These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.
327 related articles for article (PubMed ID: 26351823)
1. Direct Immersion Annealing of Thin Block Copolymer Films. Modi A; Bhaway SM; Vogt BD; Douglas JF; Al-Enizi A; Elzatahry A; Sharma A; Karim A ACS Appl Mater Interfaces; 2015 Oct; 7(39):21639-45. PubMed ID: 26351823 [TBL] [Abstract][Full Text] [Related]
2. Deconvoluting the mechanism of microwave annealing of block copolymer thin films. Jin C; Murphy JN; Harris KD; Buriak JM ACS Nano; 2014 Apr; 8(4):3979-91. PubMed ID: 24655292 [TBL] [Abstract][Full Text] [Related]
3. Transient Interfacial Pattern Formation in Block Copolymer Thin Films via Sequential Thermal and Solvent Immersion Annealing. Sharma K; Singh M; Satija SK; Ankner JF; Douglas JF; Karim A ACS Appl Mater Interfaces; 2024 Mar; 16(12):15569-15585. PubMed ID: 38483307 [TBL] [Abstract][Full Text] [Related]
4. Swift nanopattern formation of PS-b-PMMA and PS-b-PDMS block copolymer films using a microwave assisted technique. Borah D; Senthamaraikannan R; Rasappa S; Kosmala B; Holmes JD; Morris MA ACS Nano; 2013 Aug; 7(8):6583-96. PubMed ID: 23859379 [TBL] [Abstract][Full Text] [Related]
5. Enhanced Lateral Ordering in Cylinder Forming PS-b-PMMA Block Copolymers Exploiting the Entrapped Solvent. Seguini G; Zanenga F; Giammaria TJ; Ceresoli M; Sparnacci K; Antonioli D; Gianotti V; Laus M; Perego M ACS Appl Mater Interfaces; 2016 Mar; 8(12):8280-8. PubMed ID: 26959626 [TBL] [Abstract][Full Text] [Related]
6. Hiking down the Free Energy Landscape Using Sequential Solvent and Thermal Processing for Versatile Ordering of Block Copolymer Films. Sharma K; Agrawal A; Masud A; Satija SK; Ankner JF; Douglas JF; Karim A ACS Appl Mater Interfaces; 2023 May; 15(17):21562-21574. PubMed ID: 37083352 [TBL] [Abstract][Full Text] [Related]
7. Through-Thickness Vertically Ordered Lamellar Block Copolymer Thin Films on Unmodified Quartz with Cold Zone Annealing. Basutkar MN; Samant S; Strzalka J; Yager KG; Singh G; Karim A Nano Lett; 2017 Dec; 17(12):7814-7823. PubMed ID: 29136475 [TBL] [Abstract][Full Text] [Related]
8. Thickness and Microdomain Orientation of Asymmetric PS-b-PMMA Block Copolymer Films Inside Periodic Gratings. Ferrarese Lupi F; Aprile G; Giammaria TJ; Seguini G; Zuccheri G; De Leo N; Boarino L; Laus M; Perego M ACS Appl Mater Interfaces; 2015 Oct; 7(42):23615-22. PubMed ID: 26439144 [TBL] [Abstract][Full Text] [Related]
9. Micrometer-Scale Ordering of Silicon-Containing Block Copolymer Thin Films via High-Temperature Thermal Treatments. Giammaria TJ; Ferrarese Lupi F; Seguini G; Perego M; Vita F; Francescangeli O; Wenning B; Ober CK; Sparnacci K; Antonioli D; Gianotti V; Laus M ACS Appl Mater Interfaces; 2016 Apr; 8(15):9897-908. PubMed ID: 27020526 [TBL] [Abstract][Full Text] [Related]
10. Perpendicular Structure Formation of Block Copolymer Thin Films during Thermal Solvent Vapor Annealing: Solvent and Thickness Effects. Yang Q; Loos K Polymers (Basel); 2017 Oct; 9(10):. PubMed ID: 30965824 [TBL] [Abstract][Full Text] [Related]
11. Widely Tunable Morphologies in Block Copolymer Thin Films Through Solvent Vapor Annealing Using Mixtures of Selective Solvents. Chavis MA; Smilgies DM; Wiesner UB; Ober CK Adv Funct Mater; 2015 May; 25(20):3057-3065. PubMed ID: 26819574 [TBL] [Abstract][Full Text] [Related]
12. Evolution of lateral ordering in symmetric block copolymer thin films upon rapid thermal processing. Ceresoli M; Ferrarese Lupi F; Seguini G; Sparnacci K; Gianotti V; Antonioli D; Laus M; Boarino L; Perego M Nanotechnology; 2014 Jul; 25(27):275601. PubMed ID: 24960172 [TBL] [Abstract][Full Text] [Related]
13. Solvothermal Vapor Annealing of Lamellar Poly(styrene)-block-poly(d,l-lactide) Block Copolymer Thin Films for Directed Self-Assembly Application. Cummins C; Mokarian-Tabari P; Andreazza P; Sinturel C; Morris MA ACS Appl Mater Interfaces; 2016 Mar; 8(12):8295-304. PubMed ID: 26950246 [TBL] [Abstract][Full Text] [Related]
14. Morphologies in solvent-annealed thin films of symmetric diblock copolymer. Peng J; Kim DH; Knoll W; Xuan Y; Li B; Han Y J Chem Phys; 2006 Aug; 125(6):64702. PubMed ID: 16942300 [TBL] [Abstract][Full Text] [Related]
15. Highly Ordered Porous Inorganic Structures Esmeraldo Paiva A; Baez Vasquez JF; Selkirk A; Prochukhan N; G L Medeiros Borsagli F; Morris M ACS Appl Mater Interfaces; 2022 Aug; 14(30):35265-35275. PubMed ID: 35876355 [TBL] [Abstract][Full Text] [Related]
16. Topologically Distinct Lamellar Block Copolymer Morphologies Formed by Solvent and Thermal Annealing. Campbell IP; He C; Stoykovich MP ACS Macro Lett; 2013 Oct; 2(10):918-923. PubMed ID: 35607014 [TBL] [Abstract][Full Text] [Related]
17. Effects of copolymer composition, film thickness, and solvent vapor annealing time on dewetting of ultrathin block copolymer films. Huang C; Wen G; Li J; Wu T; Wang L; Xue F; Li H; Shi T J Colloid Interface Sci; 2016 Sep; 478():236-45. PubMed ID: 27309943 [TBL] [Abstract][Full Text] [Related]
18. Fine tuning of lithographic masks through thin films of PS-b-PMMA with different molar mass by rapid thermal processing. Ferrarese Lupi F; Giammaria TJ; Seguini G; Vita F; Francescangeli O; Sparnacci K; Antonioli D; Gianotti V; Laus M; Perego M ACS Appl Mater Interfaces; 2014 May; 6(10):7180-8. PubMed ID: 24738855 [TBL] [Abstract][Full Text] [Related]