318 related articles for article (PubMed ID: 26439144)
1. Thickness and Microdomain Orientation of Asymmetric PS-b-PMMA Block Copolymer Films Inside Periodic Gratings.
Ferrarese Lupi F; Aprile G; Giammaria TJ; Seguini G; Zuccheri G; De Leo N; Boarino L; Laus M; Perego M
ACS Appl Mater Interfaces; 2015 Oct; 7(42):23615-22. PubMed ID: 26439144
[TBL] [Abstract][Full Text] [Related]
2. Collective behavior of block copolymer thin films within periodic topographical structures.
Perego M; Andreozzi A; Vellei A; Ferrarese Lupi F; Seguini G
Nanotechnology; 2013 Jun; 24(24):245301. PubMed ID: 23680847
[TBL] [Abstract][Full Text] [Related]
3. Ultrathin random copolymer-grafted layers for block copolymer self-assembly.
Sparnacci K; Antonioli D; Gianotti V; Laus M; Lupi FF; Giammaria TJ; Seguini G; Perego M
ACS Appl Mater Interfaces; 2015 May; 7(20):10944-51. PubMed ID: 25954979
[TBL] [Abstract][Full Text] [Related]
4. Enhanced Lateral Ordering in Cylinder Forming PS-b-PMMA Block Copolymers Exploiting the Entrapped Solvent.
Seguini G; Zanenga F; Giammaria TJ; Ceresoli M; Sparnacci K; Antonioli D; Gianotti V; Laus M; Perego M
ACS Appl Mater Interfaces; 2016 Mar; 8(12):8280-8. PubMed ID: 26959626
[TBL] [Abstract][Full Text] [Related]
5. Effect of Entrapped Solvent on the Evolution of Lateral Order in Self-Assembled P(S-r-MMA)/PS-b-PMMA Systems with Different Thicknesses.
Giammaria TJ; Ferrarese Lupi F; Seguini G; Sparnacci K; Antonioli D; Gianotti V; Laus M; Perego M
ACS Appl Mater Interfaces; 2017 Sep; 9(37):31215-31223. PubMed ID: 28195457
[TBL] [Abstract][Full Text] [Related]
6. Hierarchical Self-Assembly of Thickness-Modulated Block Copolymer Thin Films for Controlling Nanodomain Orientations inside Bare Silicon Trenches.
Shin JY; Oh YT; Kim S; Lim HY; Lee B; Ko YC; Park S; Seon SW; Lee SG; Mun SS; Kim BH
Polymers (Basel); 2021 Feb; 13(4):. PubMed ID: 33668510
[TBL] [Abstract][Full Text] [Related]
7. Swift nanopattern formation of PS-b-PMMA and PS-b-PDMS block copolymer films using a microwave assisted technique.
Borah D; Senthamaraikannan R; Rasappa S; Kosmala B; Holmes JD; Morris MA
ACS Nano; 2013 Aug; 7(8):6583-96. PubMed ID: 23859379
[TBL] [Abstract][Full Text] [Related]
8. Circular nanopatterns over large areas from the self-assembly of block copolymers guided by shallow trenches.
Hong SW; Gu X; Huh J; Xiao S; Russell TP
ACS Nano; 2011 Apr; 5(4):2855-60. PubMed ID: 21395225
[TBL] [Abstract][Full Text] [Related]
9. Hierarchical Order in Dewetted Block Copolymer Thin Films on Chemically Patterned Surfaces.
Ferrarese Lupi F; Giammaria TJ; Miti A; Zuccheri G; Carignano S; Sparnacci K; Seguini G; De Leo N; Boarino L; Perego M; Laus M
ACS Nano; 2018 Jul; 12(7):7076-7085. PubMed ID: 29952543
[TBL] [Abstract][Full Text] [Related]
10. Orthogonally Aligned Block Copolymer Line Patterns on Minimal Topographic Patterns.
Choi J; Li Y; Kim PY; Liu F; Kim H; Yu DM; Huh J; Carter KR; Russell TP
ACS Appl Mater Interfaces; 2018 Mar; 10(9):8324-8332. PubMed ID: 29443490
[TBL] [Abstract][Full Text] [Related]
11. Perpendicular Block Copolymer Microdomains in High Aspect Ratio Templates.
Bai W; Gadelrab K; Alexander-Katz A; Ross CA
Nano Lett; 2015 Oct; 15(10):6901-8. PubMed ID: 26390190
[TBL] [Abstract][Full Text] [Related]
12. Solvothermal Vapor Annealing of Lamellar Poly(styrene)-block-poly(d,l-lactide) Block Copolymer Thin Films for Directed Self-Assembly Application.
Cummins C; Mokarian-Tabari P; Andreazza P; Sinturel C; Morris MA
ACS Appl Mater Interfaces; 2016 Mar; 8(12):8295-304. PubMed ID: 26950246
[TBL] [Abstract][Full Text] [Related]
13. Deconvoluting the mechanism of microwave annealing of block copolymer thin films.
Jin C; Murphy JN; Harris KD; Buriak JM
ACS Nano; 2014 Apr; 8(4):3979-91. PubMed ID: 24655292
[TBL] [Abstract][Full Text] [Related]
14. Thermal stability of functional P(S-r-MMA) random copolymers for nanolithographic applications.
Sparnacci K; Antonioli D; Gianotti V; Laus M; Zuccheri G; Ferrarese Lupi F; Giammaria TJ; Seguini G; Ceresoli M; Perego M
ACS Appl Mater Interfaces; 2015 Feb; 7(7):3920-30. PubMed ID: 25664773
[TBL] [Abstract][Full Text] [Related]
15. Toward Lateral Length Standards at the Nanoscale Based on Diblock Copolymers.
Aprile G; Ferrarese Lupi F; Fretto M; Enrico E; De Leo N; Boarino L; Volpe FG; Seguini G; Sparnacci K; Gianotti V; Laus M; Garnæs J; Perego M
ACS Appl Mater Interfaces; 2017 May; 9(18):15685-15697. PubMed ID: 28397488
[TBL] [Abstract][Full Text] [Related]
16. GISAXS Analysis of the In-Depth Morphology of Thick PS-b-PMMA Films.
Ferrarese Lupi F; Giammaria TJ; Seguini G; Laus M; Dubček P; Pivac B; Bernstorff S; Perego M
ACS Appl Mater Interfaces; 2017 Mar; 9(12):11054-11063. PubMed ID: 28263052
[TBL] [Abstract][Full Text] [Related]
17. Direct Immersion Annealing of Thin Block Copolymer Films.
Modi A; Bhaway SM; Vogt BD; Douglas JF; Al-Enizi A; Elzatahry A; Sharma A; Karim A
ACS Appl Mater Interfaces; 2015 Oct; 7(39):21639-45. PubMed ID: 26351823
[TBL] [Abstract][Full Text] [Related]
18. High aspect ratio PS-b-PMMA block copolymer masks for lithographic applications.
Ferrarese Lupi F; Giammaria TJ; Volpe FG; Lotto F; Seguini G; Pivac B; Laus M; Perego M
ACS Appl Mater Interfaces; 2014 Dec; 6(23):21389-96. PubMed ID: 25387131
[TBL] [Abstract][Full Text] [Related]
19. Micrometer-Scale Ordering of Silicon-Containing Block Copolymer Thin Films via High-Temperature Thermal Treatments.
Giammaria TJ; Ferrarese Lupi F; Seguini G; Perego M; Vita F; Francescangeli O; Wenning B; Ober CK; Sparnacci K; Antonioli D; Gianotti V; Laus M
ACS Appl Mater Interfaces; 2016 Apr; 8(15):9897-908. PubMed ID: 27020526
[TBL] [Abstract][Full Text] [Related]
20. UV-solvent annealing of PDMS-majority and PS-majority PS-b-PDMS block copolymer films.
Lee K; Kreider M; Bai W; Cheng LC; Dinachali SS; Tu KH; Huang T; Ntetsikas K; Liontos G; Avgeropoulos A; Ross CA
Nanotechnology; 2016 Nov; 27(46):465301. PubMed ID: 27736809
[TBL] [Abstract][Full Text] [Related]
[Next] [New Search]
