These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

123 related articles for article (PubMed ID: 26480353)

  • 1. Sparse nonlinear inverse imaging for shot count reduction in inverse lithography.
    Wu X; Liu S; Lv W; Lam EY
    Opt Express; 2015 Oct; 23(21):26919-31. PubMed ID: 26480353
    [TBL] [Abstract][Full Text] [Related]  

  • 2. Nonlinear compressive inverse lithography aided by low-rank regularization.
    Ma X; Wang Z; Zhu J; Zhang S; Arce GR; Zhao S
    Opt Express; 2019 Oct; 27(21):29992-30008. PubMed ID: 31684254
    [TBL] [Abstract][Full Text] [Related]  

  • 3. Fast optical proximity correction method based on nonlinear compressive sensing.
    Ma X; Wang Z; Li Y; Arce GR; Dong L; Garcia-Frias J
    Opt Express; 2018 May; 26(11):14479-14498. PubMed ID: 29877485
    [TBL] [Abstract][Full Text] [Related]  

  • 4. Robust and efficient inverse mask synthesis with basis function representation.
    Wu X; Liu S; Lv W; Lam EY
    J Opt Soc Am A Opt Image Sci Vis; 2014 Dec; 31(12):B1-9. PubMed ID: 25606774
    [TBL] [Abstract][Full Text] [Related]  

  • 5. Inverse lithography physics-informed deep neural level set for mask optimization.
    Ma XY; Hao S
    Appl Opt; 2023 Nov; 62(33):8769-8779. PubMed ID: 38038022
    [TBL] [Abstract][Full Text] [Related]  

  • 6. Gradient-based inverse extreme ultraviolet lithography.
    Ma X; Wang J; Chen X; Li Y; Arce GR
    Appl Opt; 2015 Aug; 54(24):7284-300. PubMed ID: 26368764
    [TBL] [Abstract][Full Text] [Related]  

  • 7. Mask optimization approaches in optical lithography based on a vector imaging model.
    Ma X; Li Y; Dong L
    J Opt Soc Am A Opt Image Sci Vis; 2012 Jul; 29(7):1300-12. PubMed ID: 22751396
    [TBL] [Abstract][Full Text] [Related]  

  • 8. Fast nonlinear compressive sensing lithographic source and mask optimization method using Newton-IHTs algorithm.
    Sun Y; Sheng N; Li T; Li Y; Li E; Wei P
    Opt Express; 2019 Feb; 27(3):2754-2770. PubMed ID: 30732308
    [TBL] [Abstract][Full Text] [Related]  

  • 9. Model-driven convolution neural network for inverse lithography.
    Ma X; Zhao Q; Zhang H; Wang Z; Arce GR
    Opt Express; 2018 Dec; 26(25):32565-32584. PubMed ID: 30645421
    [TBL] [Abstract][Full Text] [Related]  

  • 10. Single spherical mirror optic for extreme ultraviolet lithography enabled by inverse lithography technology.
    Scranton G; Bhargava S; Ganapati V; Yablonovitch E
    Opt Express; 2014 Oct; 22(21):25027-42. PubMed ID: 25401536
    [TBL] [Abstract][Full Text] [Related]  

  • 11. Block-based mask optimization for optical lithography.
    Ma X; Song Z; Li Y; Arce GR
    Appl Opt; 2013 May; 52(14):3351-63. PubMed ID: 23669851
    [TBL] [Abstract][Full Text] [Related]  

  • 12. Binary mask optimization for inverse lithography with partially coherent illumination.
    Ma X; Arce G
    J Opt Soc Am A Opt Image Sci Vis; 2008 Dec; 25(12):2960-70. PubMed ID: 19037387
    [TBL] [Abstract][Full Text] [Related]  

  • 13. Generalized inverse lithography methods for phase-shifting mask design.
    Ma X; Arce GR
    Opt Express; 2007 Nov; 15(23):15066-79. PubMed ID: 19550790
    [TBL] [Abstract][Full Text] [Related]  

  • 14. Efficient source and mask optimization with augmented Lagrangian methods in optical lithography.
    Li J; Liu S; Lam EY
    Opt Express; 2013 Apr; 21(7):8076-90. PubMed ID: 23571898
    [TBL] [Abstract][Full Text] [Related]  

  • 15. Fast inverse lithography based on dual-channel model-driven deep learning.
    Ma X; Zheng X; Arce GR
    Opt Express; 2020 Jul; 28(14):20404-20421. PubMed ID: 32680101
    [TBL] [Abstract][Full Text] [Related]  

  • 16. Hybrid source mask optimization for robust immersion lithography.
    Ma X; Han C; Li Y; Wu B; Song Z; Dong L; Arce GR
    Appl Opt; 2013 Jun; 52(18):4200-11. PubMed ID: 23842161
    [TBL] [Abstract][Full Text] [Related]  

  • 17. Vectorial pupil optimization to compensate polarization distortion in immersion lithography system.
    Li T; Liu Y; Sun Y; Yan X; Wei P; Li Y
    Opt Express; 2020 Feb; 28(4):4412-4425. PubMed ID: 32121678
    [TBL] [Abstract][Full Text] [Related]  

  • 18. Fast inverse lithography approach based on a model-driven graph convolutional network.
    Zhang S; Ma X; Zhang J
    Opt Express; 2023 Oct; 31(22):36451-36467. PubMed ID: 38017798
    [TBL] [Abstract][Full Text] [Related]  

  • 19. [MEG inverse solution using Gauss-Newton algorithm modified by Moore-Penrose inversion].
    Li J
    Sheng Wu Yi Xue Gong Cheng Xue Za Zhi; 2001 Jun; 18(2):265-8. PubMed ID: 11450550
    [TBL] [Abstract][Full Text] [Related]  

  • 20. PSM design for inverse lithography with partially coherent illumination.
    Ma X; Arce GR
    Opt Express; 2008 Nov; 16(24):20126-41. PubMed ID: 19030098
    [TBL] [Abstract][Full Text] [Related]  

    [Next]    [New Search]
    of 7.