012 Nov; 6(11):10250-7. PubMed ID: 23092357
    [TBL] [Abstract][Full Text] [Related]  

  • 39. Photocatalytic printing of inorganic nanopatterns via poly(styrene-block-carbosilane) copolymer thin films on titania substrates.
    Peng J; Garcia Marcos A; Jeong SJ; Frey H; Kim DH
    Chem Commun (Camb); 2009 Mar; (9):1091-3. PubMed ID: 19225646
    [TBL] [Abstract][Full Text] [Related]  

  • 40. Fabrication of ultra-dense sub-10 nm in-plane Si nanowire arrays by using a novel block copolymer method: optical properties.
    Ghoshal T; Ntaras C; O'Connell J; Shaw MT; Holmes JD; Avgeropoulos A; Morris MA
    Nanoscale; 2016 Jan; 8(4):2177-87. PubMed ID: 26731306
    [TBL] [Abstract][Full Text] [Related]  

    [Previous]   [Next]    [New Search]
    of 12.