These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.
170 related articles for article (PubMed ID: 25520590)
41. A quantitative approach for trap analysis between Al Amir W; Shin JW; Shin KY; Kim JM; Cho CY; Park KH; Hoshi T; Tsutsumi T; Sugiyama H; Matsuzaki H; Kim TW Sci Rep; 2021 Nov; 11(1):22401. PubMed ID: 34789786 [TBL] [Abstract][Full Text] [Related]
42. Can ultra-thin Si FinFETs work well in the sub-10 nm gate-length region? Liu S; Yang J; Xu L; Li J; Yang C; Li Y; Shi B; Pan Y; Xu L; Ma J; Yang J; Lu J Nanoscale; 2021 Mar; 13(10):5536-5544. PubMed ID: 33688887 [TBL] [Abstract][Full Text] [Related]
43. Performance Degradation in Static Random Access Memory of 10 nm Node FinFET Owing to Displacement Defects. Bang M; Ha J; Lee G; Suh M; Kim J Micromachines (Basel); 2023 May; 14(5):. PubMed ID: 37241715 [TBL] [Abstract][Full Text] [Related]
44. Electrical Characteristics and pH Response of a Parylene-H Sensing Membrane in a Si-Nanonet Ion-Sensitive Field-Effect Transistor. Jin B; Lee GY; Park C; Kim D; Choi W; Yoo JW; Pyun JC; Lee JS Sensors (Basel); 2018 Nov; 18(11):. PubMed ID: 30424510 [TBL] [Abstract][Full Text] [Related]
45. Modulating the interface quality and electrical properties of HfTiO/InGaAs gate stack by atomic-layer-deposition-derived Al₂O₃ passivation layer. He G; Gao J; Chen H; Cui J; Sun Z; Chen X ACS Appl Mater Interfaces; 2014 Dec; 6(24):22013-25. PubMed ID: 25471009 [TBL] [Abstract][Full Text] [Related]
46. Metal-Induced Trap States: The Roles of Interface and Border Traps in HfO Do HB; Luc QH; Pham PV; Phan-Gia AV; Nguyen TS; Le HM; De Souza MM Micromachines (Basel); 2023 Aug; 14(8):. PubMed ID: 37630142 [TBL] [Abstract][Full Text] [Related]
47. Metal oxide-graphene field-effect transistor: interface trap density extraction model. Najam F; Lau KC; Lim CS; Yu YS; Tan ML Beilstein J Nanotechnol; 2016; 7():1368-1376. PubMed ID: 27826511 [TBL] [Abstract][Full Text] [Related]
48. Vertical Gate-All-Around Device Architecture to Improve the Device Performance for Sub-5-nm Technology. Noh C; Han C; Won SM; Shin C Micromachines (Basel); 2022 Sep; 13(9):. PubMed ID: 36144174 [TBL] [Abstract][Full Text] [Related]
49. Electrical Properties of Ultrathin Hf-Ti-O Higher k Gate Dielectric Films and Their Application in ETSOI MOSFET. Xiong Y; Chen X; Wei F; Du J; Zhao H; Tang Z; Tang B; Wang W; Yan J Nanoscale Res Lett; 2016 Dec; 11(1):533. PubMed ID: 27905095 [TBL] [Abstract][Full Text] [Related]
50. Electrical property comparison and charge transmission in p-type double gate and single gate junctionless accumulation transistor fabricated by AFM nanolithography. Dehzangi A; Abdullah AM; Larki F; Hutagalung SD; Saion EB; Hamidon MN; Hassan J; Gharayebi Y Nanoscale Res Lett; 2012 Jul; 7(1):381. PubMed ID: 22781031 [TBL] [Abstract][Full Text] [Related]
51. Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer. Qian Q; Li B; Hua M; Zhang Z; Lan F; Xu Y; Yan R; Chen KJ Sci Rep; 2016 Jun; 6():27676. PubMed ID: 27279454 [TBL] [Abstract][Full Text] [Related]
52. Insight into over Repair of Hot Carrier Degradation by GIDL Current in Si p-FinFETs Using Ultra-Fast Measurement Technique. Chang H; Wang G; Yang H; Liu Q; Zhou L; Ji Z; Yu R; Wu Z; Yin H; Du A; Li J; Luo J; Zhao C; Wang W Nanomaterials (Basel); 2023 Apr; 13(7):. PubMed ID: 37049352 [TBL] [Abstract][Full Text] [Related]
53. Optimization of Structure and Electrical Characteristics for Four-Layer Vertically-Stacked Horizontal Gate-All-Around Si Nanosheets Devices. Zhang Q; Gu J; Xu R; Cao L; Li J; Wu Z; Wang G; Yao J; Zhang Z; Xiang J; He X; Kong Z; Yang H; Tian J; Xu G; Mao S; Radamson HH; Yin H; Luo J Nanomaterials (Basel); 2021 Mar; 11(3):. PubMed ID: 33808024 [TBL] [Abstract][Full Text] [Related]
54. Analyses on RF Performances of Silicon-Compatible InGaAs-Based Planar-Type and Fin-Type Junctionless Field-Effect Transistors. Seo JH; Yoon YJ; Cho S; Tae HS; Lee JH; Kang IM J Nanosci Nanotechnol; 2015 Oct; 15(10):7615-9. PubMed ID: 26726384 [TBL] [Abstract][Full Text] [Related]
55. Low-frequency electrical fluctuations in metal-nanowire-metal phototransistors. Lu MP; Lu MY; Wang YJ Nanotechnology; 2014 Jul; 25(28):285202. PubMed ID: 24971527 [TBL] [Abstract][Full Text] [Related]
56. Diamond FinFET without Hydrogen Termination. Huang B; Bai X; Lam SK; Tsang KK Sci Rep; 2018 Feb; 8(1):3063. PubMed ID: 29449602 [TBL] [Abstract][Full Text] [Related]
57. Abnormal behavior of threshold voltage shift in bias-stressed a-Si:H thin film transistor under extremely high intensity illumination. Han SY; Park KT; Kim C; Jeon S; Yang SH; Kong HS ACS Appl Mater Interfaces; 2015 Jul; 7(28):15442-6. PubMed ID: 26132513 [TBL] [Abstract][Full Text] [Related]
58. Near-ideal subthreshold swing MoS Pan Y; Jia K; Huang K; Wu Z; Bai G; Yu J; Zhang Z; Zhang Q; Yin H Nanotechnology; 2019 Mar; 30(9):095202. PubMed ID: 30561381 [TBL] [Abstract][Full Text] [Related]
59. Interface studies of well-controlled polymer bilayers and field-effect transistors prepared by a mixed-solvent method. Zhang F; Hu Y; Lou Z; Xin X; Zhang M; Hou Y; Teng F RSC Adv; 2018 Mar; 8(21):11272-11279. PubMed ID: 35542823 [TBL] [Abstract][Full Text] [Related]