These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

165 related articles for article (PubMed ID: 25681930)

  • 21. Formation of BN-covered silicene on ZrB
    Yoshinobu J; Mukai K; Ueda H; Yoshimoto S; Shimizu S; Koitaya T; Noritake H; Lee CC; Ozaki T; Fleurence A; Friedlein R; Yamada-Takamura Y
    J Chem Phys; 2020 Aug; 153(6):064702. PubMed ID: 35287437
    [TBL] [Abstract][Full Text] [Related]  

  • 22. Investigations of AlN thin film crystalline properties in a wide temperature range by in situ X-ray diffraction measurements: Correlation with AlN/sapphire-based SAW structure performance.
    Aït Aïssa K; Elmazria O; Boulet P; Aubert T; Legrani O; Mangin D
    IEEE Trans Ultrason Ferroelectr Freq Control; 2015 Jul; 62(7):1397-402. PubMed ID: 26168184
    [TBL] [Abstract][Full Text] [Related]  

  • 23. AlN epitaxy on SiC by low-temperature atomic layer deposition
    Kao WC; Lee WH; Yi SH; Shen TH; Lin HC; Chen MJ
    RSC Adv; 2019 Apr; 9(22):12226-12231. PubMed ID: 35515870
    [TBL] [Abstract][Full Text] [Related]  

  • 24. Low-Temperature One-Step Growth of AlON Thin Films with Homogenous Nitrogen-Doping Profile by Plasma-Enhanced Atomic Layer Deposition.
    Chen HY; Lu HL; Chen JX; Zhang F; Ji XM; Liu WJ; Yang XF; Zhang DW
    ACS Appl Mater Interfaces; 2017 Nov; 9(44):38662-38669. PubMed ID: 29039913
    [TBL] [Abstract][Full Text] [Related]  

  • 25. Low Temperature Reactive Sputtering of Thin Aluminum Nitride Films on Metallic Nanocomposites.
    Ramadan KS; Evoy S
    PLoS One; 2015; 10(7):e0133479. PubMed ID: 26193701
    [TBL] [Abstract][Full Text] [Related]  

  • 26. Thermal Atomic Layer Etching of Silica and Alumina Thin Films Using Trimethylaluminum with Hydrogen Fluoride or Fluoroform.
    Rahman R; Mattson EC; Klesko JP; Dangerfield A; Rivillon-Amy S; Smith DC; Hausmann D; Chabal YJ
    ACS Appl Mater Interfaces; 2018 Sep; 10(37):31784-31794. PubMed ID: 30179460
    [TBL] [Abstract][Full Text] [Related]  

  • 27. Atomic layer deposited molybdenum nitride thin film: a promising anode material for Li ion batteries.
    Nandi DK; Sen UK; Choudhury D; Mitra S; Sarkar SK
    ACS Appl Mater Interfaces; 2014 May; 6(9):6606-15. PubMed ID: 24641277
    [TBL] [Abstract][Full Text] [Related]  

  • 28. Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si₂Cl₆ and NH₃ Plasma.
    Ovanesyan RA; Hausmann DM; Agarwal S
    ACS Appl Mater Interfaces; 2015 May; 7(20):10806-13. PubMed ID: 25927250
    [TBL] [Abstract][Full Text] [Related]  

  • 29. Atomic layer deposited tungsten nitride thin films as a new lithium-ion battery anode.
    Nandi DK; Sen UK; Sinha S; Dhara A; Mitra S; Sarkar SK
    Phys Chem Chem Phys; 2015 Jul; 17(26):17445-53. PubMed ID: 26076771
    [TBL] [Abstract][Full Text] [Related]  

  • 30. Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing.
    Shih HY; Lee WH; Kao WC; Chuang YC; Lin RM; Lin HC; Shiojiri M; Chen MJ
    Sci Rep; 2017 Jan; 7():39717. PubMed ID: 28045075
    [TBL] [Abstract][Full Text] [Related]  

  • 31. Alternative Route to Silicene Synthesis via Surface Reconstruction on h-MoSi
    Volders C; Monazami E; Ramalingam G; Reinke P
    Nano Lett; 2017 Jan; 17(1):299-307. PubMed ID: 27997208
    [TBL] [Abstract][Full Text] [Related]  

  • 32. Improvement of AlN Film Quality Using Plasma Enhanced Atomic Layer Deposition with Substrate Biasing.
    Legallais M; Mehdi H; David S; Bassani F; Labau S; Pelissier B; Baron T; Martinez E; Ghibaudo G; Salem B
    ACS Appl Mater Interfaces; 2020 Sep; 12(35):39870-39880. PubMed ID: 32805854
    [TBL] [Abstract][Full Text] [Related]  

  • 33. Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition.
    Shih HY; Lin MC; Chen LY; Chen MJ
    Nanotechnology; 2015 Jan; 26(1):014002. PubMed ID: 25494474
    [TBL] [Abstract][Full Text] [Related]  

  • 34. Effect of pre-deposition RF plasma etching on wafer surface morphology and crystal orientation of piezoelectric AlN thin films.
    Felmetsger V; Mikhov M; Laptev P
    IEEE Trans Ultrason Ferroelectr Freq Control; 2015 Feb; 62(2):387-91. PubMed ID: 25643087
    [TBL] [Abstract][Full Text] [Related]  

  • 35. AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms.
    Miao M; Cadien K
    RSC Adv; 2021 Mar; 11(20):12235-12248. PubMed ID: 35423742
    [TBL] [Abstract][Full Text] [Related]  

  • 36. On the effectiveness of lateral excitation of shear modes in AlN layered resonators.
    Clement M; Iborra E; Olivares J; DeMiguel-Ramos M; Mirea T; Sangrador J
    Ultrasonics; 2014 Aug; 54(6):1504-8. PubMed ID: 24830359
    [TBL] [Abstract][Full Text] [Related]  

  • 37. Molecular layer deposition of aluminum alkoxide polymer films using trimethylaluminum and glycidol.
    Lee Y; Yoon B; Cavanagh AS; George SM
    Langmuir; 2011 Dec; 27(24):15155-64. PubMed ID: 22029704
    [TBL] [Abstract][Full Text] [Related]  

  • 38. Silicene Passivation by Few-Layer Graphene.
    Ritter V; Genser J; Nazzari D; Bethge O; Bertagnolli E; Lugstein A
    ACS Appl Mater Interfaces; 2019 Apr; 11(13):12745-12751. PubMed ID: 30864771
    [TBL] [Abstract][Full Text] [Related]  

  • 39. Silicon surface deoxidation using strontium oxide deposited with the pulsed laser deposition technique.
    Jovanović Z; Spreitzer M; Kovač J; Klement D; Suvorov D
    ACS Appl Mater Interfaces; 2014 Oct; 6(20):18205-14. PubMed ID: 25249034
    [TBL] [Abstract][Full Text] [Related]  

  • 40. Low-temperature roll-to-roll atmospheric atomic layer deposition of Al₂O₃ thin films.
    Ali K; Choi KH
    Langmuir; 2014 Dec; 30(47):14195-203. PubMed ID: 25407477
    [TBL] [Abstract][Full Text] [Related]  

    [Previous]   [Next]    [New Search]
    of 9.