These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.
84 related articles for article (PubMed ID: 25606775)
1. Efficient representation of mask transmittance functions for vectorial lithography simulations. Zhou X; Zhang C; Jiang H; Wei H; Liu S J Opt Soc Am A Opt Image Sci Vis; 2014 Dec; 31(12):B10-8. PubMed ID: 25606775 [TBL] [Abstract][Full Text] [Related]
2. Convolution-variation separation method for efficient modeling of optical lithography. Liu S; Zhou X; Lv W; Xu S; Wei H Opt Lett; 2013 Jul; 38(13):2168-70. PubMed ID: 23811866 [TBL] [Abstract][Full Text] [Related]
3. Robust and efficient inverse mask synthesis with basis function representation. Wu X; Liu S; Lv W; Lam EY J Opt Soc Am A Opt Image Sci Vis; 2014 Dec; 31(12):B1-9. PubMed ID: 25606774 [TBL] [Abstract][Full Text] [Related]
4. Fast lithography aerial image calculation method based on machine learning. Ma X; Zhao X; Wang Z; Li Y; Zhao S; Zhang L Appl Opt; 2017 Aug; 56(23):6485-6495. PubMed ID: 29047938 [TBL] [Abstract][Full Text] [Related]
5. Fast convolution method and its application in mask optimization for intensity calculation using basis expansion. Sun Y; Zhang J; Wang Y; Yu Z IEEE Trans Image Process; 2014 Dec; 23(12):4982-95. PubMed ID: 25265610 [TBL] [Abstract][Full Text] [Related]
6. Efficient source mask optimization with Zernike polynomial functions for source representation. Wu X; Liu S; Li J; Lam EY Opt Express; 2014 Feb; 22(4):3924-37. PubMed ID: 24663713 [TBL] [Abstract][Full Text] [Related]
7. Vectorial pupil optimization to compensate polarization distortion in immersion lithography system. Li T; Liu Y; Sun Y; Yan X; Wei P; Li Y Opt Express; 2020 Feb; 28(4):4412-4425. PubMed ID: 32121678 [TBL] [Abstract][Full Text] [Related]
8. Robust source and mask optimization compensating for mask topography effects in computational lithography. Li J; Lam EY Opt Express; 2014 Apr; 22(8):9471-85. PubMed ID: 24787836 [TBL] [Abstract][Full Text] [Related]
9. Fast extreme ultraviolet lithography mask near-field calculation method based on machine learning. Lin J; Dong L; Fan T; Ma X; Chen R; Wei Y Appl Opt; 2020 Mar; 59(9):2829-2838. PubMed ID: 32225832 [TBL] [Abstract][Full Text] [Related]
10. Binary mask optimization for forward lithography based on the boundary layer model in coherent systems. Ma X; Arce GR J Opt Soc Am A Opt Image Sci Vis; 2009 Jul; 26(7):1687-95. PubMed ID: 19568305 [TBL] [Abstract][Full Text] [Related]
11. High-precision lithography thick-mask model based on a decomposition machine learning method. Li Z; Dong L; Jing X; Ma X; Wei Y Opt Express; 2022 May; 30(11):17680-17697. PubMed ID: 36221585 [TBL] [Abstract][Full Text] [Related]
12. Mask optimization approaches in optical lithography based on a vector imaging model. Ma X; Li Y; Dong L J Opt Soc Am A Opt Image Sci Vis; 2012 Jul; 29(7):1300-12. PubMed ID: 22751396 [TBL] [Abstract][Full Text] [Related]
13. Block-based mask optimization for optical lithography. Ma X; Song Z; Li Y; Arce GR Appl Opt; 2013 May; 52(14):3351-63. PubMed ID: 23669851 [TBL] [Abstract][Full Text] [Related]
14. Optimal 3D phase-shifting masks in partially coherent illumination. Ma X; Arce GR; Li Y Appl Opt; 2011 Oct; 50(28):5567-76. PubMed ID: 22016227 [TBL] [Abstract][Full Text] [Related]
15. Gradient-based source and mask optimization in optical lithography. Peng Y; Zhang J; Wang Y; Yu Z IEEE Trans Image Process; 2011 Oct; 20(10):2856-64. PubMed ID: 21435976 [TBL] [Abstract][Full Text] [Related]
16. Influence of the mask magnification on imaging in hyper-NA lithography. Lin CH; Chen HL; Ko FH J Opt Soc Am A Opt Image Sci Vis; 2007 Jun; 24(6):1633-40. PubMed ID: 17491631 [TBL] [Abstract][Full Text] [Related]
17. Laser parallel nanofabrication by single femtosecond pulse near-field ablation using photoresist masks. Jipa F; Dinescu A; Filipescu M; Anghel I; Zamfirescu M; Dabu R Opt Express; 2014 Feb; 22(3):3356-61. PubMed ID: 24663626 [TBL] [Abstract][Full Text] [Related]
18. Vectorial pupil optimization to compensate for a polarization effect at full exposure field in lithography. Yuan M; Sun Y; Wei P; Li Z; Liao G; Li Y; Zou L; Li Y Appl Opt; 2021 Nov; 60(31):9681-9690. PubMed ID: 34807151 [TBL] [Abstract][Full Text] [Related]
19. Integral equation analysis and optimization of 2D layered nanolithography masks by complex images Green's function technique in TM polarization. Haghtalab M; Faraji-Dana R J Opt Soc Am A Opt Image Sci Vis; 2012 May; 29(5):748-56. PubMed ID: 22561933 [TBL] [Abstract][Full Text] [Related]
20. Modeling of through-focus aerial image with aberration and imaginary mask edge effects in optical lithography simulation. Yamazoe K; Neureuther AR Appl Opt; 2011 Jul; 50(20):3570-8. PubMed ID: 21743568 [TBL] [Abstract][Full Text] [Related] [Next] [New Search]