These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

325 related articles for article (PubMed ID: 26517005)

  • 21. Straightforward Integration Flow of a Silicon-Containing Block Copolymer for Line-Space Patterning.
    Legrain A; Fleury G; Mumtaz M; Navarro C; Arias-Zapata J; Chevalier X; Cayrefourcq I; Zelsmann M
    ACS Appl Mater Interfaces; 2017 Dec; 9(49):43043-43050. PubMed ID: 29182294
    [TBL] [Abstract][Full Text] [Related]  

  • 22. Solvent vapor annealing of block copolymers in confined topographies: commensurability considerations for nanolithography.
    Cummins C; Kelly RA; Gangnaik A; Georgiev YM; Petkov N; Holmes JD; Morris MA
    Macromol Rapid Commun; 2015 Apr; 36(8):762-7. PubMed ID: 25704307
    [TBL] [Abstract][Full Text] [Related]  

  • 23. Effect of Entrapped Solvent on the Evolution of Lateral Order in Self-Assembled P(S-r-MMA)/PS-b-PMMA Systems with Different Thicknesses.
    Giammaria TJ; Ferrarese Lupi F; Seguini G; Sparnacci K; Antonioli D; Gianotti V; Laus M; Perego M
    ACS Appl Mater Interfaces; 2017 Sep; 9(37):31215-31223. PubMed ID: 28195457
    [TBL] [Abstract][Full Text] [Related]  

  • 24. Enhanced microphase separation of thin films of low molecular weight block copolymer by the addition of an ionic liquid.
    Li D; Zhou C; Xiong S; Qu XP; Craig GSW; Nealey PF
    Soft Matter; 2019 Dec; 15(48):9991-9996. PubMed ID: 31755518
    [TBL] [Abstract][Full Text] [Related]  

  • 25. Enhanced Lateral Ordering in Cylinder Forming PS-b-PMMA Block Copolymers Exploiting the Entrapped Solvent.
    Seguini G; Zanenga F; Giammaria TJ; Ceresoli M; Sparnacci K; Antonioli D; Gianotti V; Laus M; Perego M
    ACS Appl Mater Interfaces; 2016 Mar; 8(12):8280-8. PubMed ID: 26959626
    [TBL] [Abstract][Full Text] [Related]  

  • 26. Solvothermal Vapor Annealing of Lamellar Poly(styrene)-block-poly(d,l-lactide) Block Copolymer Thin Films for Directed Self-Assembly Application.
    Cummins C; Mokarian-Tabari P; Andreazza P; Sinturel C; Morris MA
    ACS Appl Mater Interfaces; 2016 Mar; 8(12):8295-304. PubMed ID: 26950246
    [TBL] [Abstract][Full Text] [Related]  

  • 27. Directed self-assembly of solvent-vapor-induced non-bulk block copolymer morphologies on nanopatterned substrates.
    Wan L; Ji S; Liu CC; Craig GS; Nealey PF
    Soft Matter; 2016 Mar; 12(11):2914-22. PubMed ID: 26891026
    [TBL] [Abstract][Full Text] [Related]  

  • 28. Deconvoluting the mechanism of microwave annealing of block copolymer thin films.
    Jin C; Murphy JN; Harris KD; Buriak JM
    ACS Nano; 2014 Apr; 8(4):3979-91. PubMed ID: 24655292
    [TBL] [Abstract][Full Text] [Related]  

  • 29. Three-dimensional block copolymer nanostructures by the solvent-annealing-induced wetting in anodic aluminum oxide templates.
    Chu CJ; Chung PY; Chi MH; Kao YH; Chen JT
    Macromol Rapid Commun; 2014 Sep; 35(18):1598-605. PubMed ID: 25098757
    [TBL] [Abstract][Full Text] [Related]  

  • 30. Sub-10 nm nanofabrication via nanoimprint directed self-assembly of block copolymers.
    Park SM; Liang X; Harteneck BD; Pick TE; Hiroshiba N; Wu Y; Helms BA; Olynick DL
    ACS Nano; 2011 Nov; 5(11):8523-31. PubMed ID: 21995511
    [TBL] [Abstract][Full Text] [Related]  

  • 31. Study of the kinetics and mechanism of rapid self-assembly in block copolymer thin films during solvo-microwave annealing.
    Mokarian-Tabari P; Cummins C; Rasappa S; Simao C; Sotomayor Torres CM; Holmes JD; Morris MA
    Langmuir; 2014 Sep; 30(35):10728-39. PubMed ID: 25137566
    [TBL] [Abstract][Full Text] [Related]  

  • 32. Ultrafast Self-Assembly of Sub-10 nm Block Copolymer Nanostructures by Solvent-Free High-Temperature Laser Annealing.
    Jiang J; Jacobs AG; Wenning B; Liedel C; Thompson MO; Ober CK
    ACS Appl Mater Interfaces; 2017 Sep; 9(37):31317-31324. PubMed ID: 28598156
    [TBL] [Abstract][Full Text] [Related]  

  • 33. Orientation-controlled self-assembled nanolithography using a polystyrene-polydimethylsiloxane block copolymer.
    Jung YS; Ross CA
    Nano Lett; 2007 Jul; 7(7):2046-50. PubMed ID: 17570733
    [TBL] [Abstract][Full Text] [Related]  

  • 34. Oligosaccharide/silicon-containing block copolymers with 5 nm features for lithographic applications.
    Cushen JD; Otsuka I; Bates CM; Halila S; Fort S; Rochas C; Easley JA; Rausch EL; Thio A; Borsali R; Willson CG; Ellison CJ
    ACS Nano; 2012 Apr; 6(4):3424-33. PubMed ID: 22456229
    [TBL] [Abstract][Full Text] [Related]  

  • 35. Self-assembly of maltoheptaose-b-PMMA block copolymer systems: 10nm Resolution in thin film and bulk states.
    Noronha CM; Otsuka I; Bouilhac C; Rochas C; Barreto PLM; Borsali R
    Carbohydr Polym; 2017 Aug; 170():15-22. PubMed ID: 28521981
    [TBL] [Abstract][Full Text] [Related]  

  • 36. A generalized method for alignment of block copolymer films: solvent vapor annealing with soft shear.
    Qiang Z; Zhang Y; Groff JA; Cavicchi KA; Vogt BD
    Soft Matter; 2014 Aug; 10(32):6068-76. PubMed ID: 25004006
    [TBL] [Abstract][Full Text] [Related]  

  • 37. Orientation Control in Thin Films of a High-χ Block Copolymer with a Surface Active Embedded Neutral Layer.
    Zhang J; Clark MB; Wu C; Li M; Trefonas P; Hustad PD
    Nano Lett; 2016 Jan; 16(1):728-35. PubMed ID: 26682931
    [TBL] [Abstract][Full Text] [Related]  

  • 38. Chemically tailored block copolymers for highly reliable sub-10-nm patterns by directed self-assembly.
    Maekawa S; Seshimo T; Dazai T; Sato K; Hatakeyama-Sato K; Nabae Y; Hayakawa T
    Nat Commun; 2024 Jul; 15(1):5671. PubMed ID: 38971785
    [TBL] [Abstract][Full Text] [Related]  

  • 39. Flash Light Millisecond Self-Assembly of High χ Block Copolymers for Wafer-Scale Sub-10 nm Nanopatterning.
    Jin HM; Park DY; Jeong SJ; Lee GY; Kim JY; Mun JH; Cha SK; Lim J; Kim JS; Kim KH; Lee KJ; Kim SO
    Adv Mater; 2017 Aug; 29(32):. PubMed ID: 28635174
    [TBL] [Abstract][Full Text] [Related]  

  • 40. Revealing the Kinetic Phase Behavior of Block Copolymer Complexes Using Solvent Vapor Absorption-Desorption Isotherms.
    Hendeniya N; Chittick C; Hillery K; Abtahi S; Mosher C; Chang B
    ACS Appl Mater Interfaces; 2024 Apr; 16(14):18144-18153. PubMed ID: 38530201
    [TBL] [Abstract][Full Text] [Related]  

    [Previous]   [Next]    [New Search]
    of 17.