These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.
195 related articles for article (PubMed ID: 24007296)
1. Multicomponent nanopatterns by directed block copolymer self-assembly. Shin DO; Mun JH; Hwang GT; Yoon JM; Kim JY; Yun JM; Yang YB; Oh Y; Lee JY; Shin J; Lee KJ; Park S; Kim JU; Kim SO ACS Nano; 2013 Oct; 7(10):8899-907. PubMed ID: 24007296 [TBL] [Abstract][Full Text] [Related]
2. Nanodomain swelling block copolymer lithography for morphology tunable metal nanopatterning. Mun JH; Cha SK; Kim H; Moon HS; Kim JY; Jin HM; Choi YJ; Baek JE; Shin J; Kim SO Small; 2014 Sep; 10(18):3742-9. PubMed ID: 24821268 [TBL] [Abstract][Full Text] [Related]
3. Au-Ag core-shell nanoparticle array by block copolymer lithography for synergistic broadband plasmonic properties. Cha SK; Mun JH; Chang T; Kim SY; Kim JY; Jin HM; Lee JY; Shin J; Kim KH; Kim SO ACS Nano; 2015 May; 9(5):5536-43. PubMed ID: 25893844 [TBL] [Abstract][Full Text] [Related]
4. Graphoepitaxy of block-copolymer self-assembly integrated with single-step ZnO nanoimprinting. Kim S; Shin DO; Choi DG; Jeong JR; Mun JH; Yang YB; Kim JU; Kim SO; Jeong JH Small; 2012 May; 8(10):1563-9. PubMed ID: 22378625 [TBL] [Abstract][Full Text] [Related]
5. Aligned nanowires and nanodots by directed block copolymer assembly. Xiao S; Yang X; Lee KY; ver der Veerdonk RJ; Kuo D; Russell TP Nanotechnology; 2011 Jul; 22(30):305302. PubMed ID: 21697581 [TBL] [Abstract][Full Text] [Related]
6. Fabrication of ultra-dense sub-10 nm in-plane Si nanowire arrays by using a novel block copolymer method: optical properties. Ghoshal T; Ntaras C; O'Connell J; Shaw MT; Holmes JD; Avgeropoulos A; Morris MA Nanoscale; 2016 Jan; 8(4):2177-87. PubMed ID: 26731306 [TBL] [Abstract][Full Text] [Related]
7. Shear-Rolling Process for Unidirectionally and Perpendicularly Oriented Sub-10-nm Block Copolymer Patterns on the 4 in Scale. Oh J; Shin M; Kim IS; Suh HS; Kim Y; Kim JK; Bang J; Yeom B; Son JG ACS Nano; 2021 May; 15(5):8549-8558. PubMed ID: 33979144 [TBL] [Abstract][Full Text] [Related]
9. One-step and self-assembly based fabrication of Pt/TiO2 nanohybrid photocatalysts with programmed nanopatterns. Jang YJ; Kim DH Chemistry; 2011 Jan; 17(2):540-5. PubMed ID: 21207571 [TBL] [Abstract][Full Text] [Related]
10. Highly Aligned Carbon Nanowire Array by E-Field Directed Assembly of PAN-Containing Block Copolymers. Han KH; Kang H; Lee GY; Lee HJ; Jin HM; Cha SK; Yun T; Kim JH; Yang GG; Choi HJ; Ko YK; Jung HT; Kim SO ACS Appl Mater Interfaces; 2020 Dec; 12(52):58113-58121. PubMed ID: 33325677 [TBL] [Abstract][Full Text] [Related]
11. Directed block copolymer self-assembly implemented via surface-embedded electrets. Wu ML; Wang D; Wan LJ Nat Commun; 2016 Feb; 7():10752. PubMed ID: 26876792 [TBL] [Abstract][Full Text] [Related]
12. Hierarchical nanopores formed by block copolymer lithography on the surfaces of different materials pre-patterned by nanosphere lithography. Brassat K; Kool D; Bürger J; Lindner JKN Nanoscale; 2018 May; 10(21):10005-10017. PubMed ID: 29774901 [TBL] [Abstract][Full Text] [Related]
13. Nanopatterns with a Square Symmetry from an Orthogonal Lamellar Assembly of Block Copolymers. Cha SK; Yong D; Yang GG; Jin HM; Kim JH; Han KH; Kim JU; Jeong SJ; Kim SO ACS Appl Mater Interfaces; 2019 Jun; 11(22):20265-20271. PubMed ID: 31081329 [TBL] [Abstract][Full Text] [Related]
14. Negative-tone block copolymer lithography by in situ surface chemical modification. Kim BH; Byeon KJ; Kim JY; Kim J; Jin HM; Cho JY; Jeong SJ; Shin J; Lee H; Kim SO Small; 2014 Oct; 10(20):4207-12. PubMed ID: 24912807 [TBL] [Abstract][Full Text] [Related]
15. Nanoscale plasmonic stamp lithography on silicon. Liu F; Luber EJ; Huck LA; Olsen BC; Buriak JM ACS Nano; 2015 Feb; 9(2):2184-93. PubMed ID: 25654172 [TBL] [Abstract][Full Text] [Related]
16. Large area Al Alvarez-Fernandez A; Nallet F; Fontaine P; Cummins C; Hadziioannou G; Barois P; Fleury G; Ponsinet V RSC Adv; 2020 Nov; 10(67):41088-41097. PubMed ID: 35519210 [TBL] [Abstract][Full Text] [Related]
18. Highly Tunable Complementary Micro/Submicro-Nanopatterned Surfaces Combining Block Copolymer Self-Assembly and Colloidal Lithography. Chang T; Du B; Huang H; He T ACS Appl Mater Interfaces; 2016 Aug; 8(34):22705-13. PubMed ID: 27509255 [TBL] [Abstract][Full Text] [Related]
19. Hierarchical Self-Assembly of Thickness-Modulated Block Copolymer Thin Films for Controlling Nanodomain Orientations inside Bare Silicon Trenches. Shin JY; Oh YT; Kim S; Lim HY; Lee B; Ko YC; Park S; Seon SW; Lee SG; Mun SS; Kim BH Polymers (Basel); 2021 Feb; 13(4):. PubMed ID: 33668510 [TBL] [Abstract][Full Text] [Related]