These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.
6. Solvothermal Vapor Annealing of Lamellar Poly(styrene)-block-poly(d,l-lactide) Block Copolymer Thin Films for Directed Self-Assembly Application. Cummins C; Mokarian-Tabari P; Andreazza P; Sinturel C; Morris MA ACS Appl Mater Interfaces; 2016 Mar; 8(12):8295-304. PubMed ID: 26950246 [TBL] [Abstract][Full Text] [Related]
7. Through-Thickness Vertically Ordered Lamellar Block Copolymer Thin Films on Unmodified Quartz with Cold Zone Annealing. Basutkar MN; Samant S; Strzalka J; Yager KG; Singh G; Karim A Nano Lett; 2017 Dec; 17(12):7814-7823. PubMed ID: 29136475 [TBL] [Abstract][Full Text] [Related]
8. Effect of film thickness and domain spacing on defect densities in directed self-assembly of cylindrical morphology block copolymers. Mishra V; Fredrickson GH; Kramer EJ ACS Nano; 2012 Mar; 6(3):2629-41. PubMed ID: 22339501 [TBL] [Abstract][Full Text] [Related]
9. Focused solar annealing for block copolymer fast self-assembly. Hu XH; Zhang R; Zhang X; Wu Z; Zhou J; Li W; Xiong S Heliyon; 2024 Jan; 10(2):e24016. PubMed ID: 38293481 [TBL] [Abstract][Full Text] [Related]
10. Microphase separation of block copolymer thin films. Zhang J; Yu X; Yang P; Peng J; Luo C; Huang W; Han Y Macromol Rapid Commun; 2010 Apr; 31(7):591-608. PubMed ID: 21590947 [TBL] [Abstract][Full Text] [Related]
11. High aspect ratio PS-b-PMMA block copolymer masks for lithographic applications. Ferrarese Lupi F; Giammaria TJ; Volpe FG; Lotto F; Seguini G; Pivac B; Laus M; Perego M ACS Appl Mater Interfaces; 2014 Dec; 6(23):21389-96. PubMed ID: 25387131 [TBL] [Abstract][Full Text] [Related]
12. Ultrafast Self-Assembly of Sub-10 nm Block Copolymer Nanostructures by Solvent-Free High-Temperature Laser Annealing. Jiang J; Jacobs AG; Wenning B; Liedel C; Thompson MO; Ober CK ACS Appl Mater Interfaces; 2017 Sep; 9(37):31317-31324. PubMed ID: 28598156 [TBL] [Abstract][Full Text] [Related]
13. Photopatterning of cross-linkable epoxide-functionalized block copolymers and dual-tone nanostructure development for fabrication across the nano- and microscales. He C; Stoykovich MP Small; 2015 May; 11(20):2407-16. PubMed ID: 25611328 [TBL] [Abstract][Full Text] [Related]
14. Hierarchically organized honeycomb films through block copolymer directed self-assembly in "breath figure" templating and soft microwave-triggered annealing. Benoot N; Marcasuzaa P; Pessoni L; Chasvised S; Reynaud S; Bousquet A; Billon L Soft Matter; 2018 Jun; 14(23):4874-4880. PubMed ID: 29850760 [TBL] [Abstract][Full Text] [Related]
15. Fast assembly of ordered block copolymer nanostructures through microwave annealing. Zhang X; Harris KD; Wu NL; Murphy JN; Buriak JM ACS Nano; 2010 Nov; 4(11):7021-9. PubMed ID: 20964379 [TBL] [Abstract][Full Text] [Related]
16. Controlling the Pore Size of Mesoporous Carbon Thin Films through Thermal and Solvent Annealing. Zhou Z; Liu G Small; 2017 Apr; 13(15):. PubMed ID: 28151575 [TBL] [Abstract][Full Text] [Related]
17. Nanoporous Films with Sub-10 nm in Pore Size from Acid-Cleavable Block Copolymers. Li Y; Xu Y; Cao S; Zhao Y; Qu T; Iyoda T; Chen A Macromol Rapid Commun; 2017 Mar; 38(5):. PubMed ID: 28117519 [TBL] [Abstract][Full Text] [Related]
18. Optimization of long-range order in solvent vapor annealed poly(styrene)-block-poly(lactide) thin films for nanolithography. Baruth A; Seo M; Lin CH; Walster K; Shankar A; Hillmyer MA; Leighton C ACS Appl Mater Interfaces; 2014 Aug; 6(16):13770-81. PubMed ID: 25029410 [TBL] [Abstract][Full Text] [Related]
19. Self-assembly of diblock copolymer-maghemite nanoparticle hybrid thin films. Yao Y; Metwalli E; Moulin JF; Su B; Opel M; Müller-Buschbaum P ACS Appl Mater Interfaces; 2014 Oct; 6(20):18152-62. PubMed ID: 25243575 [TBL] [Abstract][Full Text] [Related]