216 related articles for article (PubMed ID: 23858855)
1. Pulsed DC bias effects on p-type semiconductor SrCu2O2 film deposited by RF magnetron sputtering.
Seok HW; Kim SK; Lee HS; Lee MJ; Ju BK
J Nanosci Nanotechnol; 2013 May; 13(5):3341-5. PubMed ID: 23858855
[TBL] [Abstract][Full Text] [Related]
2. Effects of the duty ratio on the niobium oxide film deposited by pulsed-DC magnetron sputtering methods.
Eom JM; Oh HG; Cho IH; Kwon SJ; Cho ES
J Nanosci Nanotechnol; 2013 Nov; 13(11):7760-5. PubMed ID: 24245329
[TBL] [Abstract][Full Text] [Related]
3. Optical and structural properties of sputter-deposited nanocrystalline Cu2O films: effect of sputtering gas.
Chandra R; Chawla AK; Ayyub P
J Nanosci Nanotechnol; 2006 Apr; 6(4):1119-23. PubMed ID: 16736775
[TBL] [Abstract][Full Text] [Related]
4. Non-magnetic hexagonal nanocrystalline ni films grown by radio frequency magnetron sputtering.
Poulopoulos P; Kapaklis V; Politis C; Schweiss P; Fuchs D
J Nanosci Nanotechnol; 2006 Dec; 6(12):3867-70. PubMed ID: 17256343
[TBL] [Abstract][Full Text] [Related]
5. ZnO:Al thin films deposited by RF-magnetron sputtering with tunable and uniform properties.
Miorin E; Montagner F; Battiston S; Fiameni S; Fabrizio M
J Nanosci Nanotechnol; 2011 Mar; 11(3):2191-5. PubMed ID: 21449368
[TBL] [Abstract][Full Text] [Related]
6. Characteristic corrosion resistance of nanocrystalline TiN films prepared by high density plasma reactive magnetron sputtering.
Kim JH; Kang CG; Kim YT; Cheong WS; Song PK
J Nanosci Nanotechnol; 2013 Jul; 13(7):4601-7. PubMed ID: 23901480
[TBL] [Abstract][Full Text] [Related]
7. Electrochemical properties of Sn-substituted LiMn2O4 thin films prepared by radio-frequency magnetron sputtering.
Kong WY; Yim H; Yoon SJ; Nahm S; Choi JW
J Nanosci Nanotechnol; 2013 May; 13(5):3288-92. PubMed ID: 23858845
[TBL] [Abstract][Full Text] [Related]
8. Enhancement of the mechanical properties of AZ31 magnesium alloy via nanostructured hydroxyapatite thin films fabricated via radio-frequency magnetron sputtering.
Surmeneva MA; Tyurin AI; Mukhametkaliyev TM; Pirozhkova TS; Shuvarin IA; Syrtanov MS; Surmenev RA
J Mech Behav Biomed Mater; 2015 Jun; 46():127-36. PubMed ID: 25792410
[TBL] [Abstract][Full Text] [Related]
9. Material and sensing properties of Pd-deposited WO3 thin films.
Choi G; Jin G; Park SH; Lee W; Park J
J Nanosci Nanotechnol; 2007 Nov; 7(11):3841-6. PubMed ID: 18047071
[TBL] [Abstract][Full Text] [Related]
10. Structural and electrical properties of ZnO films deposited with low-temperature facing targets magnetron sputtering (FTS) system with changes in H2 and O2 flow rate.
Kim HR; Jin SB; Wen L; Choi YS; Choi IS; Han JG
J Nanosci Nanotechnol; 2013 Nov; 13(11):7745-50. PubMed ID: 24245326
[TBL] [Abstract][Full Text] [Related]
11. Effects of nitrogen flow rate on the properties of indium oxide thin films.
Cho S; Kim M
J Nanosci Nanotechnol; 2013 Nov; 13(11):7788-92. PubMed ID: 24245335
[TBL] [Abstract][Full Text] [Related]
12. Scanning probe oxidation lithography on Ta thin films.
Okur S; Büjükköse S; Tari S
J Nanosci Nanotechnol; 2008 Nov; 8(11):5640-5. PubMed ID: 19198282
[TBL] [Abstract][Full Text] [Related]
13. Visible-light active photocatalytic WO3 films loaded with Pt nanoparticles deposited by sputtering.
Murata A; Oka N; Nakamura S; Shigesato Y
J Nanosci Nanotechnol; 2012 Jun; 12(6):5082-6. PubMed ID: 22905581
[TBL] [Abstract][Full Text] [Related]
14. Electrical and optical properties of indium zinc oxide (IZO) thin films by continuous composition spread.
Lee JJ; Kim JS; Yoon SJ; Cho YS; Choi JW
J Nanosci Nanotechnol; 2013 May; 13(5):3317-20. PubMed ID: 23858851
[TBL] [Abstract][Full Text] [Related]
15. Highly conducting phosphorous doped Nc-Si:H thin films deposited at high deposition rate by hot-wire chemical vapor deposition method.
Waman VS; Kamble MM; Ghosh SS; Mayabadi A; Sathe VG; Amalnekar DP; Pathan HM; Jadkar SR
J Nanosci Nanotechnol; 2012 Nov; 12(11):8459-66. PubMed ID: 23421231
[TBL] [Abstract][Full Text] [Related]
16. Structural evolution of nanocrystalline silicon thin films synthesized in high-density, low-temperature reactive plasmas.
Cheng Q; Xu S; Ostrikov KK
Nanotechnology; 2009 May; 20(21):215606. PubMed ID: 19423937
[TBL] [Abstract][Full Text] [Related]
17. Characterization of intrinsic a-Si:H films prepared by inductively coupled plasma chemical vapor deposition for solar cell applications.
Jeong C; Boo S; Jeon M; Kamisako K
J Nanosci Nanotechnol; 2007 Nov; 7(11):4169-73. PubMed ID: 18047144
[TBL] [Abstract][Full Text] [Related]
18. Optoelectronic Characterization of Ta-Doped ZnO Thin Films by Pulsed Laser Deposition.
Koo HS; Peng JC; Chen M; Chin HI; Chen JY; Wu MK
J Nanosci Nanotechnol; 2015 Nov; 15(11):9222-7. PubMed ID: 26726672
[TBL] [Abstract][Full Text] [Related]
19. A study of nano-mechanical properties and nano-scratch behavior of boron carbonitride films.
Xu S; Ma X; Tang G
J Nanosci Nanotechnol; 2006 May; 6(5):1441-6. PubMed ID: 16792378
[TBL] [Abstract][Full Text] [Related]
20. Optical and structural properties of Al-doped ZnO thin films by sol gel process.
Jun MC; Koh JH
J Nanosci Nanotechnol; 2013 May; 13(5):3403-7. PubMed ID: 23858867
[TBL] [Abstract][Full Text] [Related]
[Next] [New Search]
