These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

108 related articles for article (PubMed ID: 25971096)

  • 1. Etch characteristics of magnetic tunnel junction materials using bias pulsing in the CH4/N2O inductively coupled plasma.
    Jeon MH; Youn JY; Yang KC; Yun DH; Lee du Y; Shim TH; Park JG; Yeom GY
    J Nanosci Nanotechnol; 2014 Dec; 14(12):9541-7. PubMed ID: 25971096
    [TBL] [Abstract][Full Text] [Related]  

  • 2. Effect of RF pulsing biasing on the etching of magnetic tunnel junction materials using CH3OH.
    Jeon MH; Yun DH; Yang KC; Youn JY; Lee du Y; Shim TH; Park JG; Yeom GY
    J Nanosci Nanotechnol; 2014 Dec; 14(12):9680-5. PubMed ID: 25971119
    [TBL] [Abstract][Full Text] [Related]  

  • 3. Investigation on etch characteristics of nanometer-sized magnetic tunnel junction stacks using a HBr/Ar plasma.
    Kim EH; Xiao YB; Kong SM; Chung CW
    J Nanosci Nanotechnol; 2011 Jul; 11(7):6616-20. PubMed ID: 22121768
    [TBL] [Abstract][Full Text] [Related]  

  • 4. Etch characteristics of magnetic tunnel junction materials using H
    Kim JE; Kim DS; Gill YJ; Jang YJ; Kim YE; Cho H; Won BY; Kwon O; Yoon K; Choi JY; Park JG; Yeom GY
    Nanotechnology; 2021 Jan; 32(5):055301. PubMed ID: 33179607
    [TBL] [Abstract][Full Text] [Related]  

  • 5. Etch Properties of Amorphous Carbon Material Using RF Pulsing in the O2/N2/CHF3 Plasma.
    Jeon MH; Park JW; Yun DH; Kim KN; Yeom GY
    J Nanosci Nanotechnol; 2015 Nov; 15(11):8577-83. PubMed ID: 26726555
    [TBL] [Abstract][Full Text] [Related]  

  • 6. Effects of Bias Pulsing on Etching of SiO2 Pattern in Capacitively-Coupled Plasmas for Nano-Scale Patterning of Multi-Level Hard Masks.
    Kim S; Choi G; Chae H; Lee NE
    J Nanosci Nanotechnol; 2016 May; 16(5):5143-9. PubMed ID: 27483889
    [TBL] [Abstract][Full Text] [Related]  

  • 7. Effect of Embedded RF Pulsing for Selective Etching of SiO2 in the Dual-Frequency Capacitive Coupled Plasmas.
    Kim NH; Jeon MH; Kim TH; Yeom GY
    J Nanosci Nanotechnol; 2015 Nov; 15(11):8667-73. PubMed ID: 26726572
    [TBL] [Abstract][Full Text] [Related]  

  • 8. Etch characteristics of Si and TiO
    Kim SG; Yang KC; Shin YJ; Kim KN; Kim DW; Lee JY; Kim Y; Yeom GY
    Nanotechnology; 2020 Apr; 31(26):265302. PubMed ID: 32131063
    [TBL] [Abstract][Full Text] [Related]  

  • 9. Etch Characteristics of Nanoscale Patterned Magnetic Tunnel Junction Stacks Using Pulse-Modulated Radio Frequency Source Plasma.
    Lee JY; Lim ET; Ryu JS; Choi JS; Chung CW
    J Nanosci Nanotechnol; 2020 Aug; 20(8):5131-5137. PubMed ID: 32126711
    [TBL] [Abstract][Full Text] [Related]  

  • 10. Characteristics of pulsed internal inductively coupled plasma for next generation display processing.
    Kim TH; Lee SM; Lee CH; Bae JO; Yeom GY; Kim KN
    J Nanosci Nanotechnol; 2014 Dec; 14(12):9614-8. PubMed ID: 25971107
    [TBL] [Abstract][Full Text] [Related]  

  • 11. Comparative analysis of barium titanate thin films dry etching using inductively coupled plasmas by different fluorine-based mixture gas.
    Li Y; Wang C; Yao Z; Kim HK; Kim NY
    Nanoscale Res Lett; 2014; 9(1):530. PubMed ID: 25278821
    [TBL] [Abstract][Full Text] [Related]  

  • 12. Pulse-biased etching of Si3N4-layer in capacitively-coupled plasmas for nano-scale patterning of multi-level resist structures.
    Lee H; Kim S; Choi G; Lee NE
    J Nanosci Nanotechnol; 2014 Dec; 14(12):9470-6. PubMed ID: 25971085
    [TBL] [Abstract][Full Text] [Related]  

  • 13. Investigation of SiO
    Sung D; Wen L; Tak H; Lee H; Kim D; Yeom G
    Materials (Basel); 2022 Feb; 15(4):. PubMed ID: 35207841
    [TBL] [Abstract][Full Text] [Related]  

  • 14. Reactive ion etching of an ovonic threshold switch (OTS) material using hydrogen-based plasmas for non-volatile phase change memories.
    Kim DS; Kim JE; Gill YJ; Park JW; Jang YJ; Kim YE; Choi H; Kwon O; Yeom GY
    RSC Adv; 2020 Sep; 10(59):36141-36146. PubMed ID: 35517099
    [TBL] [Abstract][Full Text] [Related]  

  • 15. Surface Analysis of Amorphous Carbon Thin Film for Etch Hard Mask.
    Kim KP; Song WS; Park MK; Hong SJ
    J Nanosci Nanotechnol; 2021 Mar; 21(3):2032-2038. PubMed ID: 33404489
    [TBL] [Abstract][Full Text] [Related]  

  • 16. Effect of coupling ability between a synthetic antiferromagnetic layer and pinned layer on a bridging layer of Ta, Ti, and Pt in perpendicular-magnetic tunnel junctions.
    Lee DY; Shim TH; Park JG
    Nanotechnology; 2016 Jul; 27(29):295705. PubMed ID: 27292593
    [TBL] [Abstract][Full Text] [Related]  

  • 17. Etch Characteristics of Micrometer-Scale Masked Cu Thin Films Using Inductively Coupled Plasma of H₂/Ar.
    Choi JS; Cho DH; Lim ET; Chung CW
    J Nanosci Nanotechnol; 2019 Oct; 19(10):6506-6511. PubMed ID: 31026985
    [TBL] [Abstract][Full Text] [Related]  

  • 18. Ultrathin W space layer-enabled thermal stability enhancement in a perpendicular MgO/CoFeB/W/CoFeB/MgO recording frame.
    Kim JH; Lee JB; An GG; Yang SM; Chung WS; Park HS; Hong JP
    Sci Rep; 2015 Nov; 5():16903. PubMed ID: 26584638
    [TBL] [Abstract][Full Text] [Related]  

  • 19. Magnetic tunnel junctions with integrated thermometers for magnetothermopower measurements.
    Böhnert T; Serrano-Guisan S; Paz E; Lacoste B; Ferreira R; Freitas PP
    J Phys Condens Matter; 2017 May; 29(18):185303. PubMed ID: 28247852
    [TBL] [Abstract][Full Text] [Related]  

  • 20. Highly selective etching of SnO2 absorber in binary mask structure for extreme ultra-violet lithography.
    Lee SJ; Jung CY; Park SJ; Hwangbo CK; Seo HS; Kim SS; Lee NE
    J Nanosci Nanotechnol; 2012 Apr; 12(4):3334-40. PubMed ID: 22849119
    [TBL] [Abstract][Full Text] [Related]  

    [Next]    [New Search]
    of 6.