117 related articles for article (PubMed ID: 24922029)
1. Corrective finishing of extreme ultraviolet photomask blanks by precessed bonnet polisher.
Beaucamp A; Namba Y; Charlton P
Appl Opt; 2014 May; 53(14):3075-80. PubMed ID: 24922029
[TBL] [Abstract][Full Text] [Related]
2. Corrective finishing of a micro-aspheric mold made of tungsten carbide to 50 nm accuracy.
Guo J
Appl Opt; 2015 Jun; 54(18):5764-70. PubMed ID: 26193027
[TBL] [Abstract][Full Text] [Related]
3. Sub-10 nm patterning using EUV interference lithography.
Päivänranta B; Langner A; Kirk E; David C; Ekinci Y
Nanotechnology; 2011 Sep; 22(37):375302. PubMed ID: 21852737
[TBL] [Abstract][Full Text] [Related]
4. Actinic microscope for extreme ultraviolet lithography photomask inspection and review.
Goldstein M; Naulleau P
Opt Express; 2012 Jul; 20(14):15752-68. PubMed ID: 22772266
[TBL] [Abstract][Full Text] [Related]
5. Beyond EUV lithography: a comparative study of efficient photoresists' performance.
Mojarad N; Gobrecht J; Ekinci Y
Sci Rep; 2015 Mar; 5():9235. PubMed ID: 25783209
[TBL] [Abstract][Full Text] [Related]
6. Deformation-free form error measurement of thin, plane-parallel optics floated on a heavy liquid.
Chu J; Griesmann U; Wang Q; Soons JA; Benck EC
Appl Opt; 2010 Apr; 49(10):1849-58. PubMed ID: 20357869
[TBL] [Abstract][Full Text] [Related]
7. Combined processing chain for freeform optics based on atmospheric pressure plasma processing and bonnet polishing.
Su X; Ji P; Liu K; Walker D; Yu G; Li H; Li D; Wang B
Opt Express; 2019 Jun; 27(13):17979-17992. PubMed ID: 31252748
[TBL] [Abstract][Full Text] [Related]
8. Single-digit-resolution nanopatterning with extreme ultraviolet light for the 2.5 nm technology node and beyond.
Mojarad N; Hojeij M; Wang L; Gobrecht J; Ekinci Y
Nanoscale; 2015 Mar; 7(9):4031-7. PubMed ID: 25653148
[TBL] [Abstract][Full Text] [Related]
9. Extreme ultraviolet narrow band emission from electron cyclotron resonance plasmas.
Zhao HY; Zhao HW; Sun LT; Zhang XZ; Wang H; Ma BH; Li XX; Zhu YH; Sheng LS; Zhang GB; Tian YC
Rev Sci Instrum; 2008 Feb; 79(2 Pt 2):02C719. PubMed ID: 18315272
[TBL] [Abstract][Full Text] [Related]
10. Acidic magnetorheological finishing of infrared polycrystalline materials.
Salzman S; Romanofsky HJ; West G; Marshall KL; Jacobs SD; Lambropoulos JC
Appl Opt; 2016 Oct; 55(30):8448-8456. PubMed ID: 27828155
[TBL] [Abstract][Full Text] [Related]
11. Comparison of tool feed influence in CNC polishing between a novel circular-random path and other pseudo-random paths.
Takizawa K; Beaucamp A
Opt Express; 2017 Sep; 25(19):22411-22424. PubMed ID: 29041552
[TBL] [Abstract][Full Text] [Related]
12. Thin absorber extreme ultraviolet photomask based on Ni-TaN nanocomposite material.
Hay D; Bagge P; Khaw I; Sun L; Wood O; Chen Y; Kim RH; Qi ZJ; Shi Z
Opt Lett; 2016 Aug; 41(16):3791-4. PubMed ID: 27519090
[TBL] [Abstract][Full Text] [Related]
13. High-resolution and large-area nanoparticle arrays using EUV interference lithography.
Karim W; Tschupp SA; Oezaslan M; Schmidt TJ; Gobrecht J; van Bokhoven JA; Ekinci Y
Nanoscale; 2015 Apr; 7(16):7386-93. PubMed ID: 25826457
[TBL] [Abstract][Full Text] [Related]
14. Line-Edge Roughness Stochastics for 5-nm Pattern Formation in the Extreme Ultraviolet Lithography.
Kim SK
J Nanosci Nanotechnol; 2019 Aug; 19(8):4657-4660. PubMed ID: 30913764
[TBL] [Abstract][Full Text] [Related]
15. Resist Materials for Extreme Ultraviolet Lithography: Toward Low-Cost Single-Digit-Nanometer Patterning.
Ashby PD; Olynick DL; Ogletree DF; Naulleau PP
Adv Mater; 2015 Oct; 27(38):5813-9. PubMed ID: 26079187
[TBL] [Abstract][Full Text] [Related]
16. Evaluation of the polished surface characteristic of cobalt-chrome castings subsequent to various finishing and polishing techniques.
Ponnanna AA; Joshi SM; Bhat S; Shetty P
Indian J Dent Res; 2001; 12(4):222-8. PubMed ID: 11987661
[TBL] [Abstract][Full Text] [Related]
17. Improved analysis model for material removal mechanisms of bonnet polishing incorporating the pad wear effect.
Shi C; Peng Y; Hou L; Wang Z; Guo Y
Appl Opt; 2018 Sep; 57(25):7172-7186. PubMed ID: 30182977
[TBL] [Abstract][Full Text] [Related]
18. Modified subaperture tool influence functions of a flat-pitch polisher with reverse-calculated material removal rate.
Dong Z; Cheng H; Tam HY
Appl Opt; 2014 Apr; 53(11):2455-64. PubMed ID: 24787418
[TBL] [Abstract][Full Text] [Related]
19. Line-edge roughness transfer function and its application to determining mask effects in EUV resist characterization.
Naulleau PP; Gallatin GM
Appl Opt; 2003 Jun; 42(17):3390-7. PubMed ID: 12816326
[TBL] [Abstract][Full Text] [Related]
20. Transverse Deflection for Extreme Ultraviolet Pellicles.
Kim SK
Materials (Basel); 2023 Apr; 16(9):. PubMed ID: 37176352
[TBL] [Abstract][Full Text] [Related]
[Next] [New Search]
