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6. Ge microdisk with lithographically-tunable strain using CMOS-compatible process. Sukhdeo DS; Petykiewicz J; Gupta S; Kim D; Woo S; Kim Y; Vučković J; Saraswat KC; Nam D Opt Express; 2015 Dec; 23(26):33249-54. PubMed ID: 26831991 [TBL] [Abstract][Full Text] [Related]
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