These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

140 related articles for article (PubMed ID: 26373113)

  • 1. Growth Behavior of High Density Al2O3 Layer Prepared by Using Cyclic Chemical Vapor Deposition Technology.
    Jang HJ; An JS; Park CY; Lee JH; Choi BH; Lee CH
    J Nanosci Nanotechnol; 2015 Jul; 15(7):5232-7. PubMed ID: 26373113
    [TBL] [Abstract][Full Text] [Related]  

  • 2. Use of a New Non-Pyrophoric Liquid Aluminum Precursor for Atomic Layer Deposition.
    Xia X; Taylor A; Zhao Y; Guldin S; Blackman C
    Materials (Basel); 2019 May; 12(9):. PubMed ID: 31052512
    [TBL] [Abstract][Full Text] [Related]  

  • 3. Realization of Al
    Li M; Xu M; Zou J; Tao H; Wang L; Zhou Z; Peng J
    Nanotechnology; 2016 Dec; 27(49):494003. PubMed ID: 27827342
    [TBL] [Abstract][Full Text] [Related]  

  • 4. A Study on the Growth Behavior and Stability of Molecular Layer Deposited Alucone Films Using Diethylene Glycol and Trimethyl Aluminum Precursors, and the Enhancement of Diffusion Barrier Properties by Atomic Layer Deposited Al2O3 Capping.
    Choi DW; Yoo M; Lee HM; Park J; Kim HY; Park JS
    ACS Appl Mater Interfaces; 2016 May; 8(19):12263-71. PubMed ID: 27117392
    [TBL] [Abstract][Full Text] [Related]  

  • 5. Chemical vapor deposition of monolayer-thin WS
    Groven B; Claes D; Nalin Mehta A; Bender H; Vandervorst W; Heyns M; Caymax M; Radu I; Delabie A
    J Chem Phys; 2019 Mar; 150(10):104703. PubMed ID: 30876349
    [TBL] [Abstract][Full Text] [Related]  

  • 6. A flexible transparent gas barrier film employing the method of mixing ALD/MLD-grown Al2O3 and alucone layers.
    Xiao W; Hui DY; Zheng C; Yu D; Qiang YY; Ping C; Xiang CL; Yi Z
    Nanoscale Res Lett; 2015; 10():130. PubMed ID: 25852421
    [TBL] [Abstract][Full Text] [Related]  

  • 7. Growth and Characterization of Al2O3 Atomic Layer Deposition Films on sp(2)-Graphitic Carbon Substrates Using NO2/Trimethylaluminum Pretreatment.
    Young MJ; Musgrave CB; George SM
    ACS Appl Mater Interfaces; 2015 Jun; 7(22):12030-7. PubMed ID: 25965097
    [TBL] [Abstract][Full Text] [Related]  

  • 8. Low-temperature gas-barrier films by atomic layer deposition for encapsulating organic light-emitting diodes.
    Tseng MH; Yu HH; Chou KY; Jou JH; Lin KL; Wang CC; Tsai FY
    Nanotechnology; 2016 Jul; 27(29):295706. PubMed ID: 27299660
    [TBL] [Abstract][Full Text] [Related]  

  • 9. Water vapor and hydrogen gas diffusion barrier characteristics of Al
    Han JH; Kim TY; Kim DY; Yang HL; Park JS
    Dalton Trans; 2021 Nov; 50(43):15841-15848. PubMed ID: 34708841
    [TBL] [Abstract][Full Text] [Related]  

  • 10. Reaction Mechanism of Area-Selective Atomic Layer Deposition for Al
    Seo S; Yeo BC; Han SS; Yoon CM; Yang JY; Yoon J; Yoo C; Kim HJ; Lee YB; Lee SJ; Myoung JM; Lee HB; Kim WH; Oh IK; Kim H
    ACS Appl Mater Interfaces; 2017 Nov; 9(47):41607-41617. PubMed ID: 29111636
    [TBL] [Abstract][Full Text] [Related]  

  • 11. Interface Electrical Properties of Al
    Fisichella G; Schilirò E; Di Franco S; Fiorenza P; Lo Nigro R; Roccaforte F; Ravesi S; Giannazzo F
    ACS Appl Mater Interfaces; 2017 Mar; 9(8):7761-7771. PubMed ID: 28135063
    [TBL] [Abstract][Full Text] [Related]  

  • 12. Low-Temperature Process for Atomic Layer Chemical Vapor Deposition of an Al2O3 Passivation Layer for Organic Photovoltaic Cells.
    Kim H; Lee J; Sohn S; Jung D
    J Nanosci Nanotechnol; 2016 May; 16(5):5285-90. PubMed ID: 27483916
    [TBL] [Abstract][Full Text] [Related]  

  • 13. Efficient multi-barrier thin film encapsulation of OLED using alternating Al
    Wu J; Fei F; Wei C; Chen X; Nie S; Zhang D; Su W; Cui Z
    RSC Adv; 2018 Feb; 8(11):5721-5727. PubMed ID: 35539605
    [TBL] [Abstract][Full Text] [Related]  

  • 14. Growth behavior of iridium on Si substrates prepared by plasma enhanced atomic layer deposition.
    Choi BH; Lee JH; Lee HN; Lee HK
    J Nanosci Nanotechnol; 2011 Aug; 11(8):7416-9. PubMed ID: 22103209
    [TBL] [Abstract][Full Text] [Related]  

  • 15. Thin film encapsulation for organic light-emitting diodes using inorganic/organic hybrid layers by atomic layer deposition.
    Zhang H; Ding H; Wei M; Li C; Wei B; Zhang J
    Nanoscale Res Lett; 2015; 10():169. PubMed ID: 25977648
    [TBL] [Abstract][Full Text] [Related]  

  • 16. Atomic Layer Deposition onto Thermoplastic Polymeric Nanofibrous Aerogel Templates for Tailored Surface Properties.
    Lu J; Li Y; Song W; Losego MD; Monikandan R; Jacob KI; Xiao R
    ACS Nano; 2020 Jul; 14(7):7999-8011. PubMed ID: 32644796
    [TBL] [Abstract][Full Text] [Related]  

  • 17. Al2O3/TiO2 multilayer passivation layers grown at low temperature for flexible organic devices.
    Kwon TS; Moon DY; Moon YK; Kim WS; Park JW
    J Nanosci Nanotechnol; 2012 Apr; 12(4):3696-700. PubMed ID: 22849199
    [TBL] [Abstract][Full Text] [Related]  

  • 18. Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition.
    Kim LH; Jeong YJ; An TK; Park S; Jang JH; Nam S; Jang J; Kim SH; Park CE
    Phys Chem Chem Phys; 2016 Jan; 18(2):1042-9. PubMed ID: 26661064
    [TBL] [Abstract][Full Text] [Related]  

  • 19. Low-temperature atomic layer deposition of Al
    Chen G; Weng Y; Sun F; Zhou X; Wu C; Yan Q; Guo T; Zhang Y
    RSC Adv; 2019 Jul; 9(36):20884-20891. PubMed ID: 35515527
    [TBL] [Abstract][Full Text] [Related]  

  • 20. Atomic layer etching of Al2O3 using sequential, self-limiting thermal reactions with Sn(acac)2 and hydrogen fluoride.
    Lee Y; George SM
    ACS Nano; 2015 Feb; 9(2):2061-70. PubMed ID: 25604976
    [TBL] [Abstract][Full Text] [Related]  

    [Next]    [New Search]
    of 7.