243 related articles for article (PubMed ID: 26480066)
1. Extreme ultraviolet proximity lithography for fast, flexible and parallel fabrication of infrared antennas.
Kunkemöller G; Mass TW; Michel AK; Kim HS; Brose S; Danylyuk S; Taubner T; Juschkin L
Opt Express; 2015 Oct; 23(20):25487-95. PubMed ID: 26480066
[TBL] [Abstract][Full Text] [Related]
2. High-efficiency diffraction gratings for EUV and soft x-rays using spin-on-carbon underlayers.
Wang X; Kazazis D; Tseng LT; Robinson APG; Ekinci Y
Nanotechnology; 2021 Nov; 33(6):. PubMed ID: 34678796
[TBL] [Abstract][Full Text] [Related]
3. Gradient-based inverse extreme ultraviolet lithography.
Ma X; Wang J; Chen X; Li Y; Arce GR
Appl Opt; 2015 Aug; 54(24):7284-300. PubMed ID: 26368764
[TBL] [Abstract][Full Text] [Related]
4. Computational proximity lithography with extreme ultraviolet radiation.
Deuter V; Grochowicz M; Brose S; Biller J; Danylyuk S; Taubner T; Siemion A; Grützmacher D; Juschkin L
Opt Express; 2020 Aug; 28(18):27000-27012. PubMed ID: 32906962
[TBL] [Abstract][Full Text] [Related]
5. Fast rigorous mask model for extreme ultraviolet lithography.
Zhang Z; Li S; Wang X; Cheng W
Appl Opt; 2020 Aug; 59(24):7376-7389. PubMed ID: 32902506
[TBL] [Abstract][Full Text] [Related]
6. Spectral purification and infrared light recycling in extreme ultraviolet lithography sources.
Bayraktar M; van Goor FA; Boller KJ; Bijkerk F
Opt Express; 2014 Apr; 22(7):8633-9. PubMed ID: 24718234
[TBL] [Abstract][Full Text] [Related]
7. Fabrication of quasiperiodic nanostructures with EUV interference lithography.
Langner A; Päivänranta B; Terhalle B; Ekinci Y
Nanotechnology; 2012 Mar; 23(10):105303. PubMed ID: 22361956
[TBL] [Abstract][Full Text] [Related]
8. Interferometric broadband Fourier spectroscopy with a partially coherent gas-discharge extreme ultraviolet light source.
Rudolf D; Bußmann J; Odstrčil M; Dong M; Bergmann K; Danylyuk S; Juschkin L
Opt Lett; 2015 Jun; 40(12):2818-21. PubMed ID: 26076270
[TBL] [Abstract][Full Text] [Related]
9. Recording oscillations of sub-micron size cantilevers by extreme ultraviolet Fourier transform holography.
Monserud NC; Malm EB; Wachulak PW; Putkaradze V; Balakrishnan G; Chao W; Anderson E; Carlton D; Marconi MC
Opt Express; 2014 Feb; 22(4):4161-7. PubMed ID: 24663740
[TBL] [Abstract][Full Text] [Related]
10. Single-digit-resolution nanopatterning with extreme ultraviolet light for the 2.5 nm technology node and beyond.
Mojarad N; Hojeij M; Wang L; Gobrecht J; Ekinci Y
Nanoscale; 2015 Mar; 7(9):4031-7. PubMed ID: 25653148
[TBL] [Abstract][Full Text] [Related]
11. [Characteristics of extreme ultraviolet emission from tin plasma using CO2 laser for lithography].
Wu T; Wang XB; Wang SY; Lu PX
Guang Pu Xue Yu Guang Pu Fen Xi; 2012 Jul; 32(7):1729-33. PubMed ID: 23016313
[TBL] [Abstract][Full Text] [Related]
12. Nano-Patterns of Photoresist Fabricated by Ultraviolet Lithography Technology.
Cheng E; Tang S; Li C; Zou H; Wei Q
J Nanosci Nanotechnol; 2020 Apr; 20(4):2508-2513. PubMed ID: 31492269
[TBL] [Abstract][Full Text] [Related]
13. Extreme-ultraviolet lensless Fourier-transform holography.
Lee SH; Naulleau P; Goldberg KA; Cho CH; Jeong S; Bokor J
Appl Opt; 2001 Jun; 40(16):2655-61. PubMed ID: 18357280
[TBL] [Abstract][Full Text] [Related]
14. Advanced mask aligner lithography: fabrication of periodic patterns using pinhole array mask and Talbot effect.
Stuerzebecher L; Harzendorf T; Vogler U; Zeitner UD; Voelkel R
Opt Express; 2010 Sep; 18(19):19485-94. PubMed ID: 20940844
[TBL] [Abstract][Full Text] [Related]
15. Evaluation of Metal Absorber Materials for Beyond Extreme Ultraviolet Lithography.
Hong S; Kim JS; Lee JU; Lee SM; Kim JH; Ahn J
J Nanosci Nanotechnol; 2015 Nov; 15(11):8652-5. PubMed ID: 26726569
[TBL] [Abstract][Full Text] [Related]
16. At-wavelength inspection of sub-40 nm defects in extreme ultraviolet lithography mask blank by photoemission electron microscopy.
Lin J; Weber N; Maul J; Hendel S; Rott K; Merkel M; Schoenhense G; Kleineberg U
Opt Lett; 2007 Jul; 32(13):1875-7. PubMed ID: 17603599
[TBL] [Abstract][Full Text] [Related]
17. Fabrication of mid-infrared frequency-selective surfaces by soft lithography.
Paul KE; Zhu C; Love JC; Whitesides GM
Appl Opt; 2001 Sep; 40(25):4557-61. PubMed ID: 18360497
[TBL] [Abstract][Full Text] [Related]
18. Refined extreme ultraviolet mask stack model.
Makhotkin IA; Wu M; Soltwisch V; Scholze F; Philipsen V
J Opt Soc Am A Opt Image Sci Vis; 2021 Apr; 38(4):498-503. PubMed ID: 33798178
[TBL] [Abstract][Full Text] [Related]
19. Optical performance of extreme ultraviolet lithography mask with an indium tin oxide absorber.
Kang HY; Park S; Hwangbo CK; Seo HS; Kim SS; Cho HK
J Nanosci Nanotechnol; 2012 Apr; 12(4):3330-3. PubMed ID: 22849118
[TBL] [Abstract][Full Text] [Related]
20. Nearly amorphous Mo-N gratings for ultimate resolution in extreme ultraviolet interference lithography.
Wang L; Kirk E; Wäckerlin C; Schneider CW; Hojeij M; Gobrecht J; Ekinci Y
Nanotechnology; 2014 Jun; 25(23):235305. PubMed ID: 24850475
[TBL] [Abstract][Full Text] [Related]
[Next] [New Search]