225 related articles for article (PubMed ID: 24289275)
1. Versatile pattern generation of periodic, high aspect ratio Si nanostructure arrays with sub-50-nm resolution on a wafer scale.
Ho JW; Wee Q; Dumond J; Tay A; Chua SJ
Nanoscale Res Lett; 2013 Dec; 8(1):506. PubMed ID: 24289275
[TBL] [Abstract][Full Text] [Related]
2. Using colloid lithography to fabricate silicon nanopillar arrays on silicon substrates.
Chen JK; Qui JQ; Fan SK; Kuo SW; Ko FH; Chu CW; Chang FC
J Colloid Interface Sci; 2012 Feb; 367(1):40-8. PubMed ID: 22104277
[TBL] [Abstract][Full Text] [Related]
3. Wafer-scale fabrication of plasmonic crystals from patterned silicon templates prepared by nanosphere lithography.
Hall AS; Friesen SA; Mallouk TE
Nano Lett; 2013 Jun; 13(6):2623-7. PubMed ID: 23614608
[TBL] [Abstract][Full Text] [Related]
4. Controlled Patterning of Vertical Silicon Structures Using Polymer Lithography and Wet Chemical Etching.
Kim HJ; Lee SH; Lee J; Lee ES; Choi JH; Jung JY; Jeong JH; Choi DG
J Nanosci Nanotechnol; 2015 Jun; 15(6):4522-9. PubMed ID: 26369075
[TBL] [Abstract][Full Text] [Related]
5. Wafer-scale patterning of sub-40 nm diameter and high aspect ratio (>50:1) silicon pillar arrays by nanoimprint and etching.
Morton KJ; Nieberg G; Bai S; Chou SY
Nanotechnology; 2008 Aug; 19(34):345301. PubMed ID: 21730643
[TBL] [Abstract][Full Text] [Related]
6. Tailoring Patterned Visible-Light Scattering by Silicon Photonic Crystals.
Cheng P; Kampmann R; Wang D; Sinzinger S; Schaaf P
ACS Appl Mater Interfaces; 2021 Dec; 13(50):60319-60326. PubMed ID: 34890189
[TBL] [Abstract][Full Text] [Related]
7. Multi-silicon ridge nanofabrication by repeated edge lithography.
Zhao Y; Berenschot E; Jansen H; Tas N; Huskens J; Elwenspoek M
Nanotechnology; 2009 Aug; 20(31):315305. PubMed ID: 19597243
[TBL] [Abstract][Full Text] [Related]
8. 3D ordered nanostructures fabricated by nanosphere lithography using an organometallic etch mask.
Ling XY; Acikgoz C; Phang IY; Hempenius MA; Reinhoudt DN; Vancso GJ; Huskens J
Nanoscale; 2010 Aug; 2(8):1455-60. PubMed ID: 20820734
[TBL] [Abstract][Full Text] [Related]
9. Controlling the Geometries of Si Nanowires through Tunable Nanosphere Lithography.
Li L; Fang Y; Xu C; Zhao Y; Wu K; Limburg C; Jiang P; Ziegler KJ
ACS Appl Mater Interfaces; 2017 Mar; 9(8):7368-7375. PubMed ID: 28067037
[TBL] [Abstract][Full Text] [Related]
10. CMOS-Compatible Top-Down Fabrication of Periodic SiO2 Nanostructures using a Single Mask.
Meng L; Gao J; He X; Li J; Wei Y; Yan J
Nanoscale Res Lett; 2015 Dec; 10(1):1046. PubMed ID: 26306538
[TBL] [Abstract][Full Text] [Related]
11. Wafer-scale nanostructured black silicon with morphology engineering
Wu S; Chen Q; Zhang L; Ren H; Zhou H; Hu L; Tan CS
Nanoscale; 2023 Mar; 15(10):4843-4851. PubMed ID: 36805597
[TBL] [Abstract][Full Text] [Related]
12. Chemical Imprinting of Crystalline Silicon with Catalytic Metal Stamp in Etch Bath.
Ki B; Song Y; Choi K; Yum JH; Oh J
ACS Nano; 2018 Jan; 12(1):609-616. PubMed ID: 29224336
[TBL] [Abstract][Full Text] [Related]
13. Nanopantography: a new method for massively parallel nanopatterning over large areas.
Xu L; Vemula SC; Jain M; Nam SK; Donnelly VM; Economou DJ; Ruchhoeft P
Nano Lett; 2005 Dec; 5(12):2563-8. PubMed ID: 16351216
[TBL] [Abstract][Full Text] [Related]
14. Fabrication of high aspect ratio tungsten nanostructures on ultrathin c-Si membranes for extreme UV applications.
Delachat F; Le Drogoff B; Constancias C; Delprat S; Gautier E; Chaker M; Margot J
Nanotechnology; 2016 Jan; 27(2):025304. PubMed ID: 26630379
[TBL] [Abstract][Full Text] [Related]
15. Wafer-scale fabrication of high-aspect ratio nanochannels based on edge-lithography technique.
Xie Q; Zhou Q; Xie F; Sang J; Wang W; Zhang HA; Wu W; Li Z
Biomicrofluidics; 2012 Mar; 6(1):16502-165028. PubMed ID: 22396721
[TBL] [Abstract][Full Text] [Related]
16. Simultaneous fabrication of very high aspect ratio positive nano- to milliscale structures.
Chen LQ; Chan-Park MB; Zhang Q; Chen P; Li CM; Li S
Small; 2009 May; 5(9):1043-50. PubMed ID: 19235805
[TBL] [Abstract][Full Text] [Related]
17. The fabrication and application of patterned Si(001) substrates with ordered pits via nanosphere lithography.
Chen P; Fan Y; Zhong Z
Nanotechnology; 2009 Mar; 20(9):095303. PubMed ID: 19417486
[TBL] [Abstract][Full Text] [Related]
18. High aspect ratio nano-fabrication of photonic crystal structures on glass wafers using chrome as hard mask.
Hossain MN; Justice J; Lovera P; McCarthy B; O'Riordan A; Corbett B
Nanotechnology; 2014 Sep; 25(35):355301. PubMed ID: 25116111
[TBL] [Abstract][Full Text] [Related]
19. Electrochemical nanoimprint lithography: when nanoimprint lithography meets metal assisted chemical etching.
Zhang J; Zhang L; Han L; Tian ZW; Tian ZQ; Zhan D
Nanoscale; 2017 Jun; 9(22):7476-7482. PubMed ID: 28530294
[TBL] [Abstract][Full Text] [Related]
20. Large-area pattern transfer of metallic nanostructures on glass substrates via interference lithography.
Du K; Wathuthanthri I; Mao W; Xu W; Choi CH
Nanotechnology; 2011 Jul; 22(28):285306. PubMed ID: 21642762
[TBL] [Abstract][Full Text] [Related]
[Next] [New Search]
