These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.
210 related articles for article (PubMed ID: 23965001)
1. Thermal probe maskless lithography for 27.5 nm half-pitch Si technology. Cheong LL; Paul P; Holzner F; Despont M; Coady DJ; Hedrick JL; Allen R; Knoll AW; Duerig U Nano Lett; 2013 Sep; 13(9):4485-91. PubMed ID: 23965001 [TBL] [Abstract][Full Text] [Related]
2. Sub-10 Nanometer Feature Size in Silicon Using Thermal Scanning Probe Lithography. Ryu Cho YK; Rawlings CD; Wolf H; Spieser M; Bisig S; Reidt S; Sousa M; Khanal SR; Jacobs TDB; Knoll AW ACS Nano; 2017 Dec; 11(12):11890-11897. PubMed ID: 29083870 [TBL] [Abstract][Full Text] [Related]
3. Fabrication of high aspect ratio tungsten nanostructures on ultrathin c-Si membranes for extreme UV applications. Delachat F; Le Drogoff B; Constancias C; Delprat S; Gautier E; Chaker M; Margot J Nanotechnology; 2016 Jan; 27(2):025304. PubMed ID: 26630379 [TBL] [Abstract][Full Text] [Related]
4. Reduction of EUV resist damage by neutral beam etching. Kim GW; Chang WJ; Kang JE; Kim HJ; Yeom GY Nanotechnology; 2021 Dec; 33(9):. PubMed ID: 34808609 [TBL] [Abstract][Full Text] [Related]
5. Line-Edge Roughness Stochastics for 5-nm Pattern Formation in the Extreme Ultraviolet Lithography. Kim SK J Nanosci Nanotechnol; 2019 Aug; 19(8):4657-4660. PubMed ID: 30913764 [TBL] [Abstract][Full Text] [Related]
6. Single-digit-resolution nanopatterning with extreme ultraviolet light for the 2.5 nm technology node and beyond. Mojarad N; Hojeij M; Wang L; Gobrecht J; Ekinci Y Nanoscale; 2015 Mar; 7(9):4031-7. PubMed ID: 25653148 [TBL] [Abstract][Full Text] [Related]
7. Plasma-Etched Pattern Transfer of Sub-10 nm Structures Using a Metal-Organic Resist and Helium Ion Beam Lithography. Lewis SM; Hunt MS; DeRose GA; Alty HR; Li J; Wertheim A; De Rose L; Timco GA; Scherer A; Yeates SG; Winpenny REP Nano Lett; 2019 Sep; 19(9):6043-6048. PubMed ID: 31424217 [TBL] [Abstract][Full Text] [Related]
8. Full field analysis of critical dimension uniformity due to focal variation for contact features in extreme ultraviolet lithography. Kuo HF; Frederick J Nanosci Nanotechnol; 2014 Mar; 14(3):2630-4. PubMed ID: 24745274 [TBL] [Abstract][Full Text] [Related]
9. Conversion of a Patterned Organic Resist into a High Performance Inorganic Hard Mask for High Resolution Pattern Transfer. Marneffe JF; Chan BT; Spieser M; Vereecke G; Naumov S; Vanhaeren D; Wolf H; Knoll AW ACS Nano; 2018 Nov; 12(11):11152-11160. PubMed ID: 30481961 [TBL] [Abstract][Full Text] [Related]
10. Nanoscale patterning by UV nanoimprint lithography using an organometallic resist. Acikgoz C; Vratzov B; Hempenius MA; Vancso GJ; Huskens J ACS Appl Mater Interfaces; 2009 Nov; 1(11):2645-50. PubMed ID: 20356138 [TBL] [Abstract][Full Text] [Related]
11. Sub-10 nm patterning using EUV interference lithography. Päivänranta B; Langner A; Kirk E; David C; Ekinci Y Nanotechnology; 2011 Sep; 22(37):375302. PubMed ID: 21852737 [TBL] [Abstract][Full Text] [Related]
12. Hybrid application of laser-focused atomic deposition and extreme ultraviolet interference lithography methods for manufacturing of self-traceable nanogratings. Liu J; Zhao J; Deng X; Yang S; Xue C; Wu Y; Tai R; Hu X; Dai G; Li T; Cheng X Nanotechnology; 2021 Apr; 32(17):175301. PubMed ID: 33461181 [TBL] [Abstract][Full Text] [Related]
13. Combining thermal scanning probe lithography and dry etching for grayscale nanopattern amplification. Erbas B; Conde-Rubio A; Liu X; Pernollet J; Wang Z; Bertsch A; Penedo M; Fantner G; Banerjee M; Kis A; Boero G; Brugger J Microsyst Nanoeng; 2024; 10():28. PubMed ID: 38405129 [TBL] [Abstract][Full Text] [Related]
14. Using colloid lithography to fabricate silicon nanopillar arrays on silicon substrates. Chen JK; Qui JQ; Fan SK; Kuo SW; Ko FH; Chu CW; Chang FC J Colloid Interface Sci; 2012 Feb; 367(1):40-8. PubMed ID: 22104277 [TBL] [Abstract][Full Text] [Related]
15. Multi- and Gray-Scale Thermal Lithography of Silk Fibroin as Water-Developable Resist for Micro and Nanofabrication. Rostami M; Marković A; Wang Y; Pernollet J; Zhang X; Liu X; Brugger J Adv Sci (Weinh); 2024 Mar; 11(12):e2303518. PubMed ID: 38234204 [TBL] [Abstract][Full Text] [Related]
16. Fabrication of a 100 × 100 mm Nam KB; Hu Q; Yeo JH; Kim MJ; Yoo JB Nanoscale Adv; 2022 Sep; 4(18):3824-3831. PubMed ID: 36133349 [TBL] [Abstract][Full Text] [Related]
18. Highly selective etching of SnO2 absorber in binary mask structure for extreme ultra-violet lithography. Lee SJ; Jung CY; Park SJ; Hwangbo CK; Seo HS; Kim SS; Lee NE J Nanosci Nanotechnol; 2012 Apr; 12(4):3334-40. PubMed ID: 22849119 [TBL] [Abstract][Full Text] [Related]
19. Validity of the thin mask approximation in extreme ultraviolet mask roughness simulations. Naulleau PP; George SA Appl Opt; 2011 Jul; 50(19):3346-50. PubMed ID: 21743539 [TBL] [Abstract][Full Text] [Related]
20. High aspect ratio nano-fabrication of photonic crystal structures on glass wafers using chrome as hard mask. Hossain MN; Justice J; Lovera P; McCarthy B; O'Riordan A; Corbett B Nanotechnology; 2014 Sep; 25(35):355301. PubMed ID: 25116111 [TBL] [Abstract][Full Text] [Related] [Next] [New Search]